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    • 2. 发明授权
    • Reference leak
    • 参考泄漏
    • US07353687B2
    • 2008-04-08
    • US11228821
    • 2005-09-16
    • Jie TangLiang LiuPeng LiuZhao-Fu HuBing-Chu DuCai-Lin GuoPi-Jin ChenShou-Shan Fan
    • Jie TangLiang LiuPeng LiuZhao-Fu HuBing-Chu DuCai-Lin GuoPi-Jin ChenShou-Shan Fan
    • G01F25/00
    • G01M3/007
    • A reference leak includes a leak layer formed of one of a metallic material, a glass material, and a ceramic material. The metallic material is selected from the group consisting of copper, nickel, and molybdenum. The leak layer comprises a number of substantially parallel leak through holes defined therein. The leak through holes may be cylindrical holes or polyhedrical holes. A length of each of the leak through holes is preferably not less than 20 times a diameter thereof. A diameter of each of the leak through holes is generally in the range from 10 nm to 500 nm. A length of each of the leak through holes is generally in the range from 100 nm to 100 μm. A leak rate of the reference leak is in the range from 10−8 to 10−15 tor×l/s. The leak through holes have substantially same length and diameter.
    • 参考泄漏包括由金属材料,玻璃材料和陶瓷材料之一形成的泄漏层。 金属材料选自铜,镍和钼。 泄漏层包括限定在其中的多个基本上平行的泄漏通孔。 泄漏孔可以是圆柱形孔或多面孔。 每个泄漏通孔的长度优选不小于其直径的20倍。 每个泄漏通孔的直径通常在10nm至500nm的范围内。 每个泄漏通孔的长度通常在100nm至100μm的范围内。 参考泄漏的泄漏率在10 -8至10 -15 torxl / s的范围内。 泄漏孔具有基本相同的长度和直径。
    • 4. 发明授权
    • Field emission device and field emission display employing the same
    • 场致发射器件和采用其的场致发射显示器
    • US07714493B2
    • 2010-05-11
    • US11438022
    • 2006-05-19
    • Bing-chu DuJie TangCai-lin GuoLiang LiuZhao-fu HuPi-jin ChenShou-shan Fan
    • Bing-chu DuJie TangCai-lin GuoLiang LiuZhao-fu HuPi-jin ChenShou-shan Fan
    • H01J9/02H01J1/02
    • H01J3/022H01J31/127
    • A field emission device (6), in accordance with a preferred embodiment, includes a cathode electrode (61), a gate electrode (64), a separator (62), and a number of emissive units (63) composed of an emissive material. The separator includes an insulating portion (621) and a number of conductive portions (622). The insulating portion of the separator is configured between the cathode electrode and the gate electrode for insulating the cathode electrode from the gate electrode. The emissive units are configured on the separator at positions proximate to two sides of the gate electrode. The emissive units are in connection with the cathode electrode via the conductive portions respectively. The emissive units are distributed on the separator adjacent to two sides of the gate electrode, which promotes an ability of emitting electrons from the emissive material and the emitted electrons to be guided by the gate electrode toward a smaller spot they bombard.
    • 根据优选实施例的场致发射器件(6)包括阴极电极(61),栅极电极(64),隔膜(62)和由发射材料构成的多个发射单元(63) 。 分离器包括绝缘部分(621)和多个导电部分(622)。 隔板的绝缘部分配置在阴极电极和栅电极之间,用于将阴极电极与栅电极绝缘。 发射单元被配置在分离器上靠近栅电极两侧的位置处。 发射单元分别经由导电部分与阴极连接。 发射单元分布在邻近栅电极的两侧的分离器上,这促进了从发射材料发射电子的能力,并且发射的电子被栅电极引导到他们轰击的较小的位置。
    • 10. 发明申请
    • Reference leak
    • 参考泄漏
    • US20060144120A1
    • 2006-07-06
    • US11228821
    • 2005-09-16
    • Jie TangLiang LiuPeng LiuZhao-Fu HuBing-Chu DuCai-Lin GuoPi-Jin ChenShou-Shan Fan
    • Jie TangLiang LiuPeng LiuZhao-Fu HuBing-Chu DuCai-Lin GuoPi-Jin ChenShou-Shan Fan
    • G01F25/00
    • G01M3/007
    • A reference leak includes a leak layer formed of one of a metallic material, a glass material, and a ceramic material. The metallic material is selected from the group consisting of copper, nickel, and molybdenum. The leak layer comprises a number of substantially parallel leak through holes defined therein. The leak through holes may be cylindrical holes or polyhedrical holes. A length of each of the leak through holes is preferably not less than 20 times a diameter thereof. A diameter of each of the leak through holes is generally in the range from 10 nm to 500 nm. A length of each of the leak through holes is generally in the range from 100 nm to 100 μm. A leak rate of the reference leak is in the range from 10−8 to 10−15 tor×l/s. The leak through holes have substantially same length and diameter.
    • 参考泄漏包括由金属材料,玻璃材料和陶瓷材料之一形成的泄漏层。 金属材料选自铜,镍和钼。 泄漏层包括限定在其中的多个基本上平行的泄漏通孔。 泄漏孔可以是圆柱形孔或多面孔。 每个泄漏通孔的长度优选不小于其直径的20倍。 每个泄漏通孔的直径通常在10nm至500nm的范围内。 每个泄漏通孔的长度通常在100nm至100μm的范围内。 参考泄漏的泄漏率在10 -8至10 -15 torxl / s的范围内。 泄漏孔具有基本相同的长度和直径。