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    • 10. 发明授权
    • Techniques and devices for characterizing spatially non-uniform curvatures and stresses in thin-film structures on substrates with non-local effects
    • 用于表征具有非局部效应的衬底上的薄膜结构中的空间不均匀曲率和应力的技术和装置
    • US07487050B2
    • 2009-02-03
    • US11432663
    • 2006-05-10
    • Ares J. RosakisYonggang Huang
    • Ares J. RosakisYonggang Huang
    • G01L1/00
    • G01L5/0047Y10S438/936
    • Techniques and devices are described to use spatially-varying curvature information of a layered structure to determine stresses at each location with non-local contributions from other locations of the structure. For example, a local contribution to stresses at a selected location on a layered structure formed on a substrate is determined from curvature changes at the selected location and a non-local contribution to the stresses at the selected location is also determined from curvature changes at all locations across the layered structure. Next, the local contribution and the non-local contribution are combined to determine the total stresses at the selected location. Techniques and devices for determining a misfit strain between a film and a substrate on which the film is deposited are also described.
    • 技术和装置被描述为使用分层结构的空间变化的曲率信息来确定每个位置处的应力,其中非局部贡献来自该结构的其他位置。 例如,根据在所选择的位置处的曲率变化来确定在基板上形成的层状结构上的选定位置处的应力的局部贡献,并且还根据曲率变化确定对所选位置处的应力的非局部贡献 分层结构的位置。 接下来,组合本地贡献和非本地贡献以确定所选位置处的总应力。 还描述了用于确定薄膜和沉积薄膜的基板之间的失配应变的技术和装置。