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    • 5. 发明公开
    • Deposition apparatus
    • 沉积装置
    • KR20120010736A
    • 2012-02-06
    • KR20100072253
    • 2010-07-27
    • HITACHI SHIPBUILDING ENG CO
    • DAIKU HIROYUKIKAMIKAWA KENJI
    • C23C14/24C23C14/54
    • C23C14/542C23C14/243C23C14/548
    • PURPOSE: A deposition apparatus is provided to properly adjust the deposition speed of a deposition material by regulating a distance between a deposition speed detection element and the outlet of a detection nozzle. CONSTITUTION: A deposition apparatus comprises a dispersion container(14), material inlet pipes(18A,18B), a deposition speed detection element(33), and a deposition speed regulating unit(34). Multiple deposition nozzles are formed inside the dispersion container. The material inlet pipes are connected to the dispersion container and have control valves. A detection nozzle penetrates through the dispersion container. The deposition speed detection element detects the deposition speed of a deposition material emitted from the detection nozzle. The deposition speed regulating unit regulates a gap between the deposition speed detection element and the outlet of the detection nozzle.
    • 目的:提供沉积设备,通过调节沉积速度检测元件和检测喷嘴出口之间的距离来适当地调节沉积材料的沉积速度。 构成:沉积装置包括分散容器(14),材料入口管(18A,18B),沉积速度检测元件(33)和沉积速度调节单元(34)。 在分散容器内形成多个沉积喷嘴。 物料入口管连接到分散容器并具有控制阀。 检测喷嘴穿过分散容器。 沉积速度检测元件检测从检测喷嘴发射的沉积材料的沉积速度。 沉积速度调节单元调节沉积速度检测元件和检测喷嘴的出口之间的间隙。