会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 10. 发明授权
    • Nanowire article and processes for making and using same
    • 纳米线的制作和使用过程
    • US09460921B2
    • 2016-10-04
    • US14679249
    • 2015-04-06
    • NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGYMatthew D. BrubakerWilliam M. Old
    • Kristine A. BertnessMatthew D. BrubakerWilliam M. Old
    • B82Y35/00B82Y40/00H01L21/18C30B29/40H01L21/02
    • H01L21/02603B82Y10/00B82Y35/00B82Y40/00C30B29/403C30B29/406H01L21/02381H01L21/02433H01L21/02439H01L21/02458H01L21/02507H01L21/0254H01L21/02642H01L29/0665
    • A nanowire article includes a substrate; a plurality of nanowires disposed on the substrate, the nanowires comprising a semiconductor nitride, the semiconductor comprising an element selected from group 3 of the periodic table; and a superlattice layer interposed between the substrate and the plurality of gallium nitride nanowires. A process for producing a nanowire article includes disposing a superlattice layer on a substrate; disposing a first buffer layer on the superlattice layer; contacting the first buffer layer with a precursor; and forming a plurality of nanowires from the precursor on the first buffer layer to form the nanowire article, the nanowires comprising a semiconductor nitride, the semiconductor comprising an element selected from group 3 of the periodic table. A process for producing a nanowire article includes nitrogenating a substrate to form a nitrogenated layer on the substrate; contacting the nitrogenated layer with a precursor; and forming a plurality of gallium nitride nanowires from the precursor on the nitrogenated layer to form the nanowire article in an absence of a catalyst, wherein individual gallium nitride nanowires of the plurality of gallium nitride nanowires include a length axis that is substantially perpendicular to the nitrogenated layer.
    • 纳米线制品包括基材; 设置在所述衬底上的多个纳米线,所述纳米线包括半导体氮化物,所述半导体包括选自周期表第3组的元素; 以及插入在所述基板和所述多个氮化镓纳米线之间的超晶格层。 制造纳米线制品的方法包括在基材上设置超晶格层; 在超晶格层上设置第一缓冲层; 使第一缓冲层与前体接触; 以及从所述第一缓冲层上的所述前体形成多个纳米线以形成所述纳米线制品,所述纳米线包含半导体氮化物,所述半导体包含选自周期表第3族的元素。 一种纳米线制品的制造方法,包括使基材氮化以在基材上形成氮化层; 使氮化层与前体接触; 以及在不存在催化剂的情况下从所述氮化层上的所述前体形成多个氮化镓纳米线,以在不存在催化剂的情况下形成所述纳米线制品,其中所述多个氮化镓纳米线中的各个氮化镓纳米线包括基本上垂直于所述氮化物 层。