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1. 发明申请

US20090214823A1 METHODS FOR ALIGNING POLYMER FILMS AND RELATED STRUCTURES 有权
标题翻译：聚合物膜和相关结构的方法
公开(公告)号：US20090214823A1
公开(公告)日：2009-08-27
申请号：US12058006
申请日：2008-03-28
申请人： Joy Cheng , Daniel P. Sanders , Ratnam Sooriyakumaran
发明人： Joy Cheng , Daniel P. Sanders , Ratnam Sooriyakumaran
IPC分类号： B32B3/10 , B05D1/00 , B05D3/00 , B01J19/00 , B32B9/00 , B32B3/00
CPC分类号： H01L21/0337 , B81B2207/056 , B81C1/00031 , Y10T428/24322 , Y10T428/24612 , Y10T428/24802
摘要： Methods and a structure. The method includes applying a solution including two or more immiscible polymers to a substructure including features having at least one sidewall and a bottom surface. The immiscible polymers include a first polymer and a second polymer. The at least one sidewall includes a material. A selective chemical affinity of the first polymer for the material is greater than a selective chemical affinity of the second polymer for the material. The first polymer is segregated from the second polymer. The first polymer selectively migrates to the at least one sidewall, resulting in the first polymer being disposed between the at least one sidewall and the second polymer. One or more immiscible polymers is selectively removed. At least one immiscible polymer remains, resulting in forming structures including the substructure and the immiscible polymer remaining. Two additional methods and a structure are also included.
摘要翻译：方法和结构。该方法包括将包含两种或更多种不混溶聚合物的溶液施加到包括具有至少一个侧壁和底部表面的特征的子结构中。不混溶的聚合物包括第一聚合物和第二聚合物。所述至少一个侧壁包括材料。第一聚合物对材料的选择性化学亲和力大于第二聚合物对材料的选择性化学亲和力。第一聚合物与第二聚合物分离。第一聚合物选择性地迁移到至少一个侧壁，导致第一聚合物设置在至少一个侧壁和第二聚合物之间。选择性地除去一种或多种不混溶的聚合物。残留至少一种不混溶的聚合物，导致形成结构，其中包括亚结构和残留的不混溶聚合物。还包括两种额外的方法和结构。

2. 发明申请

US20090179001A1 METHOD OF USE OF EPOXY-CONTAINING CYCLOALIPHATIC ACRYLIC POLYMERS AS ORIENTATION CONTROL LAYERS FOR BLOCK COPOLYMER THIN FILMS 有权
标题翻译：使用环氧基丙烯酸聚合物作为块状共聚物薄膜的方向控制层的方法
公开(公告)号：US20090179001A1
公开(公告)日：2009-07-16
申请号：US12013444
申请日：2008-01-12
申请人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
发明人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
IPC分类号： B32B37/14 , B32B38/10
CPC分类号： B05D5/00 , B05D7/14 , B05D7/52 , C08L53/00 , C09D125/14 , C09D153/00
摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.
摘要翻译：本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。在另外的实施方案中，公开了双层和三层成像方案。

3. 发明授权

US07906031B2 Aligning polymer films 有权
标题翻译：对准聚合物膜
公开(公告)号：US07906031B2
公开(公告)日：2011-03-15
申请号：US12036091
申请日：2008-02-22
申请人： Joy Cheng , Daniel P. Sanders , Ratnam Sooriyakumaran
发明人： Joy Cheng , Daniel P. Sanders , Ratnam Sooriyakumaran
IPC分类号： C03C15/00
CPC分类号： H01L21/0337 , B81B2207/056 , B81C1/00031 , Y10T428/24322 , Y10T428/24612 , Y10T428/24802
摘要： A Method. The method includes forming a substructure, on a substrate, including a feature having a sidewall of a first material and a bottom surface of a second material. Applying a solution including two immiscible polymers and third material to the substructure. The immiscible polymers include a first and second polymer. A selective chemical affinity of the first polymer for the material is greater than a selective chemical affinity of the second polymer for the material. The first polymer is segregated from the second polymer. The first polymer selectively migrates to the at least one sidewall, resulting in the first polymer being disposed between the at least one sidewall and the second polymer. The first polymer is selectively removed. The second polymer remains, resulting in forming structures including the substructure, the third material, and the second polymer. The substructure has a pattern. The pattern is transferred to the substrate.
摘要翻译：一个方法。该方法包括在基底上形成子结构，其包括具有第一材料的侧壁和第二材料的底表面的特征。将包括两种不混溶的聚合物和第三种材料的溶液应用于底层结构。不混溶的聚合物包括第一和第二聚合物。第一聚合物对材料的选择性化学亲和力大于第二聚合物对材料的选择性化学亲和力。第一聚合物与第二聚合物分离。第一聚合物选择性地迁移到至少一个侧壁，导致第一聚合物设置在至少一个侧壁和第二聚合物之间。选择性地除去第一种聚合物。残留第二聚合物，导致形成包括亚结构，第三材料和第二聚合物的结构。子结构具有图案。将图案转移到基底。

4. 发明授权

US07521090B1 Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films 有权
标题翻译：使用含环氧基的脂环族丙烯酸聚合物作为嵌段共聚物薄膜的取向控制层的方法
公开(公告)号：US07521090B1
公开(公告)日：2009-04-21
申请号：US12060500
申请日：2008-04-01
申请人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
发明人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
IPC分类号： B05D5/00
CPC分类号： B05D5/00 , B05D7/14 , B05D7/52 , C08L53/00 , C09D125/14 , C09D153/00
摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.
摘要翻译：本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。在另外的实施方案中，公开了双层和三层成像方案。

5. 发明授权

US07989026B2 Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films 有权
标题翻译：使用含环氧基的脂环族丙烯酸聚合物作为嵌段共聚物薄膜的取向控制层的方法
公开(公告)号：US07989026B2
公开(公告)日：2011-08-02
申请号：US12013444
申请日：2008-01-12
申请人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
发明人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
IPC分类号： B05D5/00
CPC分类号： B05D5/00 , B05D7/14 , B05D7/52 , C08L53/00 , C09D125/14 , C09D153/00
摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.
摘要翻译：本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。在另外的实施方案中，公开了双层和三层成像方案。

6. 发明申请

US20090212016A1 Aligning polymer films 有权
标题翻译：对准聚合物膜
公开(公告)号：US20090212016A1
公开(公告)日：2009-08-27
申请号：US12036091
申请日：2008-02-22
申请人： Joy Cheng , Daniel P. Sanders , Ratnam Sooriyakumaran
发明人： Joy Cheng , Daniel P. Sanders , Ratnam Sooriyakumaran
IPC分类号： B44C1/22
CPC分类号： H01L21/0337 , B81B2207/056 , B81C1/00031 , Y10T428/24322 , Y10T428/24612 , Y10T428/24802
摘要： A Method. The method includes forming a substructure, on a substrate, including a feature having a sidewall of a first material and a bottom surface of a second material. Applying a solution including two immiscible polymers and third material to the substructure. The immiscible polymers include a first and second polymer. A selective chemical affinity of the first polymer for the material is greater than a selective chemical affinity of the second polymer for the material. The first polymer is segregated from the second polymer. The first polymer selectively migrates to the at least one sidewall, resulting in the first polymer being disposed between the at least one sidewall and the second polymer. The first polymer is selectively removed. The second polymer remains, resulting in forming structures including the substructure, the third material, and the second polymer. The substructure has a pattern. The pattern is transferred to the substrate.
摘要翻译：一个方法。该方法包括在基底上形成子结构，其包括具有第一材料的侧壁和第二材料的底表面的特征。将包括两种不混溶的聚合物和第三种材料的溶液应用于底层结构。不混溶的聚合物包括第一和第二聚合物。第一聚合物对材料的选择性化学亲和力大于第二聚合物对材料的选择性化学亲和力。第一聚合物与第二聚合物分离。第一聚合物选择性地迁移到至少一个侧壁，导致第一聚合物设置在至少一个侧壁和第二聚合物之间。选择性地除去第一种聚合物。残留第二聚合物，导致形成包括亚结构，第三材料和第二聚合物的结构。子结构具有图案。将图案转移到基底。

7. 发明授权

US08486489B2 Methods for aligning polymer films and related structures 有权
标题翻译：聚合物膜和相关结构的对准方法
公开(公告)号：US08486489B2
公开(公告)日：2013-07-16
申请号：US12058006
申请日：2008-03-28
申请人： Joy Cheng , Daniel P. Sanders , Ratnam Sooriyakumaran
发明人： Joy Cheng , Daniel P. Sanders , Ratnam Sooriyakumaran
IPC分类号： B05D3/00
CPC分类号： H01L21/0337 , B81B2207/056 , B81C1/00031 , Y10T428/24322 , Y10T428/24612 , Y10T428/24802
摘要： Methods and a structure. The method includes applying a solution including two or more immiscible polymers to a substructure including features having at least one sidewall and a bottom surface. The immiscible polymers include a first polymer and a second polymer. The at least one sidewall includes a material. A selective chemical affinity of the first polymer for the material is greater than a selective chemical affinity of the second polymer for the material. The first polymer is segregated from the second polymer. The first polymer selectively migrates to the at least one sidewall, resulting in the first polymer being disposed between the at least one sidewall and the second polymer. One or more immiscible polymers is selectively removed. At least one immiscible polymer remains, resulting in forming structures including the substructure and the immiscible polymer remaining. Two additional methods and a structure are also included.
摘要翻译：方法和结构。该方法包括将包含两种或更多种不混溶聚合物的溶液施加到包括具有至少一个侧壁和底部表面的特征的子结构中。不混溶的聚合物包括第一聚合物和第二聚合物。所述至少一个侧壁包括材料。第一聚合物对材料的选择性化学亲和力大于第二聚合物对材料的选择性化学亲和力。第一聚合物与第二聚合物分离。第一聚合物选择性地迁移到至少一个侧壁，导致第一聚合物设置在至少一个侧壁和第二聚合物之间。选择性地除去一种或多种不混溶的聚合物。残留至少一种不混溶的聚合物，导致形成结构，其中包括亚结构和残留的不混溶聚合物。还包括两种额外的方法和结构。

8. 发明申请

US20120135146A1 METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES 有权
标题翻译：使用分散聚合物混合物形成地形特征的方法
公开(公告)号：US20120135146A1
公开(公告)日：2012-05-31
申请号：US12957008
申请日：2010-11-30
申请人： Joy Cheng , Hayato Namai , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran
发明人： Joy Cheng , Hayato Namai , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran
IPC分类号： B05D3/12
CPC分类号： B81C1/00031 , B81C2201/0149 , H01L21/0337 , H01L21/0338
摘要： Methods are disclosed for forming topographical features. In one method, a pre-patterned structure is provided which comprises i) a support member having a surface and ii) an element for topographically guiding segregation of a polymer mixture including a first polymer and a second polymer, the element comprising a feature having a sidewall adjoined to the surface. The polymer mixture is disposed on the pre-patterned structure, wherein the disposed polymer mixture has contact with the sidewall and the surface. The first polymer and the second polymer are segregated in a plane parallel to the surface, thereby forming a segregated structure comprising a first polymer domain and a second polymer domain. The first polymer domain and/or the second polymer domain are lithographically patterned, thereby forming topographical features comprising at least one of i) a first feature comprising a lithographically patterned first polymer domain and ii) a second feature comprising a lithographically patterned second polymer domain.
摘要翻译：公开了形成形貌特征的方法。在一种方法中，提供预先图案化的结构，其包括i）具有表面的支撑构件和ii）用于拓扑地引导包括第一聚合物和第二聚合物的聚合物混合物的偏析的元件，所述元件包括具有侧壁与表面相邻。聚合物混合物设置在预图案化结构上，其中所设置的聚合物混合物与侧壁和表面接触。第一聚合物和第二聚合物在平行于表面的平面中分离，从而形成包含第一聚合物结构域和第二聚合物结构域的分离结构。第一聚合物结构域和/或第二聚合物结构域被光刻图案化，从而形成包括以下至少一个的拓扑特征：i）包含光刻图案化的第一聚合物结构域的第一特征和ii）包含光刻图案化的第二聚合物结构域的第二特征。

9. 发明授权

US07951524B2 Self-topcoating photoresist for photolithography 有权
标题翻译：用于光刻的自表面光刻胶
公开(公告)号：US07951524B2
公开(公告)日：2011-05-31
申请号：US12023108
申请日：2008-01-31
申请人： Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Trung , Gregory M. Wallraff
发明人： Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Trung , Gregory M. Wallraff
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/36 , G03F7/38
CPC分类号： G03F7/2041 , C08F220/22 , G03F7/0046 , G03F7/0397 , G03F7/11 , Y10S430/108 , Y10S430/111
摘要： Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.
摘要翻译：光刻胶添加剂聚合物和光致抗蚀剂制剂，可用于浸没式光刻，而不使用额外的面漆。抗蚀剂组合物包括光致抗蚀剂聚合物，至少一种光致酸产生剂，溶剂; 和光致抗蚀剂添加剂聚合物。还有一种使用包括光致抗蚀剂添加剂聚合物的光致抗蚀剂制剂的方法。

10. 发明申请

US20090081598A1 FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME 审中-公开
公开(公告)号：US20090081598A1
公开(公告)日：2009-03-26
申请号：US11859804
申请日：2007-09-24
申请人： Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
发明人： Robert D. Allen , Matthew E. Colburn , Daniel P. Sanders , Ratnam Sooriyakumaran , Hoa D. Truong
IPC分类号： G03C1/73 , G03C5/00
CPC分类号： G03F7/0397 , G03F7/0757 , Y10S430/106 , Y10S430/108 , Y10S430/143 , Y10S430/168
摘要： Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.

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