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    • 1. 发明授权
    • Parallax barrier device and fabricating method thereof
    • 视差屏障装置及其制造方法
    • US08520287B2
    • 2013-08-27
    • US13335943
    • 2011-12-23
    • Jian-Hong LeeJih-Fon HuangYi-Wen Chung
    • Jian-Hong LeeJih-Fon HuangYi-Wen Chung
    • G02F1/153G09G3/38
    • G02B27/2214G02F1/153Y10T29/413
    • A parallax barrier device includes: a first substrate; a first patterned transparent electrode layer disposed on the first substrate; a first patterned electrochromic material layer disposed on the first patterned transparent electrode layer and including a plurality of electrochromic structures, in which lengths, widths or diameters of the electrochromic structures are 50 nm to 500 nm, and included angles of the electrochromic structures and a surface of the first substrate to be deposited are 30° to 89°; a second substrate; a second patterned transparent electrode layer disposed on the second substrate; a second patterned electrochromic material layer disposed on the second patterned transparent electrode layer; and an electrolyte disposed between the first patterned electrochromic material layer and the second patterned electrochromic material layer.
    • 视差屏障装置包括:第一基板; 设置在第一基板上的第一图案化透明电极层; 设置在第一图案化透明电极层上并包括多个电致变色结构的第一图案化电致变色材料层,其中电致变色结构的长度,宽度或直径为50nm至500nm,并且电致变色结构和表面的夹角 的第一衬底的厚度为30°至89°; 第二基板; 设置在所述第二基板上的第二图案化透明电极层; 设置在第二图案化透明电极层上的第二图案化电致变色材料层; 以及设置在第一图案化电致变色材料层和第二图案化电致变色材料层之间的电解质。
    • 2. 发明申请
    • PARALLAX BARRIER DEVICE AND FABRICATING METHOD THEREOF
    • PARALLAX BARRIER器件及其制造方法
    • US20120162744A1
    • 2012-06-28
    • US13335943
    • 2011-12-23
    • Jian-Hong LeeJih-Fon HuangYi-Wen Chung
    • Jian-Hong LeeJih-Fon HuangYi-Wen Chung
    • G02F1/153H01L21/00
    • G02B27/2214G02F1/153Y10T29/413
    • A parallax barrier device includes: a first substrate; a first patterned transparent electrode layer disposed on the first substrate; a first patterned electrochromic material layer disposed on the first patterned transparent electrode layer and including a plurality of electrochromic structures, in which lengths, widths or diameters of the electrochromic structures are 50 nm to 500 nm, and included angles of the electrochromic structures and a surface of the first substrate to be deposited are 30° to 89°; a second substrate; a second patterned transparent electrode layer disposed on the second substrate; a second patterned electrochromic material layer disposed on the second patterned transparent electrode layer; and an electrolyte disposed between the first patterned electrochromic material layer and the second patterned electrochromic material layer.
    • 视差屏障装置包括:第一基板; 设置在第一基板上的第一图案化透明电极层; 设置在第一图案化透明电极层上并包括多个电致变色结构的第一图案化电致变色材料层,其中电致变色结构的长度,宽度或直径为50nm至500nm,并且电致变色结构和表面的夹角 的第一衬底的厚度为30°至89°; 第二基板; 设置在所述第二基板上的第二图案化透明电极层; 设置在第二图案化透明电极层上的第二图案化电致变色材料层; 以及设置在第一图案化电致变色材料层和第二图案化电致变色材料层之间的电解质。