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    • 3. 发明申请
    • Transflective type liquid crystal display device and method for fabricating the same
    • 反射型液晶显示装置及其制造方法
    • US20050140869A1
    • 2005-06-30
    • US10965931
    • 2004-10-18
    • Joon YangYong ParkSang JangSu ChoiSang Kim
    • Joon YangYong ParkSang JangSu ChoiSang Kim
    • G02F1/1335G02F1/136G02F1/1362G02F1/1368H01L21/20H01L21/336H01L21/77H01L21/84H01L27/12H01L27/13H01L29/786
    • G02F1/13454G02F1/133555G02F1/136213G02F2001/136231H01L27/1255H01L27/1288H01L29/78621
    • A CMOS-TFT array substrate and a method for fabricating the same is disclosed, by a low-mask technology to decrease the usage count of masks, which includes a substrate comprising an active area having a plurality of pixel regions and a driving circuit area for driving the active area, each pixel region having a transmitting part and a reflective part; a first semiconductor layer having first source/drain regions formed in the pixel region; a second semiconductor layer having second source/drain regions formed in the driving circuit area; a gate insulating layer on an entire surface of the substrate including the first and second semiconductor layers; first and second gate electrodes on the gate insulating layer above the first and second semiconductor layers; a storage electrode in the pixel region; an insulating interlayer on the entire surface of the substrate; a transmitting electrode on the insulating interlayer of the transmitting part; a passivation layer on the entire surface of the substrate including the transmitting electrode; a reflective electrode on the passivation layer of the reflective part; first and second source/drain electrodes being in contact with the first and second source/drain regions; and a liquid crystal layer between the substrate and another facing substrate.
    • 公开了一种通过低掩模技术降低掩模的使用次数的CMOS-TFT阵列基板及其制造方法,该掩模技术包括:基板,其包括具有多个像素区域的有源区域和用于 驱动有源区域,每个像素区域具有透射部分和反射部分; 在所述像素区域中形成有第一源极/漏极区域的第一半导体层; 具有形成在所述驱动电路区域中的第二源/漏区的第二半导体层; 在包括第一和第二半导体层的基板的整个表面上的栅极绝缘层; 在第一和第二半导体层上方的栅极绝缘层上的第一和第二栅电极; 像素区域中的存储电极; 在基板的整个表面上的绝缘中间层; 在所述发射部分的绝缘中间层上的发射电极; 在包括发射电极的基板的整个表面上的钝化层; 在反射部分的钝化层上的反射电极; 第一和第二源极/漏极与第一和第二源极/漏极区域接触; 以及在所述基板和另一面对基板之间的液晶层。
    • 4. 发明申请
    • Liquid crystal display device and method of fabricating the same
    • 液晶显示装置及其制造方法
    • US20050134756A1
    • 2005-06-23
    • US10878363
    • 2004-06-29
    • Joon YangYong ParkSang Kim
    • Joon YangYong ParkSang Kim
    • G02F1/136G02F1/1362G02F1/1368
    • G02F1/136227G02F1/1368
    • A method of fabricating a liquid crystal display device includes forming an active pattern on a substrate, forming a first insulating layer on the substrate over the active pattern, forming a gate line including a gate electrode and a data line on the substrate, the data line including a plurality of segmented portions electrically disconnected from each other, forming source and drain regions in the active pattern, forming a second insulating layer on the first insulating layer, the gate line, and the data line, simultaneously forming a pair of first contact holes through the first and second insulating layers, a second contact hole through the second insulating layer, and a pair of third contact holes through the second insulating layer, forming a conductive material along an entire surface of the substrate, and patterning the conductive material to form a drain electrode, a first connection line, and a second connection line on the second insulating layer.
    • 制造液晶显示装置的方法包括在基板上形成有源图案,在有源图案上在基板上形成第一绝缘层,在基板上形成包括栅电极和数据线的栅极线,数据线 包括彼此电断开的多个分段部分,在有源图案中形成源区和漏区,在第一绝缘层,栅线和数据线上形成第二绝缘层,同时形成一对第一接触孔 通过第一和第二绝缘层,穿过第二绝缘层的第二接触孔和穿过第二绝缘层的一对第三接触孔,沿着衬底的整个表面形成导电材料,并且使导电材料形成图形 漏电极,第一连接线和第二连接线。
    • 8. 发明申请
    • Liquid crystal display device and method of fabricating the same
    • 液晶显示装置及其制造方法
    • US20050134755A1
    • 2005-06-23
    • US10878311
    • 2004-06-29
    • Joon YangYong ParkSang Kim
    • Joon YangYong ParkSang Kim
    • G02F1/136G02F1/1362H01L21/77H01L27/13
    • G02F1/136227G02F1/136286G02F2001/136231H01L27/1288
    • A method of fabricating a liquid crystal display device includes forming an active pattern and a data line on a substrate, forming a first insulating layer on the data line, forming a second insulating layer on the substrate, forming a gate electrode on the second insulating layer above the active pattern, forming a third insulating layer on the substrate, forming first and second contact holes through the second and third insulating layers to expose first and second portions of the active pattern, and forming a third contact hole through the first, second, and third insulating layers exposing a portion of the data line, respectively, and forming source and drain electrodes on the third insulating layer, the source electrode connected to the first exposed portion of the active pattern through the first contact hole and connected to the first exposed portion of the data line through the third contact hole, and the drain electrode connected to the second exposed portion of the active pattern through the second contact hole.
    • 一种制造液晶显示装置的方法,包括在基板上形成有源图案和数据线,在所述数据线上形成第一绝缘层,在所述基板上形成第二绝缘层,在所述第二绝缘层上形成栅电极 在所述有源图案之上,在所述基板上形成第三绝缘层,通过所述第二绝缘层和所述第三绝缘层形成第一和第二接触孔,以暴露所述有源图案的第一和第二部分,以及通过所述第一和第二绝缘层形成第三接触孔, 以及第三绝缘层,分别暴露所述数据线的一部分,并且在所述第三绝缘层上形成源电极和漏电极,所述源电极通过所述第一接触孔连接到所述有源图案的所述第一暴露部分并连接到所述第一暴露 通过第三接触孔的数据线的一部分,以及连接到有源拍照的第二曝光部分的漏电极 通过第二接触孔。
    • 9. 发明申请
    • Method of fabricating liquid crystal display device
    • 制造液晶显示装置的方法
    • US20050134754A1
    • 2005-06-23
    • US10876736
    • 2004-06-28
    • Joon YangYong ParkSang Kim
    • Joon YangYong ParkSang Kim
    • G02F1/136G02F1/13G02F1/1362H01L27/12H01L29/786
    • G02F1/136227G02F2001/136231H01L27/12H01L29/78621
    • A method of fabricating a liquid crystal display device includes forming a first active layer on a substrate, forming a first gate insulating film on the first active layer, forming a first gate electrode on the first gate insulating film, forming a first interlayer insulating layer on the first gate electrode, forming a pixel electrode on the first interlayer insulating layer, forming at least one insulating film to cover the pixel electrode, forming a first plurality of contact holes in the first interlayer insulating layer and the at least one insulating film, the first plurality of contact holes including a first source contact hole to expose a first source area of the first active layer and a first drain contact hole to expose a first drain area of the first active layer, forming a pixel contact hole in the at least one insulating film to expose the pixel electrode, performing a hydrogenating treatment to the substrate including the first source contact hole, the first drain contact hole, and the pixel contact hole, and forming a first source electrode contacting the first source area of the first active layer, and a first drain electrode contacting the direct drain area of the first active layer and connected to the pixel electrode.
    • 一种制造液晶显示装置的方法,包括在基板上形成第一有源层,在第一有源层上形成第一栅极绝缘膜,在第一栅极绝缘膜上形成第一栅电极,在第一栅极绝缘膜上形成第一层间绝缘层 所述第一栅电极在所述第一层间绝缘层上形成像素电极,形成至少一层绝缘膜以覆盖所述像素电极,在所述第一层间绝缘层和所述至少一绝缘膜中形成第一多个接触孔, 第一多个接触孔,包括用于暴露第一有源层的第一源极区域的第一源极接触孔和暴露第一有源层的第一漏极区域的第一漏极接触孔,在至少一个第二源极区域中形成像素接触孔 绝缘膜以暴露像素电极,对包括第一源极接触孔,第一漏极接合孔的基板进行氢化处理 ct孔和像素接触孔,以及形成与第一有源层的第一源极区域接触的第一源极电极和与第一有源层的直接漏极区域接触并连接到像素电极的第一漏极电极。