专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07067237B2 Method for forming pattern of one-dimensional nanostructure 失效
标题翻译：形成一维纳米结构图案的方法
公开(公告)号：US07067237B2
公开(公告)日：2006-06-27
申请号：US10876623
申请日：2004-06-28
申请人： Jin Young Kim , Chang Ho Noh , Euk Che Hwang
发明人： Jin Young Kim , Chang Ho Noh , Euk Che Hwang
IPC分类号： G03F7/00
CPC分类号： G03F7/0043 , H01J9/025 , Y10S977/70
摘要： Disclosed herein are a method for forming a pattern of a one-dimensional nanostructure, and a pattern of a one-dimensional nanostructure formed by the method. The method comprises the steps of (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film, and selectively exposing the photocatalytic film to light to form latent image centers for crystal growth, (ii) growing metal crystals by plating the latent pattern to form a metal pattern, and (iii) selectively growing a one-dimensional nanostructure on the metal pattern acting as a catalyst.
摘要翻译：本文公开了一种形成一维纳米结构的图案的方法和通过该方法形成的一维纳米结构的图案。该方法包括以下步骤：（i）将光催化化合物涂覆到基底上以形成光催化膜，并将光催化膜选择性地曝光以形成晶体生长的潜像中心，（ii）通过电镀潜在图案生长金属晶体以形成金属图案，和（iii）在用作催化剂的金属图案上选择性地生长一维纳米结构。

2. 发明授权

US07488570B2 Method of forming metal pattern having low resistivity 失效
标题翻译：形成电阻率低的金属图案的方法
公开(公告)号：US07488570B2
公开(公告)日：2009-02-10
申请号：US11263866
申请日：2005-11-02
申请人： Chang Ho Noh , Ki Yong Song , Jin Young Kim , Sung Hen Cho , Euk Che Hwang , Tamara Byk
发明人： Chang Ho Noh , Ki Yong Song , Jin Young Kim , Sung Hen Cho , Euk Che Hwang , Tamara Byk
IPC分类号： G03F7/26
CPC分类号： C23C18/204 , C23C18/1608 , C23C18/1612 , C23C18/1651 , C23C18/1653 , C23C18/1868 , C23C18/1893 , C23C18/2086 , C23C18/31 , H01J2211/446
摘要： A method for forming a metal pattern with a low resistivity. The method may include the steps of: (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film layer; (ii) coating a water-soluble polymeric compound onto the photocatalytic film layer to form a water-soluble polymer layer; (iii) selectively exposing the two layers to light to form a latent pattern acting as a nucleus for crystal growth; and (iv) plating the latent pattern with a metal to grow metal crystals thereon. According to the method, a multilayer wiring pattern including a low resistivity metal may be formed in a relatively simple manner at low cost, and the metals constituting the respective layers can be freely selected according to the intended application. The low resistivity metal pattern may be advantageously applied to flat panel display devices, e.g., LCDs, PDPs and ELDs.
摘要翻译：一种用于形成具有低电阻率的金属图案的方法。该方法可以包括以下步骤：（i）将光催化化合物涂覆在基底上以形成光催化膜层; （ii）将水溶性聚合物涂覆在光催化膜层上以形成水溶性聚合物层; （iii）选择性地将两层曝光以形成用作晶体生长的核的潜伏图案; 和（iv）用金属电镀潜在图案以在其上生长金属晶体。根据该方法，可以以相对简单的方式以低成本形成包括低电阻率金属的多层布线图案，并且可以根据预期的应用自由选择构成各层的金属。低电阻率金属图案可有利地应用于平板显示装置，例如LCD，PDP和ELD。

3. 发明授权

US07494926B2 Method for forming highly conductive metal pattern on flexible substrate and EMI filter using metal pattern formed by the method 失效
标题翻译：在柔性基板上形成高导电金属图案的方法和使用由该方法形成的金属图案的EMI滤波器
公开(公告)号：US07494926B2
公开(公告)日：2009-02-24
申请号：US11014703
申请日：2004-12-20
申请人： Jin Young Kim , Sung Hen Cho , Ki Yong Song , Chang Ho Noh , Euk Che Hwang
发明人： Jin Young Kim , Sung Hen Cho , Ki Yong Song , Chang Ho Noh , Euk Che Hwang
IPC分类号： H01L21/44
CPC分类号： H05K3/20 , H05K1/0393 , H05K3/185 , H05K3/386 , H05K2203/121 , Y10T428/24917
摘要： Disclosed herein is a method for forming a highly conductive metal pattern which comprises forming a metal pattern on a substrate by the use of a photocatalyst and a selective electroless or electroplating process, and transferring the metal pattern to a flexible plastic substrate. According to the method, a highly conductive metal pattern can be effectively formed on a flexible plastic substrate within a short time, compared to conventional formation methods. Further disclosed is an EMI filter comprising a metal pattern formed by the method. The EMI filter not only exhibits high performances, but also is advantageous in terms of low manufacturing costs and simple manufacturing process. Accordingly, the EMI filter can be applied to a variety of flat panel display devices, including PDPs and organic ELs.
摘要翻译：本文公开了一种用于形成高导电性金属图案的方法，其包括通过使用光催化剂和选择性无电镀或电镀工艺在基板上形成金属图案，并将金属图案转印到柔性塑料基板上。根据该方法，与常规的形成方法相比，可以在短时间内在柔性塑料基板上有效地形成高导电性金属图案。进一步公开了一种EMI滤波器，其包括通过该方法形成的金属图案。 EMI滤波器不仅表现出高性能，而且在低制造成本和简单的制造工艺方面也是有利的。因此，EMI滤波器可以应用于各种平板显示装置，包括PDP和有机EL。

4. 发明授权

US07297451B2 Black matrix, method for the preparation thereof, flat display device and electromagnetic interference filter employing the same 失效
标题翻译：黑色矩阵，其制备方法，平面显示装置和采用该方法的电磁干扰滤波器
公开(公告)号：US07297451B2
公开(公告)日：2007-11-20
申请号：US11185695
申请日：2005-07-21
申请人： Ho Chul Lee , Euk Che Hwang , Jin Young Kim , Chang Ho Noh , Ki Yong Song , Sung Hen Cho
发明人： Ho Chul Lee , Euk Che Hwang , Jin Young Kim , Chang Ho Noh , Ki Yong Song , Sung Hen Cho
IPC分类号： G02B5/20
CPC分类号： H01J11/10 , G02F1/133512 , G02F2001/133334 , H01J2211/444
摘要： A novel black matrix, a method for preparing the same, and a flat display device and an electromagnetic interference filter to which the black matrix is applied. The black matrix is prepared by exposing a photoactive compound to form a latent pattern of nuclei for crystal growth and treating the latent pattern of nuclei for crystal growth with a metal salt solution to give a metal particle-deposited pattern; forming an electroless Ni-plated layer on the metal particle-deposited pattern; and forming an electroless Cu-plated layer on the electroless Ni-plated layer. Exhibiting improved black tone, which is achieved only by a selective multilayer plating process, without using expensive vacuum sputtering apparatus or a photolithographic process, the black matrix can be applied to various flat display devices. In addition, due to improved electric conductivity, the black matrix can be used in an electromagnetic interference filter, without employing an additional front surface blackening process.
摘要翻译：一种新颖的黑色矩阵，其制备方法以及应用黑矩阵的平面显示装置和电磁干扰滤波器。通过使光活性化合物曝光以形成晶体生长的核的潜在图案并用金属盐溶液处理晶核生长的细胞核的潜在图案以得到金属颗粒沉积图案来制备黑色矩阵; 在金属颗粒沉积图案上形成化学镀Ni层; 并在无电Ni镀层上形成化学镀Cu层。通过选择性多层电镀工艺实现的改进的黑色调，不使用昂贵的真空溅镀装置或光刻工艺，可以将黑色矩阵应用于各种平面显示装置。此外，由于电导率的提高，黑矩阵可以用于电磁干扰滤波器，而不需要额外的前表面变黑处理。

5. 发明授权

US07255980B2 Black matrix, method for preparing the same, and flat panel display and electromagnetic interference filter using the same 失效
标题翻译：黑色矩阵，其制备方法，以及使用其的平板显示器和电磁干扰滤波器
公开(公告)号：US07255980B2
公开(公告)日：2007-08-14
申请号：US11270545
申请日：2005-11-10
申请人： Euk Che Hwang , Chang Ho Noh , Jin Young Kim , Ki Yong Song , Sung Hen Cho
发明人： Euk Che Hwang , Chang Ho Noh , Jin Young Kim , Ki Yong Song , Sung Hen Cho
IPC分类号： G02B5/20
CPC分类号： G02B5/285 , G02F1/133512 , G02F2001/133334
摘要： A black matrix, a method for preparing the black matrix, a flat panel display and an electromagnetic interference filter using the black matrix. The black matrix may comprise a substrate, a titanium oxide layer, a Ni plating layer, and a Ni/Pd alloy layer. The method may comprise the steps of forming a titanium oxide layer, forming a metal particle-deposited pattern on the titanium oxide layer, forming a Ni electroless plating layer on the metal particle-deposited pattern, and forming a Ni/Pd alloy layer on the Ni electroless plating layer. Since the black matrix may have a high blackening density via simple selective multilayer plating without using a high-price vacuum sputtering apparatus and undergoing photolithography, unlike conventional chromium-based black matrices, it may be employed in various flat panel displays. In addition, since the black matrix may exhibit superior electrical conductivity, it may be used in electromagnetic interference filters without additional front-surface blackening.
摘要翻译：黑矩阵，黑矩阵的制备方法，平板显示器和使用黑矩阵的电磁干扰滤波器。黑色矩阵可以包括基底，氧化钛层，Ni镀层和Ni / Pd合金层。该方法可以包括以下步骤：在氧化钛层上形成氧化钛层，形成金属颗粒沉积图案，在金属颗粒沉积图案上形成Ni化学镀层，并在其上形成Ni / Pd合金层镍化学镀层。由于黑色矩阵可以通过简单的选择性多层电镀具有高的黑化密度，而不使用高价格的真空溅射装置并进行光刻，与常规的铬基黑色矩阵不同，可以用于各种平板显示器。此外，由于黑矩阵可以表现出优异的导电性，所以它可以用于电磁干扰滤光器中，而没有额外的前表面变黑。

6. 发明授权

US07205098B2 Method for manufacturing high-transmittance optical filter for image display devices 有权
标题翻译：用于制造用于图像显示装置的高透光率滤光器的方法
公开(公告)号：US07205098B2
公开(公告)日：2007-04-17
申请号：US11280393
申请日：2005-11-17
申请人： Sung Hen Cho , Euk Che Hwang , Jin Young Kim , Chang Ho Noh , Ki Yong Song , Ho Chul Lee
发明人： Sung Hen Cho , Euk Che Hwang , Jin Young Kim , Chang Ho Noh , Ki Yong Song , Ho Chul Lee
IPC分类号： G02B5/20
CPC分类号： G03F7/0007 , G03F7/0042 , G03F7/11 , G03F7/265 , G03F7/32 , G03F7/423
摘要： A method for manufacturing a high-transmittance optical filter for image display devices, which may include the steps of coating a photocatalytic compound on a transparent substrate to form a photocatalytic film, selectively exposing the photocatalytic film to light and growing a metal crystal thereon by plating to form a metal pattern, and selectively etching and removing the photocatalytic compound remaining on the transparent substrate using a buffered oxide etchant (BOE). According to the method, a high-transmittance, high-resolution and low-resistivity optical filter can be manufactured in a simple manner at low costs.
摘要翻译：一种用于图像显示装置的高透光率滤光器的制造方法，其可以包括在透明基板上涂布光催化剂以形成光催化膜的步骤，选择性地将光催化膜曝光并通过电镀在其上生长金属结晶以形成金属图案，并使用缓冲氧化物蚀刻剂（BOE）选择性地蚀刻和除去留在透明基板上的光催化化合物。根据该方法，可以以低成本以简单的方式制造高透光率，高分辨率和低电阻率的滤光器。

7. 发明申请

US20110104617A1 Organometallic composition for forming a metal alloy pattern and a method of forming such a pattern using the composition 失效
标题翻译：用于形成金属合金图案的有机金属组合物和使用该组合物形成这种图案的方法
公开(公告)号：US20110104617A1
公开(公告)日：2011-05-05
申请号：US12929151
申请日：2011-01-04
申请人： Jin Young Kim , Soon Taik Hwang , Young Hun Byun , Euk Che Hwang , Sang Yoon Lee
发明人： Jin Young Kim , Soon Taik Hwang , Young Hun Byun , Euk Che Hwang , Sang Yoon Lee
IPC分类号： G03F7/20
CPC分类号： G03F7/0043 , G03F7/0042
摘要： An organometallic composition containing an organometallic compound (I) containing Ag, an organometallic compound (II) containing Au, Pd, or Ru, and an organometallic compound (III) containing Ti, Ta, Cr, Mo, Ru, Ni, Pd, Cu, Au, or Al, wherein the metal components of organometallic compounds (II) and (III), respectively, are present in an amount of 0.01˜10 mol % based on the amount of Ag in the organometallic compound (I), and a method of forming a metal alloy pattern using the same. Silver alloy patterns can be obtained through a simplified manufacturing process, which patterns have enhanced heat resistance, adhesiveness, and chemical stability. The method may be applied to making a reflective film for LCD and metal wiring (gate, source, drain electrode) for flexible displays or flat panel displays, and further to CMP-free damascene processing and PR-free ITO film deposition.
摘要翻译：含有含Ag的有机金属化合物（I），含有Au，Pd或Ru的有机金属化合物（II）和含有Ti，Ta，Cr，Mo，Ru，Ni，Pd，Cu的有机金属化合物（III）的有机金属组合物，Au或Al，其中有机金属化合物（II）和（III）的金属组分分别以有机金属化合物（I）中的Ag的量为0.01〜10摩尔％，和使用其形成金属合金图案的方法。可以通过简化的制造工艺获得银合金图案，该图案具有增强的耐热性，粘合性和化学稳定性。该方法可以应用于制造用于LCD和用于柔性显示器或平板显示器的LCD和金属布线（栅极，源极，漏极）的反射膜，并且还可用于制造无CMP的镶嵌加工和无PR的ITO膜沉积。

8. 发明授权

US08715914B2 Organometallic composition for forming a metal alloy pattern and a method of forming such a pattern using the composition 失效
标题翻译：用于形成金属合金图案的有机金属组合物和使用该组合物形成这种图案的方法
公开(公告)号：US08715914B2
公开(公告)日：2014-05-06
申请号：US12929151
申请日：2011-01-04
申请人： Jin Young Kim , Soon Taik Hwang , Young Hun Byun , Euk Che Hwang , Sang Yoon Lee
发明人： Jin Young Kim , Soon Taik Hwang , Young Hun Byun , Euk Che Hwang , Sang Yoon Lee
IPC分类号： G03C1/735
CPC分类号： G03F7/0043 , G03F7/0042
摘要： An organometallic composition containing an organometallic compound (I) containing Ag, an organometallic compound (II) containing Au, Pd, or Ru, and an organometallic compound (III) containing Ti, Ta, Cr, Mo, Ru, Ni, Pd, Cu, Au, or Al, wherein the metal components of organometallic compounds (II) and (III), respectively, are present in an amount of 0.01˜10 mol % based on the amount of Ag in the organometallic compound (I), and a method of forming a metal alloy pattern using the same. Silver alloy patterns can be obtained through a simplified manufacturing process, which patterns have enhanced heat resistance, adhesiveness, and chemical stability. The method may be applied to making a reflective film for LCD and metal wiring (gate, source, drain electrode) for flexible displays or flat panel displays, and further to CMP-free damascene processing and PR-free ITO film deposition.
摘要翻译：含有含Ag的有机金属化合物（I），含有Au，Pd或Ru的有机金属化合物（II）和含有Ti，Ta，Cr，Mo，Ru，Ni，Pd，Cu的有机金属化合物（III）的有机金属组合物，Au或Al，其中有机金属化合物（II）和（III）的金属组分分别以有机金属化合物（I）中的Ag的量为0.01〜10摩尔％，和使用其形成金属合金图案的方法。可以通过简化的制造工艺获得银合金图案，该图案具有增强的耐热性，粘合性和化学稳定性。该方法可以应用于制造用于LCD和用于柔性显示器或平板显示器的LCD和金属布线（栅极，源极，漏极）的反射膜，并且还可用于制造无CMP的镶嵌加工和无PR的ITO膜沉积。

9. 发明授权

US07883838B2 Organometallic composition for forming a metal alloy pattern and a method of forming such a pattern using the composition 有权
标题翻译：用于形成金属合金图案的有机金属组合物和使用该组合物形成这种图案的方法
公开(公告)号：US07883838B2
公开(公告)日：2011-02-08
申请号：US10718809
申请日：2003-11-24
申请人： Jin Young Kim , Soon Taik Hwang , Young Hun Byun , Euk Che Hwang , Sang Yoon Lee
发明人： Jin Young Kim , Soon Taik Hwang , Young Hun Byun , Euk Che Hwang , Sang Yoon Lee
IPC分类号： B01J31/12 , C08F4/42
CPC分类号： G03F7/0043 , G03F7/0042
摘要： An organometallic composition containing an organometallic compound (I) containing Ag, an organometallic compound (II) containing Au, Pd, or Ru, and an organometallic compound (III) containing Ti, Ta, Cr, Mo, Ru, Ni, Pd, Cu, Au, or Al, wherein the metal components of organometallic compounds (II) and (III), respectively, are present in an amount of 0.01˜10 mol % based on the amount of Ag in the organometallic compound (I), and a method of forming a metal alloy pattern using the same. Silver alloy patterns can be obtained through a simplified manufacturing process, which patterns have enhanced heat resistance, adhesiveness and chemical stability. The method may be applied to making a reflective film for LCD and metal wiring (gate, source, drain electrode) for flexible displays or flat panel displays, and further to CMP-free damascene processing and PR-free ITO film deposition.
摘要翻译：含有含Ag的有机金属化合物（I），含有Au，Pd或Ru的有机金属化合物（II）和含有Ti，Ta，Cr，Mo，Ru，Ni，Pd，Cu的有机金属化合物（III）的有机金属组合物，Au或Al，其中有机金属化合物（II）和（III）的金属组分分别以有机金属化合物（I）中的Ag的量为0.01〜10摩尔％，和使用其形成金属合金图案的方法。可以通过简化的制造工艺获得银合金图案，该图案具有增强的耐热性，粘合性和化学稳定性。该方法可以应用于制造用于LCD和用于柔性显示器或平板显示器的LCD和金属布线（栅极，源极，漏极）的反射膜，并且还可用于制造无CMP的镶嵌加工和无PR的ITO膜沉积。

10. 发明授权

US07750555B2 Transparent electrode and preparation method thereof 有权
标题翻译：透明电极及其制备方法
公开(公告)号：US07750555B2
公开(公告)日：2010-07-06
申请号：US11557239
申请日：2006-11-07
申请人： Ki Yong Song , Jin Young Kim , Sung Hen Cho , Chang Ho Noh
发明人： Ki Yong Song , Jin Young Kim , Sung Hen Cho , Chang Ho Noh
IPC分类号： H05B33/04 , H05B33/10
CPC分类号： H01J29/02 , H01B1/127 , H01B1/128 , H01J9/02 , H01J11/10 , H01J11/22 , H01L31/022466 , H01L31/1884 , Y02E10/50
摘要： Disclosed herein is a transparent electrode featuring the interposition of a nano-metal layer between a grid electrode on a transparent substrate and an electroconductive polymer layer, and a preparation method thereof. The transparent electrode can be produced in a continuous process at high productivity and low cost and can be applied to various display devices.
摘要翻译：这里公开了一种透明电极，其特征在于在透明基板上的栅电极和导电聚合物层之间插入纳米金属层及其制备方法。透明电极可以以高生产率和低成本在连续工艺中制造，并且可以应用于各种显示装置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式