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1. 发明申请

US20090233513A1 FRIT SEALING SYSTEM 有权
标题翻译：密封系统
公开(公告)号：US20090233513A1
公开(公告)日：2009-09-17
申请号：US12185279
申请日：2008-08-04
申请人： Jung-Min Lee , Hee-Seong Jeong , Choong-Ho Lee , Jun-Sik Oh , Je-Kil Ryu , Won-Kyu Choe
发明人： Jung-Min Lee , Hee-Seong Jeong , Choong-Ho Lee , Jun-Sik Oh , Je-Kil Ryu , Won-Kyu Choe
IPC分类号： H01J9/26
CPC分类号： H05B33/04 , B23K26/06 , B23K26/206 , H01L51/5246
摘要： A frit sealing system for combining a first substrate and a second substrate using frit comprises a laser generating a laser beam, and a homogenizer normalizing the intensity of the laser beam within a cross section of the laser beam in the transverse direction. The frit sealing system further comprises a support apparatus configured to hold a first and a second substrate with frit interposed between them, wherein the frit is configured to be cured by heat generated from the laser beam and thereby solidifying and binding the first and the second substrates.
摘要翻译：用于使用玻璃料组合第一基板和第二基板的玻璃料密封系统包括产生激光束的激光器和在横向方向上在激光束的横截面内对激光束的强度进行归一化的均质器。玻璃料密封系统还包括支撑装置，其被配置为将第一和第二基板保持在介于它们之间的玻璃料，其中玻璃料被配置为通过由激光束产生的热量固化，从而固化和结合第一和第二基板。

2. 发明授权

US08175124B2 Frit sealing system 有权
标题翻译：玻璃料密封系统
公开(公告)号：US08175124B2
公开(公告)日：2012-05-08
申请号：US12185279
申请日：2008-08-04
申请人： Jung-Min Lee , Hee-Seong Jeong , Choong-Ho Lee , Jun-Sik Oh , Je-Kil Ryu , Won-Kyu Choe
发明人： Jung-Min Lee , Hee-Seong Jeong , Choong-Ho Lee , Jun-Sik Oh , Je-Kil Ryu , Won-Kyu Choe
IPC分类号： H01S3/10
CPC分类号： H05B33/04 , B23K26/06 , B23K26/206 , H01L51/5246
摘要： A frit sealing system for combining a first substrate and a second substrate using frit comprises a laser generating a laser beam, and a homogenizer normalizing the intensity of the laser beam within a cross section of the laser beam in the transverse direction. The frit sealing system further comprises a support apparatus configured to hold a first and a second substrate with frit interposed between them, wherein the frit is configured to be cured by heat generated from the laser beam and thereby solidifying and binding the first and the second substrates.
摘要翻译：用于使用玻璃料组合第一基板和第二基板的玻璃料密封系统包括产生激光束的激光器和在横向方向上在激光束的横截面内对激光束的强度进行归一化的均质器。玻璃料密封系统还包括支撑装置，其被配置为将第一和第二基板保持在介于它们之间的玻璃料，其中玻璃料被配置为通过由激光束产生的热量固化，从而固化和结合第一和第二基板。

3. 发明申请

US20090233514A1 Frit sealing system and method of manufacturing organic light emitting display device 有权
标题翻译：玻璃料密封系统和制造有机发光显示装置的方法
公开(公告)号：US20090233514A1
公开(公告)日：2009-09-17
申请号：US12378463
申请日：2009-02-13
申请人： Jung-Min Lee , Seok-Joon Yoon , Choong-Ho Lee , Hee-Seong Jeong , Tae-Wook Kang , Won-Kyu Choe
发明人： Jung-Min Lee , Seok-Joon Yoon , Choong-Ho Lee , Hee-Seong Jeong , Tae-Wook Kang , Won-Kyu Choe
IPC分类号： H01J9/26 , C03B5/00
CPC分类号： H01L21/67126 , B32B37/065 , B32B2309/68 , B32B2310/0843 , B32B2457/202 , B32B2457/206 , H01L27/3244 , H01L51/5246 , H01L2924/0002 , H01L2924/00
摘要： A frit sealing system and a method of manufacturing an organic light emitting display device by using the frit sealing system, and more particularly, a frit sealing system and a method of manufacturing an organic light emitting display device by using the frit sealing system, which includes a pressure member so as to physically pressurize a first substrate and a second substrate, thereby increasing adhesion of a frit when the first substrate and the second substrate are adhered to each other by using the frit. The frit sealing system, adhering the first substrate and the second substrate by using the frit, includes: a bed member on which the first substrate is placed; a laser irradiation member irradiating a laser to the frit between the first substrate and the second substrate; and a pressure member disposed on an upper part of the first substrate and the second substrate irradiated with the laser and adhered, thereby pressurizing the first substrate and the second substrate irradiated with the laser and adhered.
摘要翻译：玻璃料密封系统和通过使用玻璃料密封系统制造有机发光显示装置的方法，更具体地说，是玻璃料密封系统和使用玻璃料密封系统制造有机发光显示装置的方法，其包括压力构件，以便对第一基板和第二基板进行物理加压，由此通过使用玻璃料将第一基板和第二基板彼此粘合时增加玻璃料的粘合。玻璃料密封系统通过使用玻璃料粘合第一基板和第二基板，包括：第一基板放置在其上的床构件; 将激光照射到第一基板和第二基板之间的玻璃料的激光照射部件; 以及压力构件，其设置在所述第一基板的上部，并且所述第二基板被照射激光并粘合，从而对被所述激光照射的所述第一基板和所述第二基板加压并粘附。

4. 发明授权

US07942716B2 Frit sealing system and method of manufacturing organic light emitting display device 有权
标题翻译：玻璃料密封系统和制造有机发光显示装置的方法
公开(公告)号：US07942716B2
公开(公告)日：2011-05-17
申请号：US12378463
申请日：2009-02-13
申请人： Jung-Min Lee , Seok-Joon Yoon , Choong-Ho Lee , Hee-Seong Jeong , Tae-Wook Kang , Won-Kyu Choe
发明人： Jung-Min Lee , Seok-Joon Yoon , Choong-Ho Lee , Hee-Seong Jeong , Tae-Wook Kang , Won-Kyu Choe
IPC分类号： H01J9/00
CPC分类号： H01L21/67126 , B32B37/065 , B32B2309/68 , B32B2310/0843 , B32B2457/202 , B32B2457/206 , H01L27/3244 , H01L51/5246 , H01L2924/0002 , H01L2924/00
摘要： A frit sealing system and a method of manufacturing an organic light emitting display device by using the frit sealing system, and more particularly, a frit sealing system and a method of manufacturing an organic light emitting display device by using the frit sealing system, which includes a pressure member so as to physically pressurize a first substrate and a second substrate, thereby increasing adhesion of a frit when the first substrate and the second substrate are adhered to each other by using the frit. The frit sealing system, adhering the first substrate and the second substrate by using the frit, includes: a bed member on which the first substrate is placed; a laser irradiation member irradiating a laser to the frit between the first substrate and the second substrate; and a pressure member disposed on an upper part of the first substrate and the second substrate irradiated with the laser and adhered, thereby pressurizing the first substrate and the second substrate irradiated with the laser and adhered.
摘要翻译：玻璃料密封系统和通过使用玻璃料密封系统制造有机发光显示装置的方法，更具体地说，是玻璃料密封系统和使用玻璃料密封系统制造有机发光显示装置的方法，其包括压力构件，以便对第一基板和第二基板进行物理加压，由此通过使用玻璃料将第一基板和第二基板彼此粘合时增加玻璃料的粘合。玻璃料密封系统通过使用玻璃料粘合第一基板和第二基板，包括：第一基板放置在其上的床构件; 将激光照射到第一基板和第二基板之间的玻璃料的激光照射部件; 以及压力构件，其设置在所述第一基板的上部，并且所述第二基板被照射激光并粘合，从而对被所述激光照射的所述第一基板和所述第二基板加压并粘附。

5. 发明授权

US07807009B2 Hermetic sealing apparatus and hermetic sealing method using frit 有权
标题翻译：密封装置和使用玻璃料的气密密封方法
公开(公告)号：US07807009B2
公开(公告)日：2010-10-05
申请号：US12228994
申请日：2008-08-18
申请人： Jung-Min Lee , Choong-Ho Lee , Seok-Joon Yoon , Won-Kyu Choe , Tae-Wook Kang
发明人： Jung-Min Lee , Choong-Ho Lee , Seok-Joon Yoon , Won-Kyu Choe , Tae-Wook Kang
IPC分类号： B32B37/06
CPC分类号： B32B37/0046 , B23K26/0661 , B32B37/065 , B32B2309/02 , B32B2310/0843 , B32B2457/202 , B32B2457/206 , H01L21/67092 , H01L21/67115 , H01L21/67126 , H01L51/5246 , H01L2924/0002 , H01L2924/00
摘要： An hermetic sealing apparatus is discussed. The apparatus may include one or more of the following a glass mask disposed on an upper surface of a first substrate, a support member disposed on an upper surface of the glass mask, a laser irradiation member positioned spaced on the upper surface of the glass mask, a plurality of lower support members disposed in a contour region of a lower surface of the second substrate, and pressing members disposed on a lower surface of the lower support members.
摘要翻译：讨论了一种密封装置。该装置可以包括以下中的一个或多个设置在第一基板的上表面上的玻璃掩模，设置在玻璃掩模的上表面上的支撑构件，位于玻璃掩模的上表面上的激光照射构件，设置在所述第二基板的下表面的轮廓区域中的多个下支撑构件和设置在所述下支撑构件的下表面上的按压构件。

6. 发明申请

US20090229745A1 Hermetic sealing apparatus and hermetic sealing method using frit 有权
标题翻译：密封装置和使用玻璃料的气密密封方法
公开(公告)号：US20090229745A1
公开(公告)日：2009-09-17
申请号：US12228994
申请日：2008-08-18
申请人： Jung-Min Lee , Choong-Ho Lee , Seok-Joon Yoon , Won-Kyu Choe , Tae-Wook Kang
发明人： Jung-Min Lee , Choong-Ho Lee , Seok-Joon Yoon , Won-Kyu Choe , Tae-Wook Kang
IPC分类号： B32B37/06
CPC分类号： B32B37/0046 , B23K26/0661 , B32B37/065 , B32B2309/02 , B32B2310/0843 , B32B2457/202 , B32B2457/206 , H01L21/67092 , H01L21/67115 , H01L21/67126 , H01L51/5246 , H01L2924/0002 , H01L2924/00
摘要： An hermetic sealing apparatus is discussed. The apparatus may include one or more of the following a glass mask disposed on an upper surface of a first substrate, a support member disposed on an upper surface of the glass mask, a laser irradiation member positioned spaced on the upper surface of the glass mask, a plurality of lower support members disposed in a contour region of a lower surface of the second substrate, and pressing members disposed on a lower surface of the lower support members.
摘要翻译：讨论了一种密封装置。该装置可以包括以下中的一个或多个设置在第一基板的上表面上的玻璃掩模，设置在玻璃掩模的上表面上的支撑构件，位于玻璃掩模的上表面上的激光照射构件，设置在所述第二基板的下表面的轮廓区域中的多个下支撑构件和设置在所述下支撑构件的下表面上的按压构件。

7. 发明申请

US20100310759A1 METHOD AND APPARATUS FOR CLEANING ORGANIC DEPOSITION MATERIALS 有权
标题翻译：清洁有机沉积材料的方法和装置
公开(公告)号：US20100310759A1
公开(公告)日：2010-12-09
申请号：US12795896
申请日：2010-06-08
申请人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
发明人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
IPC分类号： C23C16/04 , B05D5/06
CPC分类号： C23C14/042 , B08B7/0035 , B08B7/0042 , C23C14/564 , H01L51/56
摘要： A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.
摘要翻译：清理积聚在掩模上的有机沉积材料的方法包括：在包括沉积源的沉积室中，使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统，包括：沉积室，包括沉积源; 以及保持在与沉积室基本相同的真空的储存室，并且包括清除积聚在掩模上的有机沉积材料的清洁装置。

8. 发明授权

US09174250B2 Method and apparatus for cleaning organic deposition materials 有权
标题翻译：用于清洁有机沉积材料的方法和装置
公开(公告)号：US09174250B2
公开(公告)日：2015-11-03
申请号：US13208261
申请日：2011-08-11
申请人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
发明人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
IPC分类号： B05D5/12 , B08B7/00 , C23C14/04 , C23C14/56 , H01L51/00 , H01L51/56
CPC分类号： B08B7/0035 , B08B7/0042 , C23C14/042 , C23C14/564 , H01L51/0025 , H01L51/56
摘要： A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.
摘要翻译：清理积聚在掩模上的有机沉积材料的方法包括：在包括沉积源的沉积室中，使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统，包括：沉积室，包括沉积源; 以及保持在与沉积室基本相同的真空的储存室，并且包括清除积聚在掩模上的有机沉积材料的清洁装置。

9. 发明授权

US08802200B2 Method and apparatus for cleaning organic deposition materials 有权
标题翻译：用于清洁有机沉积材料的方法和装置
公开(公告)号：US08802200B2
公开(公告)日：2014-08-12
申请号：US12795896
申请日：2010-06-08
申请人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
发明人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
IPC分类号： B05D3/00
CPC分类号： C23C14/042 , B08B7/0035 , B08B7/0042 , C23C14/564 , H01L51/56
摘要： A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.
摘要翻译：清理积聚在掩模上的有机沉积材料的方法包括：在包括沉积源的沉积室中，使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统，包括：沉积室，包括沉积源; 以及保持在与沉积室基本相同的真空的储存室，并且包括清除积聚在掩模上的有机沉积材料的清洁装置。

10. 发明申请

US20110293819A1 METHOD AND APPARATUS FOR CLEANING ORGANIC DEPOSITION MATERIALS 有权
标题翻译：清洁有机沉积材料的方法和装置
公开(公告)号：US20110293819A1
公开(公告)日：2011-12-01
申请号：US13208261
申请日：2011-08-11
申请人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
发明人： Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
IPC分类号： B05D5/06 , C23C14/04
CPC分类号： B08B7/0035 , B08B7/0042 , C23C14/042 , C23C14/564 , H01L51/0025 , H01L51/56
摘要： A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.
摘要翻译：清理积聚在掩模上的有机沉积材料的方法包括：在包括沉积源的沉积室中，使用包括多个槽的掩模在基板上形成有机沉积材料图案; 将掩模运送到保持在真空并邻近沉积室的储存室; 并且部分地清除沿着储存室中的掩模的槽的边界积聚的有机沉积材料。一种清除积聚在具有多个狭缝的掩模上的有机沉积材料的系统，包括：沉积室，包括沉积源; 以及保持在与沉积室基本相同的真空的储存室，并且包括清除积聚在掩模上的有机沉积材料的清洁装置。

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