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1. 发明授权

US4657844A Plasma developable negative resist compositions for electron beam, X-ray and optical lithography 失效
标题翻译：用于电子束，X射线和光学光刻的等离子显影负性抗蚀剂组合物
公开(公告)号：US4657844A
公开(公告)日：1987-04-14
申请号：US734357
申请日：1985-05-14
申请人： Jing S. Shu , Johnny B. Covington , Wei Lee , Larry G. Venable , Gilbert L. Varnell
发明人： Jing S. Shu , Johnny B. Covington , Wei Lee , Larry G. Venable , Gilbert L. Varnell
IPC分类号： G03F7/029 , G03F7/033 , G03C5/16
CPC分类号： G03F7/029 , G03F7/033 , Y10S430/11 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： A negative resist composition including a polymeric matrix material, a polymerizable monomer, and an onium salt radiation sensitive initiator. The monomer is polymerized by irradiating the resist with an e-beam, x-ray, or ultraviolet source and heating the exposed resist. The resist is developed by a dry etchant such as plasma or a reactive ion etchant.
摘要翻译：包含聚合物基体材料，可聚合单体和鎓盐辐射敏感引发剂的负性抗蚀剂组合物。通过用电子束，x射线或紫外光源照射抗蚀剂并加热曝光的抗蚀剂来聚合单体。抗蚀剂由干蚀刻剂如等离子体或反应离子蚀刻剂显影。

2. 发明授权

US5739260A Hydrophobically modified resin composition for graphics applications 失效
标题翻译：用于图形应用的疏水改性树脂组合物
公开(公告)号：US5739260A
公开(公告)日：1998-04-14
申请号：US693891
申请日：1996-08-05
申请人： William C. Floyd , Larry G. Venable , William A. Fuchs, Jr.
发明人： William C. Floyd , Larry G. Venable , William A. Fuchs, Jr.
IPC分类号： C08G12/26 , C08G12/32 , C08G12/42 , C08G12/30
CPC分类号： C08G12/42 , C08G12/26 , C08G12/32 , Y10T428/249925
摘要： A resin composition useful as a crosslinker for graphics applications is provided comprising the reaction product of an amine derivative chosen from melamine, glycolurile or their mixtures with a C.sub.1 to C.sub.8 dialkoxyethanal, the reaction product is then mixed, preferably reacted with a polyol and a hydrophobic modifier.
摘要翻译：提供可用作图形应用的交联剂的树脂组合物，其包含选自三聚氰胺，乙缩醛或其混合物与C1至C8二烷氧基乙醛的胺衍生物的反应产物，然后将反应产物混合，优选与多元醇和疏水性修饰语。

3. 发明授权

US5173390A Water soluble contrast enhancement composition and method of use 失效
标题翻译：水溶性对比度增强组合物和使用方法
公开(公告)号：US5173390A
公开(公告)日：1992-12-22
申请号：US542471
申请日：1990-09-13
申请人： John B. Covington , Vic B. Marriott , Larry G. Venable , Peter Kim
发明人： John B. Covington , Vic B. Marriott , Larry G. Venable , Peter Kim
IPC分类号： G03F7/09
CPC分类号： G03F7/091
摘要： A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound consists of a 1-oxy-2-diazonaphthalene sulfonamide salt.
摘要翻译：公开了一种水溶性对比度增强化合物和组合物及其使用方法，用于改善光致抗蚀剂图案化和显影中的侧壁轮廓。该化合物由1-氧基-2-二氮杂萘磺酰胺盐组成。

4. 发明授权

US4997742A Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol 失效
标题翻译：水溶性对比增强组合物与1-氧基-2重氮萘磺酰胺盐和聚乙烯醇
公开(公告)号：US4997742A
公开(公告)日：1991-03-05
申请号：US267151
申请日：1988-12-09
申请人： John B. Covington , Vic B. Marriott , Larry G. Venable , Peter Kim
发明人： John B. Covington , Vic B. Marriott , Larry G. Venable , Peter Kim
IPC分类号： G03F7/09
CPC分类号： G03F7/091
摘要： A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound consists of a 1-oxy-2-diazonaphthalene sulfonamide salt.
摘要翻译：公开了一种水溶性对比度增强化合物和组合物及其使用方法，用于改善光致抗蚀剂图案化和显影中的侧壁轮廓。该化合物由1-氧基-2-二氮杂萘磺酰胺盐组成。

5. 发明授权

US4816380A Water soluble contrast enhancement layer method of forming resist image on semiconductor chip 失效
标题翻译：在半导体芯片上形成抗蚀剂图像的水溶性对比增强层法
公开(公告)号：US4816380A
公开(公告)日：1989-03-28
申请号：US879653
申请日：1986-06-27
申请人： John B. Covington , Vic B. Marriott , Larry G. Venable , Peter Kim
发明人： John B. Covington , Vic B. Marriott , Larry G. Venable , Peter Kim
IPC分类号： G03F7/095 , G03C1/00 , G03F7/00 , G03F7/004 , G03F7/09 , G03F7/11 , G03F7/26 , H01L21/027
CPC分类号： G03F7/091
摘要： A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound consists of a 1-oxy-2-diazonaphthalene sulfonamide salt.
摘要翻译：公开了一种水溶性对比度增强化合物和组合物及其使用方法，用于改善光致抗蚀剂图案化和显影中的侧壁轮廓。该化合物由1-氧基-2-二氮杂萘磺酰胺盐组成。

6. 发明授权

US06979481B2 Microporous photo glossy inkjet recording media 有权
标题翻译：微孔光泽喷墨记录介质
公开(公告)号：US06979481B2
公开(公告)日：2005-12-27
申请号：US10224241
申请日：2002-08-19
申请人： Gavin L. Gaynor , Larry G. Venable
发明人： Gavin L. Gaynor , Larry G. Venable
IPC分类号： B32B3/00 , B41M5/00 , B41M5/40 , B41M5/52
CPC分类号： B41M5/502 , B41M5/52 , B41M5/5218 , B41M5/5236
摘要： The present invention provides microporous photo quality glossy inkjet receiving media comprising a substrate, an absorbent basecoat layer, and an ink-receptive topcoat. The absorbent basecoat layer is primarily a combination of pigment and binder, and may include deformable particles, such as core-shell polymeric pigments. The ink-receptive topcoat is composed primarily of alumina hydrate, gelatin, and a water-insoluble cationic polymer. The present invention also provides a method for increasing the gloss and surface smoothness presented by the topcoat of a printing medium by including deformable particles in an underlying basecoat followed by calendering of the printing medium. Further, the present invention provides combination matte and gloss inkjet printing media, comprising matte basecoats at least partially coated with the aforementioned ink-receptive topcoat.
摘要翻译：本发明提供了微孔照片质量光泽喷墨接收介质，其包含基底，吸收基底涂层和吸墨顶层涂层。吸收性底漆层主要是颜料和粘合剂的组合，并且可以包括可变形颗粒，例如核 - 壳聚合颜料。油墨接受性面漆主要由水合氧化铝，明胶和水不溶性阳离子聚合物组成。本发明还提供了一种通过在下面的底漆中包含可变形颗粒，然后压印印刷介质来提高由打印介质的面漆所呈现的光泽度和表面光滑度的方法。此外，本发明提供组合的无光泽和光泽的喷墨印刷介质，其包括至少部分地涂覆有上述油墨接受性面漆的无光泽底漆。

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