专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130134330A1 HOLDER DEVICE, CHAMBER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：保持装置，室外装置和极光超紫外光发生系统
公开(公告)号：US20130134330A1
公开(公告)日：2013-05-30
申请号：US13620589
申请日：2012-09-14
申请人： Junichi FUJIMOTO , Hidenobu KAMEDA , Osamu WAKABAYASHI , Kouji ASHIKAWA
发明人： Junichi FUJIMOTO , Hidenobu KAMEDA , Osamu WAKABAYASHI , Kouji ASHIKAWA
IPC分类号： G02B7/02 , G21K5/04 , G02B7/182
CPC分类号： G02B7/02 , G02B7/028 , G02B7/1815 , H05G2/005 , H05G2/008
摘要： A holder device for holding an optical element includes a holder having first and second members to sandwich the optical element therebetween, and a sealing member for creating a seal between the second member and the optical element.
摘要翻译：用于保持光学元件的保持装置包括具有夹持光学元件的第一和第二构件的保持器，以及用于在第二构件和光学元件之间形成密封的密封构件。

2. 发明申请

US20130126761A1 CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：室外设备和极光紫外线发光系统
公开(公告)号：US20130126761A1
公开(公告)日：2013-05-23
申请号：US13562950
申请日：2012-07-31
申请人： Shinji NAGAI , Junichi FUJIMOTO , Kouji ASHIKAWA
发明人： Shinji NAGAI , Junichi FUJIMOTO , Kouji ASHIKAWA
IPC分类号： G21K5/00
CPC分类号： H05G2/008 , G02B5/0891 , G21K5/00 , H05G2/005
摘要： A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber.
摘要翻译：可以与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生EUV光的室; 收集器反射镜，其具有形成在其中心的区域中的第一通孔，并且被构造成收集室内产生的EUV光，收集器反射镜被定位成使得第一通孔位于基本对应于遮蔽区; 以及蚀刻气体供给单元，设置在所述第一通孔中，并且被配置为向所述室供给蚀刻气体。

3. 发明申请

US20120248343A1 CHAMBER APPARATUS 有权
标题翻译：橱柜设备
公开(公告)号：US20120248343A1
公开(公告)日：2012-10-04
申请号：US13494442
申请日：2012-06-12
申请人： Shinji NAGAI , Osamu WAKABAYASHI , Yutaka SHIRAISHI , Junichi FUJIMOTO
发明人： Shinji NAGAI , Osamu WAKABAYASHI , Yutaka SHIRAISHI , Junichi FUJIMOTO
IPC分类号： G21K5/00
CPC分类号： H05G2/008 , G03F7/70033 , G03F7/70916 , H05G2/003
摘要： A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a collection unit and a collection container. The chamber includes an inlet through which a laser beam from the laser apparatus enters the chamber. The target supply unit is configured to supply a target material to a predetermined region inside the chamber. The collection unit includes a debris entering surface so that debris generated when the target material is irradiated with the laser beam enters the debris entering surface. The debris entering surface is inclined with respect to a direction in which the debris enters the debris entering surface. The collection container collects the debris flowing out of the collection unit.
摘要翻译：用于利用激光装置操作的腔室装置包括腔室，目标供应单元，收集单元和收集容器。该腔室包括入口，来自激光装置的激光束通过入口进入腔室。目标供给单元被配置为将目标材料供应到室内的预定区域。收集单元包括碎屑进入表面，使得当靶材料被激光束照射时产生的碎片进入碎片进入表面。碎屑进入表面相对于碎片进入碎片进入表面的方向倾斜。收集容器收集从收集单元流出的碎屑。

4. 发明申请

US20120236884A1 LASER APPARATUS 有权
标题翻译：激光装置
公开(公告)号：US20120236884A1
公开(公告)日：2012-09-20
申请号：US13421116
申请日：2012-03-15
申请人： Junichi FUJIMOTO , Takahito KUMAZAKI , Toru SUZUKI , Satoshi TANAKA , Osamu WAKABAYASHI
发明人： Junichi FUJIMOTO , Takahito KUMAZAKI , Toru SUZUKI , Satoshi TANAKA , Osamu WAKABAYASHI
IPC分类号： H01S3/10
CPC分类号： H01S3/106 , H01S3/005 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0971 , H01S3/2316 , H01S3/2333
摘要： This disclosure is directed to widen an adjustable range of the spectral linewidth of laser light output from a laser apparatus. This laser apparatus may include: (1) an excitation source configured to excite a laser medium in a laser gain space, (2) an optical resonator including an output coupler arranged on one side of an optical path through the laser gain space and a wavelength dispersion element arranged on the other side of the optical path through the laser gain space, and (3) a switching mechanism configured to switch a beam-width magnification or reduction factor by placing or removing at least one beam-width change optical system for expanding or reducing a beam width in or from an optical path between the laser gain space and the wavelength dispersion element or by inverting orientation of the at least one beam-width change optical system in the optical path.
摘要翻译：本公开旨在扩大从激光设备输出的激光的谱线宽度的可调范围。该激光装置可以包括：（1）激励源，被配置为在激光增益空间中激发激光介质，（2）光学谐振器，包括布置在通过激光增益空间的光路的一侧上的输出耦合器，以及波长通过激光增益空间布置在光路的另一侧的色散元件，以及（3）配置为通过放置或去除至少一个用于扩展的光束宽度改变光学系统来切换光束宽度放大率或缩小因子的切换机构或者减小激光增益空间和波长色散元件之间的光路中的光束宽度，或者通过使光路中的至少一个光束宽度改变光学系统的取向反转。

5. 发明申请

US20130064258A1 MASTER OSCILLATOR SYSTEM AND LASER APPARATUS 有权
标题翻译：主振荡器系统和激光设备
公开(公告)号：US20130064258A1
公开(公告)日：2013-03-14
申请号：US13602547
申请日：2012-09-04
申请人： Junichi FUJIMOTO , Takahito KUMAZAKI
发明人： Junichi FUJIMOTO , Takahito KUMAZAKI
IPC分类号： H01S3/101 , H01S3/02
CPC分类号： H01S3/08009 , H01S3/08004 , H01S3/0804 , H01S3/097 , H01S3/101 , H01S3/104 , H01S3/106 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2366
摘要： A master oscillator system may include a grating that functions as one of a plurality of resonator mirrors in an optical resonator, an optical element disposed within an optical path between the plurality of resonator mirrors, and an attitude control mechanism that adjusts an angle at which laser light traveling within the optical resonator is incident on the grating by adjusting the attitude of the optical element.
摘要翻译：主振荡器系统可以包括用作光谐振器中的多个谐振器反射镜之一的光栅，设置在多个谐振镜之间的光路内的光学元件和调整激光器的角度的姿态控制机构在光谐振器内行进的光通过调节光学元件的姿态而入射到光栅上。

6. 发明申请

US20110232058A1 CHAMBER REPLACING METHOD 有权
标题翻译：室更换方法
公开(公告)号：US20110232058A1
公开(公告)日：2011-09-29
申请号：US13152369
申请日：2011-06-03
申请人： Junichi FUJIMOTO , Hakaru Mizoguchi , Tatsuo Enami
发明人： Junichi FUJIMOTO , Hakaru Mizoguchi , Tatsuo Enami
IPC分类号： B23P6/00
CPC分类号： H01S3/2308 , H01S3/0014 , H01S3/03 , H01S3/10092 , H01S3/225 , Y10T29/49718 , Y10T29/49721 , Y10T29/4973 , Y10T29/49826
摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.
摘要翻译：当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

7. 发明申请

US20130075625A1 TARGET SUPPLY UNIT AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 审中-公开
标题翻译：目标供应单位和极端超紫外线发光装置
公开(公告)号：US20130075625A1
公开(公告)日：2013-03-28
申请号：US13553621
申请日：2012-07-19
申请人： Takayuki YABU , Yoshifumi UENO , Junichi FUJIMOTO , Yukio WATANABE , Toshihiro NISHISAKA
发明人： Takayuki YABU , Yoshifumi UENO , Junichi FUJIMOTO , Yukio WATANABE , Toshihiro NISHISAKA
IPC分类号： F23D11/32 , G21K5/04
CPC分类号： H05G2/005 , H05G2/006 , H05G2/008
摘要： A target supply unit includes a nozzle through which a target material is outputted, and a first electrically conductive member having a first opening formed therein and positioned to face the nozzle in a direction into which the target material is outputted through the nozzle. The first electrically conductive member is positioned so that the first opening is located below the nozzle in a gravitational direction. The target supply unit includes a voltage generator which applies a voltage between the target material and the first electrically conductive member.
摘要翻译：目标供给单元包括：输出目标材料的喷嘴;以及形成有第一开口的第一导电构件，其位于与通过喷嘴输出目标材料的方向相对的喷嘴。第一导电构件被定位成使得第一开口在重力方向上位于喷嘴下方。目标供应单元包括在目标材料和第一导电构件之间施加电压的电压发生器。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式