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    • 9. 发明授权
    • Vinyl 4-t-butoxycarbonyloxybenzal-vinyl 4-hydroxybenzal-vinyl alcohol-vinyl acetate copolymer
    • 乙烯基4-叔丁氧基羰氧基苯甲醛 - 乙烯基4-羟基苯甲醛 - 乙烯醇 - 乙酸乙烯酯共聚物
    • US06559228B2
    • 2003-05-06
    • US09813307
    • 2001-03-21
    • Jin Baek KimHyun Woo Kim
    • Jin Baek KimHyun Woo Kim
    • C08F11606
    • C08F8/28C08F8/48C08F16/06
    • There is a vinyl 4-hydroxybenzal-vinylalcohol-vinyl acetate copolymer, a 4-t-butoxycarbonyloxybenzal-vinyl alcohol-vinyl acetate copolymer and a vinyl 4-t-butoxycarbonyloxybenzal-vinyl 4-hydroxybenzal-vinyl alcohol-vinyl acetate copolymer suitable for photoresist and methods for preparing the same. The latter two polymers contain 4-hydroxybenzal groups all or parts of which are protected with t-butoxycarbonyl group. Superior in transparency, thermal stability, mechanical strength, and adhesiveness to silicon wafer, the photoresists prepared from the protected copolymers can enhance the resolution of fine circuit by virtue of low weight loss upon the thermal treatment after exposure.
    • 有4-羟基苯甲醛 - 乙烯醇 - 醋酸乙烯酯的共聚物,4-叔丁氧羰基氧基苯甲醛 - 乙烯醇 - 乙酸乙烯酯共聚物和适用于光刻胶的4-叔丁氧羰基氧基苯甲醛 - 乙烯基4-羟基苯甲醛 - 乙烯醇 - 及其制备方法。 后两种聚合物含有全部或部分被叔丁氧基羰基保护的4-羟基苯甲酰基。 透明度,热稳定性,机械强度和与硅片的粘合性优异,由保护的共聚物制备的光致抗蚀剂可以通过曝光后的热处理的低重量损失增强精细回路的分辨率。
    • 10. 发明授权
    • Vinyl 4-t-butoxycarbonyloxbenzal-vinyl alcohol-vinylacetate copolymer and preparation method thereof
    • 乙烯基4-叔丁氧羰基氧基苯乙烯 - 乙烯醇 - 乙酸乙烯酯共聚物及其制备方法
    • US06235836B1
    • 2001-05-22
    • US08757262
    • 1996-11-27
    • Jin Baek KimHyun Woo Kim
    • Jin Baek KimHyun Woo Kim
    • C08F21606
    • C08F8/28C08F8/48C08F16/06
    • There is a vinyl 4-hydroxybenzal-vinylalcohol-vinyl acetate copolymer, a 4-t-butoxycarbonyloxybenzal-vinyl alcohol-vinyl acetate copolymer and a vinyl 4-t-butoxycarbonyloxybenzal-vinyl 4-hydroxybenzal-vinyl alcohol-vinyl acetate copolymer suitable for photoresist and methods for preparing the same. The latter two polymers contain 4-hydroxybenzal groups all or parts of which are protected with t-butoxycarbonyl group. Superior in transparency, thermal stability, mechanical strength, and adhesiveness to silicon wafer, the photoresists prepared from the protected copolymers can enhance the resolution of fine circuit by virtue of low weight loss upon the thermal treatment after exposure.
    • 有4-羟基苯甲醛 - 乙烯醇 - 醋酸乙烯酯的共聚物,4-叔丁氧羰基氧基苯甲醛 - 乙烯醇 - 乙酸乙烯酯共聚物和适用于光刻胶的4-叔丁氧羰基氧基苯甲醛 - 乙烯基4-羟基苯甲醛 - 乙烯醇 - 及其制备方法。 后两种聚合物含有全部或部分被叔丁氧基羰基保护的4-羟基苯甲酰基。 透明度,热稳定性,机械强度和与硅片的粘合性优异,由保护的共聚物制备的光致抗蚀剂可以通过曝光后的热处理的低重量损失增强精细回路的分辨率。