专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US4657618A Powered load lock electrode/substrate assembly including robot arm, optimized for plasma process uniformity and rate 失效
标题翻译：电动负载锁定电极/基板组件包括机器人臂，优化了等离子体工艺的均匀性和速率
公开(公告)号：US4657618A
公开(公告)日：1987-04-14
申请号：US663804
申请日：1984-10-22
申请人： John E. Spencer , Randall E. Johnson , Dan T. Hockersmith , Randall C. Hildenbrand , John I. Jones , William S. Jaspersen
发明人： John E. Spencer , Randall E. Johnson , Dan T. Hockersmith , Randall C. Hildenbrand , John I. Jones , William S. Jaspersen
IPC分类号： H01J37/32 , H01L21/677 , H01L21/306 , B44C1/22 , C03C15/00 , C23F1/02
CPC分类号： H01J37/32458 , H01J37/32082 , H01J37/32623 , H01J37/32743 , H01J37/32788 , H01L21/67766
摘要： An electrode and substrate assembly for a plasma reactor allows high power plasma processing with low frequency excitation. The electrode sub-assembly is contained in a chamber which is used for pre-treatment such as de-scumming photoresist or for post-etch resist stripping and passivation. A post-etch treatment is essential in plasma aluminum etching.
摘要翻译：用于等离子体反应器的电极和基板组件允许用低频激发的高功率等离子体处理。电极子组件包含在用于预处理的腔室中，例如去除光致抗蚀剂或用于蚀刻后抗蚀剂剥离和钝化。蚀刻后处理在等离子体铝蚀刻中是必不可少的。

2. 发明授权

US4891087A Isolation substrate ring for plasma reactor 失效
标题翻译：用于等离子体反应器的隔离衬底环
公开(公告)号：US4891087A
公开(公告)日：1990-01-02
申请号：US67055
申请日：1987-06-25
申请人： Cecil J. Davis , John E. Spencer , Thomas D. Bonifield , Rhett B. Jucha , William J. Stiltz , Randall E. Johnson , Joseph E. Whetsel , John I. Jones
发明人： Cecil J. Davis , John E. Spencer , Thomas D. Bonifield , Rhett B. Jucha , William J. Stiltz , Randall E. Johnson , Joseph E. Whetsel , John I. Jones
IPC分类号： H01J37/32
CPC分类号： H01J37/32623 , H01J37/32532 , H01J37/32642 , H01J37/32743 , Y10S156/915
摘要： A radio frequency (RF) glow discharge plasma etch electrode design is disclosed which is capable of creating high power density plasma with uniform etch rates, while providing access for automatic loading semiconductor wafers from outside of the plasma region. The electrode assembly comprises of an electrode to which RF energy is applied surrounded by an insulator, which in turn surrounded a grounded surface all of which have cylindrical symmetry. When placed a small distance from a flat, grounded substrate, the electrode assembly creates a volume which can effectively combine a high power density plasma, while maintaining a sufficient channel for pumping a gas flow and for observing the plasma optically. The same channel is widened for automatic transport of semiconductor wafers from outside of the plasma reactor chamber. Such confined high power density plasma are important for high rate, uniform, anisotropic etching, especially for silicon dioxide.
摘要翻译：公开了射频（RF）辉光放电等离子体蚀刻电极设计，其能够产生具有均匀蚀刻速率的高功率密度等离子体，同时提供从等离子体区域外部自动加载半导体晶片的通路。电极组件包括由绝缘体围绕的RF能量施加的电极，该电极又包围着所有这些具有圆柱对称的接地表面。当从平坦接地的基板放置一小段距离时，电极组件产生能够有效地组合高功率密度等离子体的体积，同时保持用于泵送气流和用于观察等离子体的足够通道。相同的通道被加宽以用于从等离子体反应器室的外部自动输送半导体晶片。这种受限制的高功率密度等离子体对于高速率，均匀的各向异性蚀刻，特别是二氧化硅是重要的。

3. 发明授权

US4657617A Anodized aluminum substrate for plasma etch reactor 失效
标题翻译：用于等离子体蚀刻反应器的阳极氧化铝基板
公开(公告)号：US4657617A
公开(公告)日：1987-04-14
申请号：US663907
申请日：1984-10-22
申请人： Randall E. Johnson , John E. Spencer
发明人： Randall E. Johnson , John E. Spencer
IPC分类号： H01J37/32 , H01L21/306 , B44C1/22 , C03C15/00 , C23F1/02
CPC分类号： H01J37/32431 , Y10S414/135 , Y10S414/137
摘要： A substrate to use as electrode in a plasma etch reactor is fabricated from aluminum with an annulus that is anodized to protect it from being exposed to the plasma.
摘要翻译：在等离子体蚀刻反应器中用作电极的衬底由具有阳极氧化以防止暴露于等离子体的环的铝制成。

4. 发明授权

US4659413A Automated single slice cassette load lock plasma reactor 失效
标题翻译：自动单片盒装载锁定等离子体反应堆
公开(公告)号：US4659413A
公开(公告)日：1987-04-21
申请号：US664448
申请日：1984-10-24
申请人： Cecil J. Davis , John E. Spencer , Randall E. Johnson , Rhett B. Jucha , Frederick W. Brown , Stanford P. Kohan
发明人： Cecil J. Davis , John E. Spencer , Randall E. Johnson , Rhett B. Jucha , Frederick W. Brown , Stanford P. Kohan
IPC分类号： H01J37/18 , H01L21/306 , B44C1/22 , C03C15/00 , C23F1/02
CPC分类号： H01J37/185
摘要： A plasma etch system that processes one slice at a time is disclosed. The system is comprised of an entry loadlock, an exit loadlock, a main chamber, vacuum pumps, RF power supply, RF matching network, a heat exchanger, throttle valve and pressure control gas flow distribution and a microprocessor controller. A multiple slice cassette full of slices is housed in the entry load lock and after pumping to process pressure, a single slice at a time is moved by an articulated arm from the cassette through an isolation gate to the main process chamber. The slice is etched and removed from the main process chamber through a second isolation gate by a second articulated arm to a cassette in the exit loadlock. The process is repeated until all semiconductor wafers have been etched. The cassette loadlock system is able to evacuate a whole cassette of semiconductor wafers for processing which lowers the particulate environment for the slices and, provides a more stable environment for the slices by removal of moisture and preventing static discharges and additionally provides a safety feature that protects the operators from harsh or toxic gases that are traditionally used in semiconductor type plasma reactor.
摘要翻译：公开了一次处理一个片的等离子体蚀刻系统。该系统包括入口负载锁，出口负载锁，主室，真空泵，RF电源，RF匹配网络，热交换器，节流阀和压力控制气体流量分配以及微处理器控制器。充满切片的多切片盒被容纳在进入加载锁中，并且在泵送处理压力之后，一次一个切片由关节臂从盒通过隔离门移动到主处理室。该切片通过第二隔离门从主处理室被蚀刻并从第二铰接臂移除到出口加载锁中的盒。重复该过程，直到所有半导体晶片被蚀刻。盒式负载锁定系统能够抽出整个半导体晶片盒进行处理，这降低了切片的颗粒环境，并且通过去除湿气并防止静电放电为切片提供更稳定的环境，并且另外提供了保护传统上用于半导体等离子体反应器的恶劣或有毒气体的操作者。

5. 发明授权

US4654106A Automated plasma reactor 失效
标题翻译：自动等离子体反应器
公开(公告)号：US4654106A
公开(公告)日：1987-03-31
申请号：US663901
申请日：1984-10-22
申请人： Cecil J. Davis , Randall E. Johnson , John E. Spencer
发明人： Cecil J. Davis , Randall E. Johnson , John E. Spencer
IPC分类号： H01J37/32 , H01L21/306 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： H01J37/32
摘要： A plasma etch system that processes one slice at a time is disclosed. The system is comprised of an entry loadlock, an exit loadlock, a main chamber, vacuum pumps, RF power supply, RF matching network, a heat exchanger, throttle valve and pressure control gas flow distribution and a microprocessor controller. A multiple slice cassette full of slices is housed in the entry load lock and after pumping to process pressure, a single slice at a time is moved by an articulated arm from the cassette through an isolation gate to the main process chamber. The slice is etched and removed from the main process chamber through a second isolation gate by a second articulated arm to a cassette in the exit loadlock. The process is repeated until all semiconductor wafers have been etched. The cassette loadlock system is able to evacuate a whole cassette of semiconductor wafers for processing which lowers the particulate environment for the slices and, provides a more stable environment for the slices by removal of moisture and preventing static discharges and additionally provides a safety feature that protects the operators from harsh or toxic gases that are traditionally used in semiconductor type plasma reactor.
摘要翻译：公开了一次处理一个片的等离子体蚀刻系统。该系统包括入口负载锁，出口负载锁，主室，真空泵，RF电源，RF匹配网络，热交换器，节流阀和压力控制气体流量分配以及微处理器控制器。充满切片的多切片盒被容纳在进入加载锁中，并且在泵送处理压力之后，一次一个切片由关节臂从盒通过隔离门移动到主处理室。该切片通过第二隔离门从主处理室被蚀刻并从第二铰接臂移除到出口加载锁中的盒。重复该过程，直到所有半导体晶片被蚀刻。盒式负载锁定系统能够抽出整个半导体晶片盒进行处理，这降低了切片的颗粒环境，并且通过去除湿气并防止静电放电为切片提供更稳定的环境，并且另外提供了保护传统上用于半导体等离子体反应器的恶劣或有毒气体的操作者。

6. 发明申请

US20110044022A1 SYSTEM AND METHOD FOR A PHOSPHOR COATED LENS 有权
标题翻译：用于磷光体涂层的镜片的系统和方法
公开(公告)号：US20110044022A1
公开(公告)日：2011-02-24
申请号：US12646570
申请日：2009-12-23
申请人： Hyunchul Ko , Randall E. Johnson , Dung T. Duong , Paul N. Winberg
发明人： Hyunchul Ko , Randall E. Johnson , Dung T. Duong , Paul N. Winberg
IPC分类号： F21V9/16 , H01J1/62
CPC分类号： G02B19/0066 , F21K9/64 , G02B19/0028 , G02B19/0061 , H01L33/507
摘要： Embodiments disclosed herein provide optical systems utilizing photon conversion materials in conjunction with a light source and an LED. An LED can be positioned in a cavity defined by a base and one or more sidewalls. Phosphors can be disposed on the entrance face of a lens between the entrance face to the lens body and the LED so that light emitted from the LED will be incident on the phosphor and down converted before entering the lens body through the entrance face. The lens can positioned so that the phosphors are separated from the LED by a gap.
摘要翻译：本文公开的实施例提供了利用光子转换材料结合光源和LED的光学系统。 LED可以定位在由基座和一个或多个侧壁限定的空腔中。可以将荧光体设置在透镜入射面与透镜体之间的透镜入射面上，使得从LED发射的光将入射到荧光体上并在通过入射面进入透镜体之前向下转换。透镜可以定位成使得荧光体通过间隙与LED分离。

7. 发明授权

US08449128B2 System and method for a lens and phosphor layer 有权
标题翻译：透镜和荧光体层的系统和方法
公开(公告)号：US08449128B2
公开(公告)日：2013-05-28
申请号：US12646570
申请日：2009-12-23
申请人： Hyunchul Ko , Randall E. Johnson , Dung T. Duong , Paul N. Winberg
发明人： Hyunchul Ko , Randall E. Johnson , Dung T. Duong , Paul N. Winberg
IPC分类号： F21V33/00
CPC分类号： G02B19/0066 , F21K9/64 , G02B19/0028 , G02B19/0061 , H01L33/507
摘要： Embodiments disclosed herein provide optical systems utilizing photon conversion materials in conjunction with a light source and an LED. An LED can be positioned in a cavity defined by a base and one or more sidewalls. Phosphors can be disposed on the entrance face of a lens between the entrance face to the lens body and the LED so that light emitted from the LED will be incident on the phosphor and down converted before entering the lens body through the entrance face. The lens can positioned so that the phosphors are separated from the LED by a gap.
摘要翻译：本文公开的实施例提供了利用光子转换材料结合光源和LED的光学系统。 LED可以定位在由基座和一个或多个侧壁限定的空腔中。可以将荧光体设置在透镜入射面与透镜体之间的透镜入射面上，使得从LED发射的光将入射到荧光体上并在通过入射面进入透镜体之前向下转换。透镜可以定位成使得荧光体通过间隙与LED分离。

8. 发明授权

US08302847B2 RFID parking tag and method of monitoring vehicle parking 有权
标题翻译： RFID停车标签和车辆停车监控方法
公开(公告)号：US08302847B2
公开(公告)日：2012-11-06
申请号：US11828743
申请日：2007-07-26
申请人： Randall E. Johnson , Daniel J. Selke
发明人： Randall E. Johnson , Daniel J. Selke
IPC分类号： G06F17/00
CPC分类号： G08G1/14 , G08G1/017
摘要： A system for monitoring the parking status of vehicles incorporating a plurality of wireless identification tags, each tag having a unique tag identifier and having association with a selected vehicle. The system also includes a portable scanner to be used by a parking monitor, the portable scanner having a processor executing instructions thereon, a tag scanner capable of reading a wireless identification tag of a selected vehicle located in relatively close proximity over a wireless link, and a communication device capable of communicating over a wireless wide area network to transmit information about vehicle parking status. A server, having a database with fields for each of the selected vehicles, communicates with the portable scanner over the wireless wide area network to log data related to vehicle parking status. A software program may also be used to facilitate communication between the scanner and the vehicle owner and/or between the scanner and a tow service.
摘要翻译：一种用于监视结合有多个无线识别标签的车辆的停车状态的系统，每个标签具有唯一的标签标识符并且与所选择的车辆相关联。该系统还包括便携式扫描器，由停车监视器使用，该便携式扫描仪具有执行指令的处理器，能够读取位于无线链路上相对靠近的所选车辆的无线识别标签的标签扫描器，以及能够通过无线广域网进行通信以发送关于车辆停车状态的信息的通信装置。具有每个所选车辆的字段的数据库的服务器通过无线广域网与便携式扫描器通信以记录与车辆停车状态相关的数据。还可以使用软件程序来促进扫描仪与车主之间的通信和/或扫描器与拖曳服务之间的通信。

9. 发明申请

US20110209825A1 Method for Protecting Optical Devices During Manufacture 审中-公开
标题翻译：制造过程中保护光学元件的方法
公开(公告)号：US20110209825A1
公开(公告)日：2011-09-01
申请号：US13013109
申请日：2011-01-25
申请人： Randall E. Johnson , Hyunchul Ko , Dung T. Duong , Paul N. Winberg
发明人： Randall E. Johnson , Hyunchul Ko , Dung T. Duong , Paul N. Winberg
IPC分类号： B32B37/12
CPC分类号： H01L33/0095 , H01L33/08 , H01L33/20 , H01L33/44
摘要： This disclosure regards methods for protecting a die during shaping and polishing of optical devices. According to various embodiments, layers can be added and removed from a wafer to protect both sides of the wafer during various steps of a manufacturing process.
摘要翻译：本公开涉及在光学器件的成形和抛光期间保护管芯的方法。根据各种实施例，可以从晶片添加和移除层，以在制造过程的各个步骤期间保护晶片的两侧。

10. 发明授权

US5247746A Tray sealing and gas flush apparatus 失效
标题翻译：托盘密封和气体冲洗装置
公开(公告)号：US5247746A
公开(公告)日：1993-09-28
申请号：US893861
申请日：1992-06-04
申请人： Randall E. Johnson , Howard D. Conner , Thomas M. Bagwell, Jr. , Charles C. Zende
发明人： Randall E. Johnson , Howard D. Conner , Thomas M. Bagwell, Jr. , Charles C. Zende
IPC分类号： B65B51/10 , B65B31/04
CPC分类号： B65B31/043
摘要： Apparatus for atmosphere-modifying and sealing individual trays includes a film disposing roller disposed closely adjacent the top of the tray to define a nip region and an elongated gas injection nozzle spanning the nip region for injecting gas through the nip region between the film and the tray. A split conveyor belt advances the trays past the film disposing roller to a sealing unit utilizing band sealers for the longitudinal tray edges and reciprocal "hot bar" sealer for the leading and trailing tray edges. The gas injection nozzle injects the gas substantially perpendicular to the advancing direction, down and into the individual trays. An optional second gas nozzle provides a gas flow curtain across the tray leading edge.
摘要翻译：用于大气修饰和密封单个托盘的装置包括设置在托盘顶部附近的膜设置辊，以限定夹持区域和跨越夹持区域的细长气体喷射喷嘴，用于将气体喷射通过膜和托盘之间的夹持区域。分离输送带将托盘通过薄膜布置辊前进到密封单元，该密封单元利用用于纵向托盘边缘的带封闭件和用于前托盘边缘和后托盘边缘的往复“热棒”密封件。气体喷射喷嘴将基本上垂直于前进方向的气体向下喷射到单个托盘中。可选的第二气体喷嘴提供穿过托盘前缘的气流帘。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式