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1. 发明授权

US06650399B2 Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations 有权
标题翻译：平版印刷设备，光栅模块，传感器模块，测量波前像差的方法
公开(公告)号：US06650399B2
公开(公告)日：2003-11-18
申请号：US10073119
申请日：2002-02-12
申请人： Johannes Jacobus Matheus Baselmans , Marco Hugo Petrus Moers , Hans Van Der Laan , Robert Wilhelm Willekers , Wilhelmus Petrus De Boeij , Marcus Adrianus Van De Kerkhof
发明人： Johannes Jacobus Matheus Baselmans , Marco Hugo Petrus Moers , Hans Van Der Laan , Robert Wilhelm Willekers , Wilhelmus Petrus De Boeij , Marcus Adrianus Van De Kerkhof
IPC分类号： G03B2742
CPC分类号： G01M11/0264 , G01M11/0285 , G03F7/706
摘要： A lithographic projection apparatus including an illumination system; a support structure for holding a mask; a substrate table for holding a substrate; a projection system for projecting a pattern onto a target portion of the substrate; and an interferometric measurement system for measuring wave front aberrations of the projection system, characterized in that the interferometric measurement system including: a grating, featuring a grating pattern in a grating plane, said grating being movable into and out of the projection beam, such that the grating plane is substantially coincident with said object plane; a pinhole, featuring a pinhole pattern in a pinhole plane and arranged in a pinhole plate, said pinhole being movable into and out of the projection beam, such that the pinhole plane is substantially coincident with a plane downstream of the projection system and optically conjugate to said object plane, and a detector with a detector surface substantially coincident with a detection plane, said detection plane located downstream of the pinhole at a location where a spatial distribution of the electric field amplitude of the projection beam is substantially a Fourier transformation of a spatial distribution of the electric field amplitude of the projection beam in the pinhole plane.
摘要翻译：一种光刻投影装置，包括照明系统; 用于保持面罩的支撑结构; 用于保持衬底的衬底台; 投影系统，用于将图案投影到所述基板的目标部分上; 以及用于测量所述投影系统的波前像差的干涉测量系统，其特征在于，所述干涉测量系统包括：光栅，其特征在于光栅平面中的光栅图案，所述光栅可移入和移出所述投影光束，使得光栅平面基本上与所述物平面重合; 针孔，其具有针孔平面中的针孔图案并且布置在针孔板中，所述针孔可移动进入和离开投影梁，使得针孔平面基本上与投影系统的下游平面重合，并且与光学共轭所述物体平面和检测器表面基本上与检测平面重合的检测器，所述检测平面位于所述针孔的下游，所述位置处投影光束的电场振幅的空间分布基本上是空间的傅立叶变换投影光束在针孔平面中的电场振幅分布。

2. 发明授权

US06862076B2 Method of determining stray radiation lithographic projection apparatus 有权
标题翻译：确定杂散放射光刻投影仪的方法
公开(公告)号：US06862076B2
公开(公告)日：2005-03-01
申请号：US10684826
申请日：2003-10-15
申请人： Heine Melle Mulder , Marco Hugo Petrus Moers
发明人： Heine Melle Mulder , Marco Hugo Petrus Moers
IPC分类号： G02B13/00 , G02B13/18 , G03F7/20 , H01L21/027 , G03B27/32 , G03B27/52 , G03B27/54
CPC分类号： G03F7/70941
摘要： A system and method for determining the stray radiation condition of a projection system, is presented herein. The invention includes providing a detector with a detector aperture coincident with the image plane of the projection system, measuring a reference parameter in accordance with the projection beam intensity, measuring a stray radiation parameter of an image of an isolated feature and calculating a coefficient representative of the stray radiation condition of the projection system based on the measured stray radiation parameter and the reference parameter. The extent of the detector aperture fits within the extent of a notional shape, which is defined by first scaling down the shape of the feature and subsequently displacing each line element constituting the edge of the scaled down shape, parallel to itself, over a distance of at least λ/NA in a direction perpendicular to that line element.
摘要翻译：本文提出了一种用于确定投影系统的杂散辐射条件的系统和方法。本发明包括提供具有与投影系统的图像平面重合的检测器孔的检测器，根据投影光束强度测量参考参数，测量孤立特征的图像的杂散辐射参数并计算代表基于测量的杂散辐射参数和参考参数的投影系统的杂散辐射条件。检测器孔的范围适合于理想形状的范围，其通过首先按比例缩小特征的形状并随后将构成与其自身平行的缩小形状的边缘的每个线元素移位一段距离在垂直于该线元件的方向上至少为λ/ NA。

3. 发明授权

US06819405B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US06819405B2
公开(公告)日：2004-11-16
申请号：US10136620
申请日：2002-05-03
申请人： Johannes Catharinus Hubertus Mulkens , Marco Hugo Petrus Moers
发明人： Johannes Catharinus Hubertus Mulkens , Marco Hugo Petrus Moers
IPC分类号： G03B2762
CPC分类号： G03F7/70558 , G03F7/70208 , G03F7/70466 , G03F7/70566
摘要： A lithographic projection apparatus including a first radiation system for providing a first projection beam of radiation; a second radiation system for providing a second projection beam of radiation; a support structure for supporting a first patterning structure and a second patterning structure, the first patterning structure serving to pattern the first projection beam according to a first pattern and the second patterning structure serving to pattern the second projection beam according to a second pattern; a substrate table for holding a substrate; a projection system for combining the first and second patterned beams and projecting the combined beam onto a target portion of the substrate.
摘要翻译：一种光刻投影设备，包括用于提供第一投影辐射束的第一辐射系统; 用于提供第二投影辐射束的第二辐射系统; 用于支撑第一图案形成结构和第二图案形成结构的支撑结构，所述第一图案结构用于根据第一图案对第一投影光束进行图案，并且第二图案形成结构用于根据第二图案对第二投影光束进行图案化; 用于保持衬底的衬底台; 投影系统，用于组合第一和第二图案化束并将组合的光束投射到基板的目标部分上。

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