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    • 3. 发明申请
    • SYSTEM AND METHOD FOR TRANSMISSION OF GOODS THROUGH A DISTRIBUTION NETWORK
    • 通过分布式网络传输商品的系统和方法
    • US20130046574A1
    • 2013-02-21
    • US13588865
    • 2012-08-17
    • Justin GriepDavid Bennett
    • Justin GriepDavid Bennett
    • G06Q10/06
    • G06Q10/06G06Q10/06311G06Q10/08
    • A system and method for replenishing product in an inventory of a distribution network having a plurality of levels, wherein the system and method may include determining an independent quantity demanded of a product at a first-level entity of the distribution network associated with customer demand directly from the first-level entity; determining a dependent quantity demanded of the product at the first-level entity associated with overall demand from the distribution network apportioned to the first-level entity; summing the quantities demanded in the preceding steps to determine a total quantity demanded for the first-level entity; repeating the preceding actions for levels of the distribution network eligible for processing up to a highest-level entity of the distribution network, thereby generating a plurality of quantity-demanded sums for the respective entities; and calculating a total quantity demanded of the product for the distribution network by summing the quantity-demanded sums of the respective entities.
    • 一种用于在具有多个级别的分销网络的库存中补充产品的系统和方法,其中所述系统和方法可以包括确定在直接与客户需求相关联的分销网络的第一级实体处的产品所需的独立数量 从一级实体; 确定与分配给第一级实体的分销网络的总需求相关的第一级实体的产品所需的依赖数量; 总结上述步骤中要求的数量,以确定一级实体所需的总量; 对适合处理到分发网络的最高级实体的分发网络的级别重复上述动作,从而为各个实体生成多个数量需求的和; 以及通过对各个实体的数量需求量求和来计算分配网络的产品所需的总量。
    • 5. 发明申请
    • NETWORK APPARATUSES, NETWORKS, COMPUTER PROGRAM PRODUCTS, AND MANAGEMENT STATION OPERATIONAL METHODS
    • 网络设备,网络,计算机程序产品和管理站操作方法
    • US20070206564A1
    • 2007-09-06
    • US11745241
    • 2007-05-07
    • David LiuDavid Bennett
    • David LiuDavid Bennett
    • H04L12/28
    • H04L41/022
    • Network apparatuses, networks, computer program products, and management station operational methods are provided. One aspect of the invention provides a network apparatus including a management station adapted to couple with a network including a plurality of managed devices, the management station being configured to output a plurality of initial commands for application to respective managed devices, the initial commands being configured to stimulate initial responses from the managed devices, the management station being further configured to receive the initial responses, to identify responding ones of the managed devices responsive to the received initial responses, and to provide an asset table containing the identified managed devices. Another aspect provides a management station operational method including providing a network comprising a plurality of managed devices; outputting a plurality of initial commands to the managed devices using a management station to stimulate initial responses from the managed devices; receiving the initial responses from the managed devices using the management station; and identifying the managed devices using the management station responsive to the receiving the initial responses.
    • 提供网络设备,网络,计算机程序产品和管理站操作方法。 本发明的一个方面提供了一种网络设备,包括管理站,其适于与包括多个被管理设备的网络耦合,所述管理站被配置为输出多个初始命令以应用于相应的被管理设备,所述初始命令被配置 为了刺激来自被管理设备的初始响应,管理站被进一步配置为接收初始响应,以响应于接收到的初始响应来识别被管理设备中的响应的一个,并提供包含所识别的被管理设备的资产表。 另一方面提供一种管理站操作方法,包括提供包括多个被管理设备的网络; 使用管理站向所述被管理设备输出多个初始命令以刺激来自被管理设备的初始响应; 使用管理站接收来自被管理设备的初始响应; 以及响应于接收到所述初始响应,使用所述管理站识别所述被管理设备。
    • 9. 发明授权
    • Various methods of controlling conformal film deposition processes, and a system for accomplishing same
    • 控制保形膜沉积工艺的各种方法,以及用于实现其的系统
    • US06794299B1
    • 2004-09-21
    • US10161312
    • 2002-06-03
    • Richard J. MarkleDavid Bennett
    • Richard J. MarkleDavid Bennett
    • H01L21302
    • H01L22/20H01L21/76801H01L21/76838H01L21/76841H01L22/34
    • Various methods of controlling conformal film deposition processes, and a system for accomplishing same are disclosed. In one embodiment, the method comprises forming a plurality of features above a semiconducting substrate, determining at least one of a critical dimension and a cross-sectional profile of at least one of the plurality of features, determining a thickness for a layer of material to be conformally deposited around the plurality of features based upon at least one of the determined critical dimension and cross-sectional profile and depositing the layer of material around the plurality of features to the determined thickness. In some embodiments, the method further comprises conformally depositing a first layer of material above a plurality of features formed above a semiconducting substrate, measuring a thickness of the first layer of material, determining a thickness of a second layer of material to be conformally deposited around a plurality of features formed above a subsequently processed substrate based upon the measured thickness of the first layer, and conformally depositing the second layer of material to the determined thickness around the plurality of features on the subsequently processed substrate.
    • 公开了控制保形膜沉积工艺的各种方法,以及用于实现其的系统。 在一个实施例中,该方法包括在半导体衬底上形成多个特征,确定多个特征中的至少一个的临界尺寸和横截面轮廓中的至少一个,确定材料层的厚度 基于所确定的临界尺寸和横截面轮廓中的至少一个,围绕多个特征共形沉积,并将材料层围绕多个特征沉积到所确定的厚度。 在一些实施例中,该方法还包括在半导体衬底上形成的多个特征上方共形沉积材料的第一层,测量第一层材料的厚度,确定要保形地沉积的第二层材料的厚度 基于所测量的第一层的厚度,形成在随后处理的衬底上方的多个特征,并且将随后处理的衬底上的多个特征的第二材料层保形地沉积到所确定的厚度。