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1. 发明申请

US20100244661A1 LATERAL FIELD EMISSION DEVICE 有权
标题翻译：侧场发射装置
公开(公告)号：US20100244661A1
公开(公告)日：2010-09-30
申请号：US11477938
申请日：2006-06-30
申请人： Jung-Yu Li , Shih-Pu Chen , Yi-Ping Lin , Wei-Chin Lin
发明人： Jung-Yu Li , Shih-Pu Chen , Yi-Ping Lin , Wei-Chin Lin
IPC分类号： H01J1/62
CPC分类号： H01J1/74 , H01J29/04 , H01J29/08 , H01J31/127 , H01J2329/0407 , H01J2329/08 , H01J2329/18
摘要： A field emission device has pixels with cathode and anode provided on the same plane, so that electrons directly penetrate an independently provided fluorescent powder layer to produce light, giving the display the advantages of easy focusing, no dark spots, high brightness, and enhanced light emitting performance. Since the light produced by the fluorescent powder layer is not blocked by the anode, the problem of charge accumulation on the fluorescent powder layer is avoided, and it is not necessary to use expensive light-transmittable conducting glass as the anode. With the cathode and the anode located at the same plane, it is not necessary to use a high precision spacer to maintain a fixed distance between the cathode and the anode, enabling the device to be manufactured at reduced cost and high good yield.
摘要翻译：场发射器件具有设置在同一平面上的阴极和阳极的像素，使得电子直接穿透独立提供的荧光粉层以产生光，使显示器具有容易聚焦，无黑点，高亮度和增强的光的优点发射性能。由于由荧光粉层产生的光不被阳极阻挡，所以避免了荧光粉层上的电荷积聚的问题，并且不需要昂贵的透光导电玻璃作为阳极。在阴极和阳极位于同一平面上的情况下，不需要使用高精度间隔物来保持阴极和阳极之间的固定距离，从而能够以降低的成本和高的良率获得器件的制造。

2. 发明授权

US5530652A Automatic garment inspection and measurement system 失效
标题翻译：自动服装检测和测量系统
公开(公告)号：US5530652A
公开(公告)日：1996-06-25
申请号：US105853
申请日：1993-08-11
申请人： Gene F. Croyle , Wei-Chin Lin
发明人： Gene F. Croyle , Wei-Chin Lin
IPC分类号： G01B11/02 , A41H1/02 , G01B11/24 , G06F17/50 , G06T1/00 , G06T7/00 , G06F19/00
CPC分类号： A41H1/02 , G06T7/0075 , G06T2207/10016 , G06T2207/30196
摘要： An automatic garment inspection and measurement system can create a two-dimensional or three-dimensional electronic representation of an object. This electronic representation can then be combined with other electronic representations to create a database of measurements from which standard patterns can be generated for use in manufacturing garments. The electronic representation can also be used to compare the manufactured object it represents to an ideal representation in order to determine if the object's measurements are within a predetermined tolerance of the ideal representation. A machine vision system is used to capture an image of the object and convert that image into a digital representation which can then be added to a database to be used to compile an ideal pattern or can be compared to an already existing ideal image to determine if the object is the correct size.
摘要翻译：自动服装检查和测量系统可以创建对象的二维或三维电子表示。然后，该电子表示可以与其他电子表示组合以创建可以从其制造标准图案以用于制造服装的测量数据库。电子表示还可以用于将其表示的制造对象与理想表示进行比较，以便确定对象的测量是否在理想表示的预定容差内。机器视觉系统用于捕获对象的图像并将该图像转换为数字表示，然后可以将其添加到数据库中以用于编译理想图案，或者可以将其与现有的理想图像进行比较，以确定是否对象是正确的大小。

3. 发明授权

US07435355B2 Liquid-based gravity-driven etching-stop technique for controlling structure dimension 有权
标题翻译：液体重力驱动蚀刻停止技术，用于控制结构尺寸
公开(公告)号：US07435355B2
公开(公告)日：2008-10-14
申请号：US11242866
申请日：2005-10-05
申请人： Wei-Chin Lin , Hui-Ling Chang , Ching-Hsiang Tsai , Chao-Chiun Liang , Gen-Wen Hsieh , Yuh-Wen Lee
发明人： Wei-Chin Lin , Hui-Ling Chang , Ching-Hsiang Tsai , Chao-Chiun Liang , Gen-Wen Hsieh , Yuh-Wen Lee
IPC分类号： B44C1/22 , H01L21/302
CPC分类号： H01L21/02052 , B81B2201/12 , B81C1/00626 , B81C2201/0142 , G01Q60/38
摘要： A liquid-based gravity-driven etching-stop technique for controlling structure dimension is provided, where opposite etching trenches in cooperation with an etching-stop solution are used for controlling the dimension of a microstructure on the wafer level. In an embodiment, opposite trenches surrounding the microstructure are respectively etched on sides of the wafer, and the trench depth on the side of the wafer, on which the microstructure is, is equal to the design dimension of the microstructure. Contrarily, it is unnecessary to define the trench depth on the back-side of the chip. In the final step of the fabrication process, when the device is etched, such that the trenches on the sides communicate with each other to separate the microstructure from the whole wafer automatically and thereby shift from the etchant into the etching-stop solution to stop etching.
摘要翻译：提供了一种用于控制结构尺寸的液体重力驱动蚀刻停止技术，其中与蚀刻停止溶液配合的相反蚀刻沟槽用于控制晶片级上的微结构的尺寸。在一个实施例中，围绕微结构的相对的沟槽分别蚀刻在晶片的侧面上，并且在其上的晶片侧面上的沟槽深度等于微结构的设计尺寸。相反，不需要在芯片的背面限定沟槽深度。在制造过程的最后步骤中，当器件被蚀刻时，使得侧面上的沟槽彼此连通以自动地将微结构与全部晶片分离，从而从蚀刻剂移动到蚀刻停止溶液中以停止蚀刻。

4. 发明授权

US5967505A Automatic feeder and inverter for fabric workpieces 失效
标题翻译：织物工件自动进料器和逆变器
公开(公告)号：US5967505A
公开(公告)日：1999-10-19
申请号：US821784
申请日：1997-03-21
申请人： Wei-Chin Lin , Donald L. Klusmann , Frederick N. Mueller , Pedro T. Silva , Frank Ch Kim , Kent Joell Halland , Timothy Matthew Blount , Steven Alan Amigh
发明人： Wei-Chin Lin , Donald L. Klusmann , Frederick N. Mueller , Pedro T. Silva , Frank Ch Kim , Kent Joell Halland , Timothy Matthew Blount , Steven Alan Amigh
IPC分类号： B65H29/60 , B65H15/00 , B65H5/22
CPC分类号： B65H15/00 , B65H2511/16
摘要： An apparatus is provided for feeding fabric workpieces one at a time from the top of a stack of like workpieces having a first rough side and a second smooth side, the workpieces being stacked with alternating sides up. A computer controlled picker is used to separate the top workpiece from the remaining workpieces in the stack, and for depositing the workpiece on a downstream conveyor. An ultrasonic face detector is mounted above the first conveyor for determining whether the side of the workpiece facing the face detector--the top surface--is relatively rough or relatively smooth. A pivoting feeder/inverter is provided at the end of the first conveyor. If the workpiece has the desired side up for subsequent sewing operations, the inverter/conveyor is placed in a first position so that the workpiece is directed into a sandwich belt type conveyor which will not change the orientation of the workpiece. If the workpiece has the desired side down, the feeder/inverter is pivoted to a second position to enable the workpiece to enter an inverter conveyor which will rotate the workpiece 180 degrees about an axis along the direction of travel to place the workpiece in the correct orientation for the subsequent sewing operation. Thus, this apparatus takes all of the fabric workpieces from a stack in which the sides facing up alternate, and automatically places all of them in the same orientation prior to arrival at a sewing station.
摘要翻译：一种装置，用于从具有第一粗糙面和第二平滑侧的类似工件的堆叠的顶部一次一个地馈送织物工件，工件以交替的侧面向上堆叠。使用计算机控制的拾取器将顶部工件与堆叠中的其余工件分离，并将工件沉积在下游输送机上。超声波面部检测器安装在第一传送器上方，用于确定面向面部检测器的工件的侧面（顶部表面）是相对粗糙还是相对光滑的。在第一输送机的端部设置有枢转进给器/逆变器。如果工件具有所需的侧面朝上用于随后的缝纫操作，则将变频器/输送机置于第一位置，使得工件被引导到不会改变工件的取向的夹心带式输送机。如果工件具有所需的侧面向下，则进给/转换器枢转到第二位置，以使工件能够进入逆变器输送机，该输送机将使工件沿着行进方向绕轴线旋转180度，以将工件放置在正确的位置方向为随后的缝制操作。因此，该装置将所有的织物工件从侧面朝上交替的堆叠中取出，并且在到达缝纫台之前自动将它们全部放在相同的方位。

5. 发明申请

US20060264058A1 Liquid-based gravity-driven etching-stop technique for controlling structure dimension 有权
标题翻译：液体重力驱动蚀刻停止技术，用于控制结构尺寸
公开(公告)号：US20060264058A1
公开(公告)日：2006-11-23
申请号：US11242866
申请日：2005-10-05
申请人： Wei-Chin Lin , Hui-Ling Chang , Ching-Hsiang Tsai , Chao-Chiun Liang , Gen-Wen Hsieh , Yuh-Wen Lee
发明人： Wei-Chin Lin , Hui-Ling Chang , Ching-Hsiang Tsai , Chao-Chiun Liang , Gen-Wen Hsieh , Yuh-Wen Lee
IPC分类号： H01L21/302
CPC分类号： H01L21/02052 , B81B2201/12 , B81C1/00626 , B81C2201/0142 , G01Q60/38
摘要： A liquid-based gravity-driven etching-stop technique for controlling structure dimension is provided, where opposite etching trenches in cooperation with an etching-stop solution are used for controlling the dimension of a microstructure on the wafer level. In an embodiment, opposite trenches surrounding the microstructure are respectively etched on sides of the wafer, and the trench depth on the side of the wafer, on which the microstructure is, is equal to the design dimension of the microstructure. Contrarily, it is unnecessary to define the trench depth on the back-side of the chip. In the final step of the fabrication process, when the device is etched, such that the trenches on the sides communicate with each other to separate the microstructure from the whole wafer automatically and thereby shift from the etchant into the etching-stop solution to stop etching.
摘要翻译：提供了一种用于控制结构尺寸的液体重力驱动蚀刻停止技术，其中与蚀刻停止溶液配合的相反蚀刻沟槽用于控制晶片级上的微结构的尺寸。在一个实施例中，围绕微结构的相对的沟槽分别蚀刻在晶片的侧面上，并且在其上的晶片侧面上的沟槽深度等于微结构的设计尺寸。相反，不需要在芯片的背面限定沟槽深度。在制造过程的最后步骤中，当器件被蚀刻时，使得侧面上的沟槽彼此连通以自动地将微结构与全部晶片分离，从而从蚀刻剂移动到蚀刻停止溶液中以停止蚀刻。

6. 发明申请

US20060065767A1 Scrap device for removing debris on filter of food processors 审中-公开
标题翻译：用于消除食品加工机过滤器上的碎屑的废料装置
公开(公告)号：US20060065767A1
公开(公告)日：2006-03-30
申请号：US10950518
申请日：2004-09-28
申请人： Wei-Chin Lin
发明人： Wei-Chin Lin
IPC分类号： B02C18/12
CPC分类号： A47J19/027
摘要： A scrap device for a food processor is connected to the cap of the processor and the cap includes a feeding tube which is located above the grinding plate of the processing unit. The grinding plate includes blades for grinding fruit or food and is driven by a motor. A filter extends from a periphery of the grinding plate and the scrap plate keeps a proper a gap between an inside of the filter and the scrap device. The scrap plate is stationary and the filter is rotated together with the grinding plate so that the scrap plate remove the debris attached on the filter which operating the food processor.
摘要翻译：用于食品处理器的废料装置连接到处理器的盖上，并且盖包括位于处理单元的研磨板上方的进料管。研磨板包括用于研磨水果或食物的叶片，并由马达驱动。过滤器从研磨板的周边延伸，并且废片在过滤器的内部和废料装置之间保持适当的间隙。废板是固定的，并且过滤器与研磨板一起旋转，使得废板去除附着在操作食品处理器的过滤器上的碎屑。

7. 发明申请

US20050150767A1 Method for assembling carbon nanotubes and microprobe and an apparatus thereof 审中-公开
标题翻译：碳纳米管和微探针的组装方法及其装置
公开(公告)号：US20050150767A1
公开(公告)日：2005-07-14
申请号：US10815842
申请日：2004-04-02
申请人： Hui-Chi Su , Hsin-Chien Huang , Yuh-Wen Lee , Wei-Chin Lin , Hui-Ling Chang
发明人： Hui-Chi Su , Hsin-Chien Huang , Yuh-Wen Lee , Wei-Chin Lin , Hui-Ling Chang
IPC分类号： C25D13/00
CPC分类号： B82Y30/00 , C25D13/00
摘要： The present invention discloses a method for assembling carbon nanotubes and microprobe, which employs the Electrophoresis or Dielectrophoresis principles to drive the carbon nanotubes self-assembling the microprobe under an electric field. The method comprises the steps of: forming at least one microprobe, the microprobe being covered by a conductive layer; exposing the microprobe to a solution having carbon nanotubes spreading therein, the solution being furnished with an electrode; applying a predetermined voltage between the conductive layer and the electrode, making at least one carbon nanotube to move and attach onto the top of the microprobe.
摘要翻译：本发明公开了一种用于组装碳纳米管和微探针的方法，其采用电泳或电泳原理来驱动碳纳米管在电场下自组装微探针。该方法包括以下步骤：形成至少一个微探针，所述微探针被导电层覆盖; 将微探针暴露于其中扩散有碳纳米管的溶液中，该溶液配备有电极; 在导电层和电极之间施加预定的电压，使至少一个碳纳米管移动并附着到微探针的顶部。

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