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1. 发明授权

US4774151A Low contact electrical resistant composition, substrates coated therewith, and process for preparing such 失效
标题翻译：低接触电阻组合物，涂覆的基材，及其制备方法
公开(公告)号：US4774151A
公开(公告)日：1988-09-27
申请号：US866554
申请日：1986-05-23
申请人： Jerome J. Cuomo , Eric P. Dibble , Solomon L. Levine
发明人： Jerome J. Cuomo , Eric P. Dibble , Solomon L. Levine
IPC分类号： H01B1/06 , C23C14/06 , C23C14/34 , H01H1/023 , H01H11/04 , B32B9/00 , C23C14/00
CPC分类号： C23C14/3414 , C23C14/0688 , H01H1/023 , Y10T428/261
摘要： A composition of a metallic compound represented by the formula MT, and G is provided by sputtering an M.sub.x G.sub.100-x target. M is a metal selected from the group of titanium, hafnium, zirconium, and mixtures thereof. T is selected from the group of N, C, and mixtures thereof. G is a metal selected from the group of gold, platinum, and palladium. X is an integer from about 65 to about 95. Also provided are substrates coated with the composition and process for depositing the composition on substrates.

2. 发明授权

US4849079A Process for preparing low electrical contact resistance composition 失效
标题翻译：制备低电接触电阻组合物的方法
公开(公告)号：US4849079A
公开(公告)日：1989-07-18
申请号：US186403
申请日：1988-04-26
申请人： Jerome J. Cuomo , Eric P. Dibble , Solomon L. Levine
发明人： Jerome J. Cuomo , Eric P. Dibble , Solomon L. Levine
IPC分类号： C23C14/06 , C23C14/34 , H01H1/023
CPC分类号： H01H1/023 , C23C14/0688 , C23C14/3414
摘要： A composition of a metallic compound represented by the formula MT, and G is provided by sputtering an M.sub.x G.sub.100-x target. M is a metal selected from the group of titanium, hafnium, zirconium, and mixtures thereof. T is selected from the group of N, C, and mixtures thereof. G is a metal selected from the group of gold, platinum, and palladium. X is an integer from about 65 to about 95. Also provided are substances coated with the composition and process for depositing the composition on substrates.
摘要翻译：通过溅射MxG100-x靶来提供由式MT表示的金属化合物的组成和G。 M是选自钛，铪，锆及其混合物的金属。 T选自N，C及其混合物。 G是选自金，铂和钯的金属。 X是约65至约95的整数。还提供了涂覆有组合物的物质和用于将组合物沉积在基底上的方法。

3. 发明授权

US4725339A Method for monitoring metal ion concentrations in plating baths 失效
标题翻译：监测电镀液中金属离子浓度的方法
公开(公告)号：US4725339A
公开(公告)日：1988-02-16
申请号：US579733
申请日：1984-02-13
申请人： Perminder Bindra , Solomon L. Levine , David N. Light
发明人： Perminder Bindra , Solomon L. Levine , David N. Light
IPC分类号： C25D21/14 , G01N27/48 , G01N27/49
CPC分类号： G01N27/48 , G01N27/49
摘要： A rotating disk electrode system operates at constant speed in a solution whose metal ion concentration is held constant at multiple concentrations within a range of concentration. The current at the working electrode is recorded, while the potential at the working electrode is swept at a predetermined rate for each of the concentration values. The diffusion limiting current is determined for each of the concentration values. Then the rotating disk electrode system is operated continuously in a metal plating bath whose metal ion concentration can vary. A voltage applied to the working electrode produces a current at the electrode whose magnitude is compared to the values of the previous calibration to determine the current metal ion concentration. Alternatively, a rotating disk electrode system is operated over a range of speeds in a solution whose ion concentration is held constant over a range of concentration. Current at the working electrode is measured for a given electric potential applied to the working electrode. In this way, a calibration relationship between the current at the electrode and the range of metal ion concentrations is established which can be used with current measured in the plating bath under the same conditions as those that established the calibration curve to predict the concentration of the bath.
摘要翻译：旋转盘电极系统在浓度范围内以多种浓度保持金属离子浓度的溶液中，以恒定速度运转。记录工作电极处的电流，同时以每个浓度值以预定的速率扫描工作电极处的电位。确定每个浓度值的扩散限制电流。然后旋转盘电极系统在其金属离子浓度可以变化的金属电镀浴中连续操作。施加到工作电极的电压在电极处产生电流，其电流与先前校正值相比较，以确定当前的金属离子浓度。或者，旋转盘电极系统在离子浓度在浓度范围内保持恒定的溶液中的速度范围内操作。对施加到工作电极的给定电位测量工作电极处的电流。以这种方式，建立了电极电流与金属离子浓度范围之间的校准关系，可以在与建立校正曲线的条件相同的条件下在电镀液中测量的电流使用，以预测电极的浓度浴。

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