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    • 3. 发明授权
    • Method of preparing a photo-mask for imaging three-dimensional objects
    • 制备用于成像三维物体的光掩模的方法
    • US5141829A
    • 1992-08-25
    • US580057
    • 1990-09-10
    • William V. DumasBradley R. KarasDonald F. FoustJames W. Rose
    • William V. DumasBradley R. KarasDonald F. FoustJames W. Rose
    • B29C51/10G03F1/00G03F1/60G03F7/20H05K1/00H05K3/00H05K9/00
    • H05K3/0002G03F1/50G03F1/60G03F7/20B29C2791/006B29C2795/002B29C51/10H05K1/0284H05K2203/056
    • A method for the preparation a photo-mask used for photo-imaging selected areas on the surfaces of a three-dimensional printed circuit board substrate. The photo-mask comprises a membrane transparent and degradation resistant to UV light, having at least one side with a contoured shape conforming, and flexible enough to comply with surface irregularities on the surfaces of the three-dimensional substrate being photo-imaged. A pattern of tracks opaque to UV light is posiitoned along the contoured shape of the membrane. The pattern of tracks on the photo-mask is in accordance with a desired conductive metal trace pattern on the surfaces of the three-dimensional printed circuit board substrate. The photo-mask is prepared by photo-imaging and then depositing a track material on a film that conformed to the surfaces of the three-dimensional substrate. An adhesive layer applied over the film cements a membrane material poured upon the adhesive layer. Once the membrane material sets into the membrane it is sepaarated from the substrate to form the photo-mask of the present invention.
    • 一种用于制备用于对三维印刷电路板基板的表面上的选定区域进行光学成像的光掩模的方法。 所述光掩模包括透明且耐紫外光降解的膜,其具有至少一个具有轮廓形状的侧面,并且足够柔性以使其符合正在被光成像的三维基底的表面上的表面凹凸。 沿紫外光不透明的轨迹图沿着膜的轮廓形状放置。 光掩模上的轨迹图案与三维印刷电路板基板表面上所需的导电金属迹线图案相符。 通过光成像制备光掩模,然后将轨道材料沉积在符合三维基板表面的膜上。 施加在膜上的粘合剂层将浇注在粘合剂层上的膜材料粘合。 一旦膜材料进入膜,就将其从基底上分离出来形成本发明的光掩膜。
    • 4. 发明授权
    • Process for preparing a photo-mask for imaging three-dimensional objects
    • 制备用于成像三维物体的光掩模的方法
    • US5153084A
    • 1992-10-06
    • US580064
    • 1990-09-10
    • Donald Franklin FoustBradley R. KarasEdward J. LambyWilliam V. Dumas
    • Donald Franklin FoustBradley R. KarasEdward J. LambyWilliam V. Dumas
    • G03F1/68H05K1/00H05K3/00
    • G03F7/24G03F1/68H05K3/0002H05K1/0284H05K2203/056
    • A method for the preparation a photo-mask used for photo-imaging selected areas on the surfaces of a three-dimensional printed circuit board substrate. The photo-mask comprises a membrane transparent and degradation resistant to UV light, having at least one side with a contoured shape conforming, and flexible enough to comply with surface irregularities on the surfaces of the three-dimensional substrate being photo-imaged. A pattern of tracks opaque to UV light is positioned along the contoured shape of the membrane. The pattern of tracks on the photo-mask is in accordance with a desired conductive metal trace pattern on the surfaces of the three-dimensional printed circuit board substrate. The photo-mask is prepared by dispensing a track material in a boustrophedenous manner on the surfaces of the substrate being photo-imaged. A membrane material is then poured upon the surfaces containing the dispensed tracks. Once the materials of tracks and membrane set and are separated from the substrate, the photo-mask of the present invention is formed.
    • 一种用于制备用于对三维印刷电路板基板的表面上的选定区域进行光学成像的光掩模的方法。 所述光掩模包括透明且耐紫外光降解的膜,其具有至少一个具有轮廓形状的侧面,并且足够柔性以使其符合正在被光成像的三维基底的表面上的表面凹凸。 沿紫外线不透明的轨道图案沿着膜的轮廓形状定位。 光掩模上的轨迹图案与三维印刷电路板基板表面上所需的导电金属迹线图案相符。 光掩模的制备方法是以光束成像的方式在基底表面上分散轨道材料。 然后将膜材料倒在包含分配的轨道的表面上。 轨道和膜的材料一旦与衬底分离,就形成本发明的光掩膜。
    • 6. 发明授权
    • Technique for preparing a photo-mask for imaging three-dimensional
objects
    • 制备用于成像三维物体的光罩的技术
    • US5178976A
    • 1993-01-12
    • US580058
    • 1990-09-10
    • James W. RoseBradley R. KarasLubomry S. Onyshkevych
    • James W. RoseBradley R. KarasLubomry S. Onyshkevych
    • G03F1/00H05K1/00H05K3/00
    • H05K3/0002G03F1/70H05K1/0284H05K2203/056H05K2203/107
    • A method for the preparation a photo-mask used for photo-imaging selected areas on the surfaces of a three-dimensional printed circuit board substrate. The photo-mask comprises an opaque layer, opaque and degradation resistant to UV light, having at least one side with a contoured shape conforming to the surface irregularities on the surfaces of the three-dimensional substrate being photo-imaged. A membrane transparent and degradation resistant to UV light, having at least one side cemented to the side of the opaque layer not in contact with the surfaces of the three-dimensional substrate being photo-imaged. A pattern of grooves positioned on the opaque layer allow transmission of UV light during the photo-imaging of the surfaces of the three-dimensiional substrate. The pattern of grooves is in accordance with a conductive metal trace pattern desired on the surfaces of the three-dimensional printed circuit board substrate. The photo-mask is prepared by first forming an opaque material layer on the surfaces of the three-dimensional substrate, followed by a membrane material to form the membrane. The pattern of grooves is created by ablating the opaque layer in selected areas by means of a laser beam from a laser moved in a boustrophedonous manner.
    • 一种用于制备用于对三维印刷电路板基板的表面上的选定区域进行光学成像的光掩模的方法。 所述光掩模包括不透明的并且对UV光具有耐劣化性的不透明层,其具有至少一个侧面,所述至少一个侧面具有与所述三维基板的表面上的表面不规则性相一致的光学成像。 具有至少一面粘合到不透明层的不与三维基板的表面接触的一面的紫外光透明和降解的膜被光成像。 定位在不透明层上的凹槽的图案允许在三维基底的表面的光成像期间透射UV光。 凹槽的图案与三维印刷电路板基板的表面上所需的导电金属迹线图案相一致。 通过首先在三维基板的表面上形成不透明材料层,然后形成膜材料来制备光掩模。 凹槽的图案通过借助于以双向方式移动的激光器的激光束烧蚀选定区域中的不透明层而产生。