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    • 1. 发明申请
    • DISTANCE MEASURING APPARATUS
    • 距离测量装置
    • US20100245799A1
    • 2010-09-30
    • US12555980
    • 2009-09-09
    • Hong Ki KIMJoo Hong KIMDong Ik SHINJung Eun NOHBack Kue LEEBoris KIRILLOV
    • Hong Ki KIMJoo Hong KIMDong Ik SHINJung Eun NOHBack Kue LEEBoris KIRILLOV
    • G01C3/02
    • G01C3/08
    • A distance measuring apparatus according to an aspect of the invention may include: a light source irradiating reference light to measure a distance; a lower reflective mirror reflecting the reference light to irradiate the reference light onto a peripheral obstacle, and reflecting reflected light, rebounded from an obstacle, so that the reflected light moves in an opposite direction along the same optical path as the reference light; a sensor lens arranged above the lower reflective mirror, converting the reference light into parallel light beams and focusing the reflected light; an upper reflective mirror arranged above the sensor lens and switching an optical path of the reflected light; and an optical sensor receiving the reflected light having the optical path thereof switched by the upper reflective mirror, wherein the upper reflective mirror reflects back the reflected light, focused after passing through the sensor lens, in an opposite direction to a moving direction thereof so that a focus of the reflected light is formed between the lower reflective mirror and the upper reflective mirror.
    • 根据本发明的一个方面的距离测量装置可以包括:照射参考光以测量距离的光源; 反射参考光的下反射镜,将参考光照射到周边障碍物上,反射从障碍物反弹的反射光,使得反射光沿与参考光相同的光路沿相反方向移动; 设置在下反射镜上方的传感器透镜,将参考光转换成平行光束并聚焦反射光; 上反射镜布置在传感器透镜之上并切换反射光的光路; 以及光学传感器,其接收由上反射镜切换的光路的反射光,其中上反射镜反射反射光,该反射光在通过传感器透镜后聚焦,沿与其移动方向相反的方向聚焦,使得 在下反射镜和上反射镜之间形成反射光的焦点。
    • 3. 发明申请
    • DISTANCE MEASUING APPARATUS
    • 距离测量装置
    • US20100097598A1
    • 2010-04-22
    • US12504197
    • 2009-07-16
    • Dong Ik SHINHong Ki KIMBack Kue LEEYoung Su YUN
    • Dong Ik SHINHong Ki KIMBack Kue LEEYoung Su YUN
    • G01C3/08
    • G01S7/4812G01S17/08G02B3/00
    • A distance measuring apparatus includes a light source unit generating reference light for distance measuring, a light receiving device receiving light reflected from an object to be measured, which has received the reference light, a mirror controlling a path of the reference light, and controlling a path of light, reflected from the object to be measured, toward the light receiving device, and a sensor lens focusing the light reflected from the mirror on the light receiving device. The sensor lens includes a lens portion refracting light, a flange portion provided around the circumference of the lens portion and including a coupling portion for fixing the sensor lens, and a light passing portion formed at the lens portion.
    • 距离测量装置包括产生用于距离测量的参考光的光源单元,接收参考光的被测量物体的光的受光装置,控制参考光的路径的镜子,以及控制 从被测量物体反射的光朝向光接收装置,以及将从反射镜反射的光聚焦在光接收装置上的传感器透镜。 传感器透镜包括透镜部折射光,设置在透镜部分周围的凸缘部分,并且包括用于固定传感器透镜的耦合部分和形成在透镜部分处的光通过部分。
    • 4. 发明申请
    • Wafer lens aligning method and wafer lens manufactured by the same
    • 晶圆透镜对准方法及其制造的晶片透镜
    • US20090161106A1
    • 2009-06-25
    • US12076546
    • 2008-03-19
    • Dong Ik SHINHyun Jun KIMSeok Cheon LeeSun Ok Kim
    • Dong Ik SHINHyun Jun KIMSeok Cheon LeeSun Ok Kim
    • G01B11/00
    • B29D11/00365B29D11/005
    • Provided is a wafer lens aligning method including the steps of: preparing a lens mold that has a lens forming portion formed in the central portion thereof and a groove formed around the lens forming portion; preparing a wafer that has two or more position recognition patterns formed at arbitrary positions thereof and a plurality of minute patterns formed in array at lens formation positions; loading the wafer, searching the position recognition patterns, and setting a coordinate system; causing the coordinate system of the wafer to coincide with the coordinate system of the lens mold; causing the center among the minute patterns formed on the wafer to coincide with the center of the lens mold so as to align the wafer with the lens mold; and forming a master lens in the lens formation positions arranged on the wafer.
    • 提供一种晶片透镜对准方法,包括以下步骤:制备在其中心部分形成有透镜形成部分的透镜模具和形成在透镜形成部分周围的凹槽; 制备在其任意位置形成有两个或更多个位置识别图案的晶片和在透镜形成位置处阵列形成的多个微小图案; 加载晶片,搜索位置识别模式,并设置坐标系; 导致晶片的坐标系与镜片模具的坐标系重合; 使得在晶片上形成的微小图案之间的中心与透镜模具的中心一致,以使晶片与透镜模具对准; 以及在布置在晶片上的透镜形成位置形成主透镜。