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1. 发明申请

US20050088638A1 Off-axis levelling in lithographic projection apparatus 失效
公开(公告)号：US20050088638A1
公开(公告)日：2005-04-28
申请号：US10975429
申请日：2004-10-29
申请人： Johannes Jasper , Erik Loopstra , Theodorus Modderman , Gerrit Nijmeijer , Nicolaas van Asten , Frederik Heuts , Jacobus Geman , Richard Du Croo de Jongh , Marcus Boonman , Jacob Klinkhamer , Thomas Castenmiller
发明人： Johannes Jasper , Erik Loopstra , Theodorus Modderman , Gerrit Nijmeijer , Nicolaas van Asten , Frederik Heuts , Jacobus Geman , Richard Du Croo de Jongh , Marcus Boonman , Jacob Klinkhamer , Thomas Castenmiller
IPC分类号： G01B9/02 , G01B11/00 , G01B11/02 , G01B11/245 , G01B11/25 , G01B11/30 , G03F7/207 , G03F7/22 , G03F9/00 , H01L21/027 , G03B27/52
CPC分类号： G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
摘要： In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

2. 发明申请

US20050157281A1 Off-axis levelling in lithographic projection apparatus 有权
公开(公告)号：US20050157281A1
公开(公告)日：2005-07-21
申请号：US10918700
申请日：2004-08-16
申请人： Johannes Jasper , Erik Loopstra , Theodorus Modderman , Gerrit Nijmeijer , Nicholaas Van Asten , Frederik Heuts , Jacobus Gemen , Richard Du Croo De Jongh , Marcus Boonman , Jacob Klinkhamer , Thomas Castenmiller
发明人： Johannes Jasper , Erik Loopstra , Theodorus Modderman , Gerrit Nijmeijer , Nicholaas Van Asten , Frederik Heuts , Jacobus Gemen , Richard Du Croo De Jongh , Marcus Boonman , Jacob Klinkhamer , Thomas Castenmiller
IPC分类号： G01B9/02 , G01B11/00 , G01B11/02 , G01B11/245 , G01B11/25 , G01B11/30 , G03F7/207 , G03F7/22 , G03F9/00 , H01L21/027 , G03B27/52
CPC分类号： G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
摘要： In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

3. 发明申请

US20070127005A1 Illumination system 审中-公开
标题翻译：照明系统
公开(公告)号：US20070127005A1
公开(公告)日：2007-06-07
申请号：US11292275
申请日：2005-12-02
申请人： Huibert Visser , Jacob Klinkhamer , Lev Ryzhikov , Scott Coston , Adel Joobeur , Yevgeniy Konstantinovich Shmarev , HENRI JOHANNES VINK
发明人： Huibert Visser , Jacob Klinkhamer , Lev Ryzhikov , Scott Coston , Adel Joobeur , Yevgeniy Konstantinovich Shmarev , HENRI JOHANNES VINK
IPC分类号： G03B27/72
CPC分类号： G03F7/70583 , G02B27/0905 , G03F7/70075
摘要： A system and method are used to substantially homogenizing and removing at least some coherence from a beam of light.
摘要翻译：使用系统和方法基本均匀化并从光束中去除至少一些相干性。

4. 发明申请

US20070247606A1 Illumination system 审中-公开
标题翻译：照明系统
公开(公告)号：US20070247606A1
公开(公告)日：2007-10-25
申请号：US11606386
申请日：2006-11-30
申请人： Huibert Visser , Jacob Klinkhamer , Lev Ryzhikov , Scott Coston , Adel Joobeur , Henri Vink , Yevgeniy Shmarev
发明人： Huibert Visser , Jacob Klinkhamer , Lev Ryzhikov , Scott Coston , Adel Joobeur , Henri Vink , Yevgeniy Shmarev
IPC分类号： G03B27/54
CPC分类号： G03F7/70583 , G02B27/0905 , G03F7/70075
摘要： A system and method are used to substantially homogenize and remove at least some coherence from a beam of radiation.
摘要翻译：使用系统和方法基本均匀化并从辐射束中去除至少一些相干性。

5. 发明申请

US20060007442A1 Alignment marker and lithographic apparatus and device manufacturing method using the same 有权
标题翻译：对准标记和光刻设备及使用其的器件制造方法
公开(公告)号：US20060007442A1
公开(公告)日：2006-01-12
申请号：US11147114
申请日：2005-06-08
申请人： Gert-Jan Heerens , Anastasius Bruinsma , Jacob Klinkhamer , Bastiaan Lambertus Van De Ven , Hubert Van Mierlo , Willem Vliegenthart
发明人： Gert-Jan Heerens , Anastasius Bruinsma , Jacob Klinkhamer , Bastiaan Lambertus Van De Ven , Hubert Van Mierlo , Willem Vliegenthart
IPC分类号： G01B11/00
CPC分类号： G03F9/7065 , G03F9/7076 , G03F9/7088
摘要： An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.
摘要翻译：一种装置包括：第一支撑结构，其构造成支撑具有设置有至少一个高度差的对准标记的元件。该装置还包括对准传感器，该对准传感器包括被配置为提供照射对准标记的光束的光源; 以及至少一个检测器，被配置为通过分析由所述对准标记物反射的光束来检测所述对准标记的所述至少一个高度差。可以使用这样的装置来相对于第一支撑结构对准元件。

6. 发明申请

US20050248740A1 Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program 有权
标题翻译：用于对基板的正面或背面进行成像的平版印刷设备，基板识别方法，器件制造方法，基板和计算机程序
公开(公告)号：US20050248740A1
公开(公告)日：2005-11-10
申请号：US11069058
申请日：2005-03-02
申请人： Michael Veen , Anastasius Bruinsma , Henricus Van Buel , Jacob Klinkhamer , Martinus Leenders , Christianus Mol , Hubert Mierlo
发明人： Michael Veen , Anastasius Bruinsma , Henricus Van Buel , Jacob Klinkhamer , Martinus Leenders , Christianus Mol , Hubert Mierlo
IPC分类号： G03F7/20 , G03B27/42 , G03F9/00 , H01L21/027
CPC分类号： G03F9/7084 , G03F7/70425 , G03F9/7011 , G03F9/7019 , G03F9/7076
摘要： The invention is directed to enabling substrate identification by comparing the measured distance between two features on an unidentified substrate with one or more stored distances. The one or more stored distances are the distances intended during the design of one or more substrates. The unidentified substrate is identified by a stored distance that corresponds to the measured distance. The two features are selected from a plurality of features that may be placed on a back side or a front side of a substrate. An optical system is provided for reading the features from the back side or a front side of the substrate.
摘要翻译：本发明旨在通过将未识别基底上的两个特征之间的测量距离与一个或多个存储的距离进行比较来实现基底识别。一个或多个存储的距离是在一个或多个基板的设计期间的距离。通过与测量距离对应的存储距离来识别未识别的底物。两个特征从可以放置在基板的背面或前侧的多个特征中选择。提供了用于从基板的背面或前侧读取特征的光学系统。

7. 发明申请

US20070013889A1 Lithographic apparatus, device manufacturing method and device manufactured thereby having an increase in depth of focus 审中-公开
标题翻译：制造的平版印刷设备，器件制造方法和器件具有增加的焦深
公开(公告)号：US20070013889A1
公开(公告)日：2007-01-18
申请号：US11179056
申请日：2005-07-12
申请人： Laurentius Jorritsma , Johannes Baselmans , Arno Bleeker , Jacob Klinkhamer
发明人： Laurentius Jorritsma , Johannes Baselmans , Arno Bleeker , Jacob Klinkhamer
IPC分类号： G03B27/54
CPC分类号： G03F7/70275 , G03F7/70575 , G03F7/70641
摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, an array of individually controllable elements serving to impart the beam with a pattern in its cross-section, a substrate table for supporting a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The beam of radiation comprises a plurality of beam components. The plurality of beam components includes a first beam component having a first frequency spectrum about a first frequency and at least a second beam component having a second frequency spectrum about a second frequency. The second frequency is different from the first frequency. The projection system focuses the first and second beam components at different heights with respect to the substrate table.
摘要翻译：光刻设备包括用于提供辐射束的照明系统，用于在其横截面中赋予光束的单独可控元件的阵列，用于支撑衬底的衬底台，以及用于将图案化的投影系统光束到基板的目标部分上。辐射束包括多个光束分量。多个光束分量包括具有关于第一频率的第一频谱的第一光束分量和具有关于第二频率的第二频谱的至少第二光束分量。第二频率与第一频率不同。投影系统将第一和第二光束分量相对于衬底台聚焦在不同的高度。

8. 发明申请

US20060098175A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060098175A1
公开(公告)日：2006-05-11
申请号：US10983336
申请日：2004-11-08
申请人： Pieter De Jager , Cheng-Qun Gui , Jacob Klinkhamer , Eduard Hoeberichts
发明人： Pieter De Jager , Cheng-Qun Gui , Jacob Klinkhamer , Eduard Hoeberichts
IPC分类号： G03B27/00
CPC分类号： G03F7/70475 , G03F7/70275 , G03F7/70291 , G03F7/70358
摘要： A lithographic apparatus and method for exposing a substrate. An illumination system supplies a series of beams of radiation that are patterned by an array of individually controllable elements. The patterned beams are projected through arrays of lenses onto target portions of a substrate. Each lens in the arrays directs a respective part of the patterned beam towards the substrate. A displacement system causes relative displacement between the substrate and the beam, such that the beams are scanned across the substrate in a predetermined scanning direction. The projection systems are positioned so that each beam is scanned along a respective one of a series of tracks on the substrate. The tracks overlap so that each track comprises a first portion that is scanned by one beam and at least one second portion that overlaps an adjacent track, and is scanned by two beams. A maximum intensity of a first part of each beam directed towards a first portion of the track can be greater than a maximum intensity of a second part of that beam directed towards a second portion of the track, such that the first and second portions of the track are exposed to radiation of substantially the same maximum intensity. Such overlapping of adjacent beams and modulation of the intensity of the beams can allow the optical footprints of different optical columns to be seamed together to enable exposure of large area substrates in a single scan.
摘要翻译：一种用于曝光衬底的光刻设备和方法。照明系统提供一系列由单独可控元件的阵列构图的辐射束。图案化的光束通过透镜阵列投射到基板的目标部分上。阵列中的每个透镜将图案化束的相应部分朝向衬底引导。位移系统引起衬底和梁之间的相对位移，使得束在预定扫描方向上跨过衬底扫描。投影系统被定位成使得每个光束沿着衬底上的一系列轨道中的相应一个被扫描。轨道重叠，使得每个轨道包括由一个梁扫描的第一部分和与相邻轨道重叠的至少一个第二部分，并且被两个梁扫描。朝向轨道的第一部分的每个光束的第一部分的最大强度可以大于朝向轨道的第二部分的该光束的第二部分的最大强度，使得第一部分和第二部分轨道暴露于基本上相同的最大强度的辐射。相邻光束的这种重叠和光束强度的调制可以允许将不同光学柱的光学覆盖区缝合在一起以使得能够在单次扫描中暴露大面积的基板。

9. 发明申请

US20050275841A1 Alignment marker and lithographic apparatus and device manufacturing method using the same 审中-公开
标题翻译：对准标记和光刻设备及使用其的器件制造方法
公开(公告)号：US20050275841A1
公开(公告)日：2005-12-15
申请号：US10863806
申请日：2004-06-09
申请人： Gert-Jan Heerens , Anastasius Bruinsma , Jacob Klinkhamer , Bastiaan Lambertus Marinus Van De Ven , Hubert Van Mierlo , Willem Vliegenthart
发明人： Gert-Jan Heerens , Anastasius Bruinsma , Jacob Klinkhamer , Bastiaan Lambertus Marinus Van De Ven , Hubert Van Mierlo , Willem Vliegenthart
IPC分类号： G03F9/00 , G01B11/00 , H01L21/027
CPC分类号： G03F9/7065 , G03F9/7076 , G03F9/7088
摘要： An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.
摘要翻译：一种装置包括：第一支撑结构，其构造成支撑具有设置有至少一个高度差的对准标记的元件。该装置还包括对准传感器，该对准传感器包括被配置为提供照射对准标记的光束的光源; 以及至少一个检测器，被配置为通过分析由所述对准标记物反射的光束来检测所述对准标记的所述至少一个高度差。可以使用这样的装置来相对于第一支撑结构对准元件。

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