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1. 发明授权

US08413082B2 Method for designing masks used to form electronic components 有权
标题翻译：用于形成用于形成电子部件的掩模的方法
公开(公告)号：US08413082B2
公开(公告)日：2013-04-02
申请号：US13117164
申请日：2011-05-27
申请人： Julia Castellan
发明人： Julia Castellan
IPC分类号： G06F17/50 , G06F19/00 , G03F1/00 , G21K5/00
CPC分类号： G06F17/5081 , G06F2217/12 , Y02P90/265
摘要： A method for designing masks adapted to the forming of integrated circuits, including the steps of: (a) forming a first test file including a set of configurations of integrated circuit elements; (b) forming a second test file comprising the elements of the first test file, less the elements corresponding to configurations forbidden by design rule manuals; (c) trans-forming the second test file by means of a set of logical operations implemented by computing means to obtain a mask file; (d) testing the mask file and, if the test is negative, modifying the design rule manuals; and (e) repeating steps (a) to (d) until the test of step (d) is positive.
摘要翻译：一种用于设计适合于形成集成电路的掩模的方法，包括以下步骤：（a）形成包括集成电路元件的一组配置的第一测试文件; （b）形成包括第一测试文件的元素的第二测试文件，少于与设计规则手册禁止的配置相对应的元素; （c）通过由计算装置实现的一组逻辑操作来转换第二测试文件以获得掩模文件; （d）测试掩模文件，如果测试为负，修改设计规则手册; 和（e）重复步骤（a）至（d），直到步骤（d）的测试为正。

2. 发明申请

US20110302539A1 METHOD FOR DESIGNING MASKS USED TO FORM ELECTRONIC COMPONENTS 有权
标题翻译：用于设计用于形成电子组件的掩码的方法
公开(公告)号：US20110302539A1
公开(公告)日：2011-12-08
申请号：US13117164
申请日：2011-05-27
申请人： Julia Castellan
发明人： Julia Castellan
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F2217/12 , Y02P90/265
摘要： A method for designing masks adapted to the forming of integrated circuits, including the steps of: (a) forming a first test file including a set of configurations of integrated circuit elements; (b) forming a second test file comprising the elements of the first test file, less the elements corresponding to configurations forbidden by design rule manuals; (c) trans-forming the second test file by means of a set of logical operations implemented by computing means to obtain a mask file; (d) testing the mask file and, if the test is negative, modifying the design rule manuals; and (e) repeating steps (a) to (d) until the test of step (d) is positive.
摘要翻译：一种用于设计适合于形成集成电路的掩模的方法，包括以下步骤：（a）形成包括集成电路元件的一组配置的第一测试文件; （b）形成包括第一测试文件的元素的第二测试文件，少于与设计规则手册禁止的配置相对应的元素; （c）通过由计算装置实现的一组逻辑操作来转换第二测试文件以获得掩模文件; （d）测试掩模文件，如果测试为负，修改设计规则手册; 和（e）重复步骤（a）至（d），直到步骤（d）的测试为正。

3. 发明授权

US08853615B2 Ultraviolet radiation measurement sensor 有权
标题翻译：紫外线辐射测量传感器
公开(公告)号：US08853615B2
公开(公告)日：2014-10-07
申请号：US13552787
申请日：2012-07-19
申请人： Julia Castellan , Philippe Boivin
发明人： Julia Castellan , Philippe Boivin
IPC分类号： G01J1/44 , G01J1/42
CPC分类号： G01J1/4228 , G01J1/429 , G01J1/44
摘要： A method for measuring radiation of energy photons, such as ultraviolet radiation, on a surface, may include programming at least one transistor by at least transmitting an electric charge to it. The method may further include measuring an electrical quantity of the at least one transistor receiving radiation of energy photons and estimating, based on this electrical quantity, an amount of radiation received.
摘要翻译：用于测量表面上的能量光子（例如紫外线辐射）的辐射的方法可以包括通过至少向其传输电荷来编程至少一个晶体管。该方法还可以包括测量接收能量光子辐射的至少一个晶体管的电量，并且基于该电量估计接收到的辐射量。

4. 发明申请

US20130020477A1 ULTRAVIOLET RADIATION MEASUREMENT SENSOR 有权
标题翻译：超声波辐射测量传感器
公开(公告)号：US20130020477A1
公开(公告)日：2013-01-24
申请号：US13552787
申请日：2012-07-19
申请人： Julia Castellan , Philippe Boivin
发明人： Julia Castellan , Philippe Boivin
IPC分类号： G01J1/44 , G01D18/00
CPC分类号： G01J1/4228 , G01J1/429 , G01J1/44
摘要： A method for measuring radiation of energy photons, such as ultraviolet radiation, on a surface, may include programming at least one transistor by at least transmitting an electric charge to it. The method may further include measuring an electrical quantity of the at least one transistor receiving radiation of energy photons and estimating, based on this electrical quantity, an amount of radiation received.
摘要翻译：用于测量表面上的能量光子（例如紫外线辐射）的辐射的方法可以包括通过至少向其传输电荷来编程至少一个晶体管。该方法还可以包括测量接收能量光子辐射的至少一个晶体管的电量，并且基于该电量估计接收到的辐射量。

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