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1. 发明申请

US20050136346A1 Optimized correction of wafer thermal deformations in a lithographic process 失效
标题翻译：光刻过程中晶片热变形的优化校正
公开(公告)号：US20050136346A1
公开(公告)日：2005-06-23
申请号：US10743272
申请日：2003-12-23
申请人： Joost Ottens , Harmen Van Der Schoot , Jeroen Starreveld , Wouterus Petrus Maria Maas , Willem Venema , Boris Menchtchikov
发明人： Joost Ottens , Harmen Van Der Schoot , Jeroen Starreveld , Wouterus Petrus Maria Maas , Willem Venema , Boris Menchtchikov
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , G03B27/00 , G03C5/00
CPC分类号： G03F7/70616 , G03F7/70783 , G03F7/70875
摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.
摘要翻译：本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。

2. 发明申请

US20070257209A1 Optimized correction of water thermal deformations in a lithographic process 失效
标题翻译：光刻过程中水热变形的优化校正
公开(公告)号：US20070257209A1
公开(公告)日：2007-11-08
申请号：US11812801
申请日：2007-06-21
申请人： Joost Ottens , Harmen Schoot , Jeroen Starreveld , Wouterus Maria Maas , Willem Venema , Boris Menchtchikov
发明人： Joost Ottens , Harmen Schoot , Jeroen Starreveld , Wouterus Maria Maas , Willem Venema , Boris Menchtchikov
IPC分类号： G03B27/02
CPC分类号： G03F7/70616 , G03F7/70783 , G03F7/70875
摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.
摘要翻译：本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。

3. 发明申请

US20070201013A1 Lithographic apparatus, device manufacturing method and energy sensor 审中-公开
标题翻译：光刻设备，器件制造方法和能量传感器
公开(公告)号：US20070201013A1
公开(公告)日：2007-08-30
申请号：US11363276
申请日：2006-02-28
申请人： Willem Venema
发明人： Willem Venema
IPC分类号： G03B27/72
CPC分类号： G03F7/70558
摘要： An energy sensor, e.g. as part of a transmission image sensor comprises: a radiation-sensitive detector arranged to receive a pulsed radiation beam and to generate a current in response thereto; a circuit equivalent to an RC network connected across the radiation-sensitive detector; and an analog to digital converter connected across a resistive component of the circuit and arranged to output digital samples measuring the voltage across the resistive component at a sampling rate that is greater than the pulse repetition rate of the pulsed radiation beam.
摘要翻译：能量传感器，例如。作为透射图像传感器的一部分包括：辐射敏感检测器，被布置成接收脉冲辐射束并响应于此产生电流; 相当于跨过辐射敏感检测器的RC网络的电路; 以及模拟数字转换器，其连接在电路的电阻部件两端，并被布置成以大于脉冲辐射束的脉冲重复频率的采样速率输出测量电阻部件两端的电压的数字样本。

4. 发明申请

US20070076180A1 System and method for compensating for radiation induced thermal distortions 有权
标题翻译：用于补偿辐射诱导的热变形的系统和方法
公开(公告)号：US20070076180A1
公开(公告)日：2007-04-05
申请号：US11257399
申请日：2005-10-25
申请人： Patricius Tinnemans , Willem Venema , Koen Maria Zaal
发明人： Patricius Tinnemans , Willem Venema , Koen Maria Zaal
IPC分类号： G03B27/42
CPC分类号： G03F7/70891 , G03F7/70725 , G03F7/70875
摘要： A system and method are used to compensate for thermal effect on a lithographic apparatus. The system comprises a patterning device, a projection system, a substrate position controller, and a substrate-position-based expansion-compensator. The patterning device modulates a radiation beam. The projection system projects the modulated radiation beam onto a target portion of a substrate. The substrate position controller moves the substrate relative to the projection system sequentially through a plurality of exposure positions. The substrate-position-based expansion-compensator interacts with the substrate position controller to modify the exposure positions in order at least partially to compensate for thermally-induced geometrical changes of at least one of the substrate and projection system.
摘要翻译：系统和方法用于补偿光刻设备的热效应。该系统包括图案形成装置，投影系统，基板位置控制器和基于基板位置的膨胀补偿器。图案形成装置调制辐射束。投影系统将调制的辐射束投影到基板的目标部分上。基板位置控制器相对于投影系统顺序移动基板通过多个曝光位置。基于衬底位置的膨胀补偿器与衬底位置控制器相互作用以至少部分地修改曝光位置以补偿至少一个衬底和投影系统的热诱导几何变化。

5. 发明申请

US20060269116A1 Lithographic apparatus and device manufacturing method utilizing 2D run length encoding for image data compression 有权
公开(公告)号：US20060269116A1
公开(公告)日：2006-11-30
申请号：US11140559
申请日：2005-05-31
申请人： Andrej Makarovic , Willem Venema , Lambertus Kessels , Marcel Bontekoe
发明人： Andrej Makarovic , Willem Venema , Lambertus Kessels , Marcel Bontekoe
IPC分类号： G06K9/00
CPC分类号： G03F7/70291 , G03F7/70508 , G03F7/70558
摘要： A lithographic apparatus comprises an array of individually controllable elements and a data processing pipeline. The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation. The storage device stores the intermediate representation. The online rasterizer accesses the stored intermediate representation and produces therefrom a stream of bitmap data to be used to generate the sequence of control data substantially in real time.

6. 发明申请

US20070253070A1 VARIABLE LENS AND EXPOSURE SYSTEM 有权
标题翻译：可变镜头和曝光系统
公开(公告)号：US20070253070A1
公开(公告)日：2007-11-01
申请号：US11740121
申请日：2007-04-25
申请人： Willem Venema
发明人： Willem Venema
IPC分类号： G02B27/12
CPC分类号： G03F7/70275 , G02B3/0012 , G02B3/0056 , G02B3/14 , G02B26/005 , G03F7/70266
摘要： A lithography apparatus comprises variable lenses.
摘要翻译：光刻设备包括可变透镜。

7. 发明申请

US20070075315A1 System and method for compensating for thermal expansion of lithography apparatus or substrate 有权
标题翻译：用于补偿光刻设备或基板的热膨胀的系统和方法
公开(公告)号：US20070075315A1
公开(公告)日：2007-04-05
申请号：US11257398
申请日：2005-10-25
申请人： Willem Venema , Johannes Baselmans
发明人： Willem Venema , Johannes Baselmans
IPC分类号： H01L29/04 , H01L29/15 , H01L31/036 , H01L21/84 , H01L21/00
CPC分类号： G03F7/70875 , G03F7/70275 , G03F7/70358 , G03F7/70466 , G03F7/70791 , H01L27/1296
摘要： To prevent a substrate from expanding significantly to generate overlay errors an exposure operation takes place in two parts. A first part exposes boundary areas and a second part exposes the larger, bulk areas. In one example, a portion of the substrate is fixed and the substrate is exposed progressively from parts furthest from the fixed portions towards the fixed portion. In another example, a plurality of high velocity scans take place instead of a single slow scan, and the substrate is allowed to cool between the high velocity scans. In another example, a lithographic apparatus is heated in order to maintain a temperature differential between the apparatus and the surrounding environment, and to minimize any fluctuation due to the exposing radiation.
摘要翻译：为了防止基板显着膨胀以产生覆盖误差，曝光操作分为两部分。第一部分暴露了边界区域，第二部分暴露了较大的主体区域。在一个示例中，基板的一部分被固定，并且基板从最远离固定部分的部分向固定部分逐渐曝光。在另一个示例中，发生多个高速扫描而不是单次慢扫描，并且允许衬底在高速扫描之间冷却。在另一示例中，为了保持设备和周围环境之间的温度差，加热光刻设备，并且使由于曝光辐射引起的任何波动最小化。

8. 发明申请

US20060279719A1 Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor 有权
标题翻译：平版印刷设备和器件制造方法以及由此制造的器件用于校准具有传感器的成像系统
公开(公告)号：US20060279719A1
公开(公告)日：2006-12-14
申请号：US11150882
申请日：2005-06-13
申请人： Willem Venema , Anastasius Bruinsma , Joeri Lof , Eduardus Boon
发明人： Willem Venema , Anastasius Bruinsma , Joeri Lof , Eduardus Boon
IPC分类号： G03B27/72
CPC分类号： G03F7/7085 , G03F7/70291 , G03F7/70516
摘要： A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, a substrate table, and a sensor system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The projection system projects the patterned beam onto a target plane, the patterned beam comprising an array of radiation spots. The substrate table supports a substrate, such that a target surface of the substrate is substantially coincident with the target plane. The sensor system comprises an array of detector elements arranged to receive at least one of the spots. The sensor system measures an energy of the or each received spot and provides an output signal indicative of the energy of the or each received spot.
摘要翻译：光刻设备包括照明系统，独立可控元件的阵列，投影系统，衬底台和传感器系统。照明系统提供一束辐射。独立可控元件的阵列使光束成像。投影系统将图案化的光束投射到目标平面上，图案化的光束包括辐射点阵列。衬底台支撑衬底，使得衬底的目标表面基本上与靶平面重合。传感器系统包括被布置成接收至少一个斑点的检测器元件的阵列。传感器系统测量该接收点或每个接收点的能量，并提供指示该或每个接收点的能量的输出信号。

9. 发明申请

US20070236675A1 Lithographic apparatus and device manufacturing method utilizing a MEMS mirror with large deflection using a non-linear spring arrangement 有权
标题翻译：使用非线性弹簧布置的利用具有大偏转的MEMS反射镜的平版印刷设备和器件制造方法
公开(公告)号：US20070236675A1
公开(公告)日：2007-10-11
申请号：US11398761
申请日：2006-04-06
申请人： Willem Venema
发明人： Willem Venema
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G02B26/0841
摘要： An array of individually controllable elements for a lithographic apparatus comprise reflectors that can be actuated by an actuator and are biased to return to a given position by a force that varies non-linearly with the displacement of the reflector from that position.
摘要翻译：用于光刻设备的独立可控元件的阵列包括可由致动器致动的反射器，并且通过与反射器从该位置的位移非线性地变化的力而被偏置回到给定位置。

10. 发明申请

US20070216890A1 Lithographic apparatus, device manufacturing method and energy sensor 有权
标题翻译：光刻设备，器件制造方法和能量传感器
公开(公告)号：US20070216890A1
公开(公告)日：2007-09-20
申请号：US11711873
申请日：2007-02-28
申请人： Willem Venema
发明人： Willem Venema
IPC分类号： G03B27/72
CPC分类号： G03F7/70558
摘要： An energy sensor comprises a radiation-sensitive detector, a circuit, and an analog-to-digital converter. The radiation-sensitive detector is arranged to receive a pulsed radiation beam and to generate a current in response thereto. The circuit is equivalent to an RC network and is electrically connected across the radiation-sensitive detector. The analog-to-digital converter is electrically connected across a resistive component of the circuit and is arranged to output digital samples measuring the voltage across the resistive component at a sampling rate that is greater than the pulse repetition rate of the pulsed radiation beam. The energy sensor may be provided as part of a transmission image sensor.
摘要翻译：能量传感器包括辐射敏感检测器，电路和模 - 数转换器。辐射敏感检测器被布置成接收脉冲辐射束并响应于此产生电流。该电路相当于一个RC网络，并且通过辐射敏感检测器电连接。模数转换器跨越电路的电阻部件电连接，并被布置成以大于脉冲辐射束的脉冲重复率的采样速率输出测量电阻部件两端的电压的数字样本。能量传感器可以被设置为透射图像传感器的一部分。

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