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    • 6. 发明申请
    • PARALLAX BARRIER, MULTIPLE DISPLAY DEVICE AND PARALLAX BARRIER MANUFACTURING METHOD
    • PARALLAX BARRIER,多显示设备和PARALLAX BARRIER制造方法
    • US20090080099A1
    • 2009-03-26
    • US11995146
    • 2006-06-26
    • Kazunori TanimotoTatsuji Saitoh
    • Kazunori TanimotoTatsuji Saitoh
    • G02B27/02G02B5/00G03F7/20
    • G02B27/2214H04N13/31H04N2013/403H04N2213/001
    • A parallax barrier is manufactured by forming a light-blocking layer by patterning a metal layer or a resin layer on a barrier glass in a photolithography step. On a mask used in the photolithography step, some pitches between slits are different, the slits corresponding to portions whereupon the light-blocking layers are to be formed. In addition, on the mask, first pitches (for instance, 100) and second pitches (for instance 99.5), which can be actually formed with accuracy, are formed in a cycle, and the average of such pitches can be accord with a theoretical pitch distance (for instance, 99.99). Thus, in the parallax barrier to be used for a multiple display device, visibility of the entire screen can be improved, and the parallax barrier which can be manufactured by using the mask lithography technology having a limited accuracy, and a method for manufacturing such parallax barrier are provided.
    • 通过在光刻步骤中在阻挡玻璃上图案化金属层或树脂层来形成遮光层来制造视差屏障。 在光刻步骤中使用的掩模上,狭缝之间的一些间距不同,对应于形成遮光层的部分的狭缝。 此外,在掩模上,以一个周期形成能够精确地实际形成的第一间距(例如100)和第二间距(例如99.5),这些间距的平均值可以符合理论 间距(例如99.99)。 因此,在用于多显示装置的视差屏障中,可以提高整个屏幕的可视性,并且可以通过使用具有有限精度的掩模光刻技术制造的视差屏障以及制造这种视差的方法 提供屏障。
    • 7. 发明授权
    • Parallax barrier, multiple display device and parallax barrier manufacturing method
    • 视差屏障,多显示设备和视差屏障制造方法
    • US07612834B2
    • 2009-11-03
    • US11995146
    • 2006-06-26
    • Kazunori TanimotoTatsuji Saitoh
    • Kazunori TanimotoTatsuji Saitoh
    • G02F1/1335G02F1/1333
    • G02B27/2214H04N13/31H04N2013/403H04N2213/001
    • A parallax barrier is manufactured by forming a light-blocking layer by patterning a metal layer or a resin layer on a barrier glass in a photolithography step. On a mask used in the photolithography step, some pitches between slits are different, the slits corresponding to portions whereupon the light-blocking layers are to be formed. In addition, on the mask, first pitches (for instance, 100) and second pitches (for instance 99.5), which can be actually formed with accuracy, are formed in a cycle, and the average of such pitches can be accord with a theoretical pitch distance (for instance, 99.99). Thus, in the parallax barrier to be used for a multiple display device, visibility of the entire screen can be improved, and the parallax barrier which can be manufactured by using the mask lithography technology having a limited accuracy, and a method for manufacturing such parallax barrier are provided.
    • 通过在光刻步骤中在阻挡玻璃上图案化金属层或树脂层来形成遮光层来制造视差屏障。 在光刻步骤中使用的掩模上,狭缝之间的一些间距不同,对应于形成遮光层的部分的狭缝。 此外,在掩模上,以一个周期形成能够精确地实际形成的第一间距(例如100)和第二间距(例如99.5),这些间距的平均值可以符合理论 间距(例如99.99)。 因此,在用于多显示装置的视差屏障中,可以提高整个屏幕的可视性,并且可以通过使用具有有限精度的掩模光刻技术制造的视差屏障以及制造这种视差的方法 提供屏障。