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1. 发明申请

US20130255054A1 METHOD OF MANUFACTURING PARTICLE-BASED IMAGE DISPLAY 有权
公开(公告)号：US20130255054A1
公开(公告)日：2013-10-03
申请号：US13435767
申请日：2012-03-30
申请人： Jui-Yu LIN , Jen-Ming Chang , Jiunn-Jye Hwang , Jung-Yang Juang , Ming-Hai Chang , Hao-Jan Wan
发明人： Jui-Yu LIN , Jen-Ming Chang , Jiunn-Jye Hwang , Jung-Yang Juang , Ming-Hai Chang , Hao-Jan Wan
IPC分类号： B23P17/04 , G01J4/00
CPC分类号： G01J4/00 , G02F1/167 , Y10T29/49718 , Y10T29/49721 , Y10T29/49764 , Y10T29/49769
摘要： A method of manufacturing a particle-based image display having a plurality of imaging cells is disclosed. The method includes filling the plurality of imaging cells with a plurality of first particles, identifying a defect associated with one or more of the imaging cells, and repairing the defect within a unit corresponding to part of the plurality of imaging cells.

2. 发明授权

US08976349B2 Method of manufacturing particle-based image display 有权
标题翻译：制造基于粒子的图像显示方法
公开(公告)号：US08976349B2
公开(公告)日：2015-03-10
申请号：US13435767
申请日：2012-03-30
申请人： Jui-Yu Lin , Jen-Ming Chang , Jiunn-Jye Hwang , Jung-Yang Juang , Ming-Hai Chang , Hao-Jan Wan
发明人： Jui-Yu Lin , Jen-Ming Chang , Jiunn-Jye Hwang , Jung-Yang Juang , Ming-Hai Chang , Hao-Jan Wan
IPC分类号： G01N21/00 , G01N21/47 , G01N21/88
CPC分类号： G01J4/00 , G02F1/167 , Y10T29/49718 , Y10T29/49721 , Y10T29/49764 , Y10T29/49769
摘要： A method of manufacturing a particle-based image display having a plurality of imaging cells is disclosed. The method includes filling the plurality of imaging cells with a plurality of first particles, identifying a defect associated with one or more of the imaging cells, and repairing the defect within a unit corresponding to part of the plurality of imaging cells.
摘要翻译：公开了一种制造具有多个成像单元的基于粒子的图像显示器的方法。该方法包括用多个第一颗粒填充多个成像单元，识别与一个或多个成像单元相关联的缺陷，以及修复与多个成像单元的一部分相对应的单元内的缺陷。

3. 发明授权

US08396281B2 Apparatus and method for inspecting substrate internal defects 有权
标题翻译：用于检查基板内部缺陷的装置和方法
公开(公告)号：US08396281B2
公开(公告)日：2013-03-12
申请号：US12731662
申请日：2010-03-25
申请人： Jen-Ming Chang , Yu-Hsi Lee , Yen-Chun Chou , Cheng-Kai Chen , Jui-Yu Lin
发明人： Jen-Ming Chang , Yu-Hsi Lee , Yen-Chun Chou , Cheng-Kai Chen , Jui-Yu Lin
IPC分类号： G06K9/00
CPC分类号： G01N21/9505
摘要： A method for inspecting substrate internal defects is disclosed. The method provides at least one light source disposed on a lateral side of a substrate and configured to emit a light beam to the lateral side for correspondingly penetrating the substrate. The method also provides an image capturing module for retrieving an image of the upper surface, wherein an incident angle of the light beam to the respective lateral side is limited within a first predetermined angle to allow the light beam to have a total reflection in the substrate. Thus, the light beam is blocked by internal defects when transmitting within the substrate to generate bright spots to be detected by the image capturing module for locating the defect position. The method provides a better image definition of internal defects images. The present invention further provides an apparatus based on the method for inspecting substrate internal defects.
摘要翻译：公开了一种用于检查衬底内部缺陷的方法。该方法提供至少一个光源，其设置在基板的横向侧上并且被配置为向侧面发射光束以相应地穿透基板。该方法还提供了一种用于检索上表面的图像的图像捕获模块，其中光束到相应横向侧的入射角被限制在第一预定角度内，以允许光束在基板中具有全反射。因此，当在衬底内发射时，光束被内部缺陷阻挡，以产生用于定位缺陷位置的图像捕获模块要检测的亮点。该方法为内部缺陷图像提供了更好的图像定义。本发明还提供一种基于检查衬底内部缺陷的方法的装置。

4. 发明申请

US20100142796A1 Inspection method and apparatus for substrate 审中-公开
标题翻译：基板检查方法和装置
公开(公告)号：US20100142796A1
公开(公告)日：2010-06-10
申请号：US12315699
申请日：2008-12-05
申请人： Jen-Ming Chang , Mau-Hsiung Hsu , Yen-Hsin Tseng , Guo-Cheng Ho , Hsuan Yang , Chih-Chieh Yu , Jia-Lin Shen , Jui-Yu Lin
发明人： Jen-Ming Chang , Mau-Hsiung Hsu , Yen-Hsin Tseng , Guo-Cheng Ho , Hsuan Yang , Chih-Chieh Yu , Jia-Lin Shen , Jui-Yu Lin
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/9505
摘要： An inspection method and apparatus for a substrate are provided. The inspection apparatus includes an optical unit generating a light illuminating the substrate to generate an image, a sensor array receiving the image having a light wave comprising a wave-band within a range between 700 nm to 1500 nm, and an image processing unit capturing the image.
摘要翻译：提供了一种用于基板的检查方法和装置。所述检查装置包括产生照射所述基板以产生图像的光的光学单元，接收具有包括在700nm至1500nm范围内的波段的光波的图像的传感器阵列和捕获所述图像处理单元的图像处理单元图片。

5. 发明申请

US20120044346A1 APPARATUS AND METHOD FOR INSPECTING INTERNAL DEFECT OF SUBSTRATE 审中-公开
标题翻译：检测基板内部缺陷的装置和方法
公开(公告)号：US20120044346A1
公开(公告)日：2012-02-23
申请号：US13028692
申请日：2011-02-16
申请人： Yen-Chun CHOU , Cheng-Kai Chen , Jen-Ming Chang , Yu-Hsi Lee , Che-Min Lin
发明人： Yen-Chun CHOU , Cheng-Kai Chen , Jen-Ming Chang , Yu-Hsi Lee , Che-Min Lin
IPC分类号： H04N9/04
CPC分类号： H01L21/67288 , G01N21/9505 , H01L27/14603
摘要： An apparatus inspects internal defects of substrate, the substrate having an upper surface and a plurality of side surfaces connected with the upper surface. The apparatus includes at least one light source arranged on one of the side surfaces of the substrate and emitting a light beam on the corresponding side surface and into the substrate, the incident angle of the light beam is limited to a first predetermined angle within a range allowing the light beam to transmit in a total internal reflection manner in the substrate; an image capturing module arranged above the substrate to capture the image of the upper surface of the substrate, a light shield mask arranged between the image capturing module and the substrate and shielding an edge portion of the upper surface of the substrate.
摘要翻译：设备检查衬底的内部缺陷，衬底具有与上表面连接的上表面和多个侧表面。该装置包括布置在基板的一个侧表面上的至少一个光源，并在对应的侧表面上发射光束并进入基板，光束的入射角被限制在一定范围内的第一预定角度允许光束以全内反射方式在衬底中传输; 图像捕获模块，布置在所述基板上方以捕获所述基板的上表面的图像;布置在所述图像捕获模块和所述基板之间并遮蔽所述基板的上表面的边缘部分的遮光掩模。

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