会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • Horizontal electric field switching liquid crystal display device and fabricating method thereof
    • 水平电场切换液晶显示装置及其制造方法
    • US20060290864A1
    • 2006-12-28
    • US11451484
    • 2006-06-13
    • Jae OhSung Hong
    • Jae OhSung Hong
    • G02F1/1343
    • G02F1/134363G02F1/136213G02F2001/136295G02F2201/124
    • A horizontal electric field switching liquid crystal display device includes a gate line, a common line parallel to the gate line and provided at an area adjacent to the gate line, a data line crossing the gate line with a gate insulating film therebetween to define a pixel area, a thin film transistor provided adjacent to a crossing of the gate line and the data line, a common electrode provided in the pixel area and connected to the common line, a pixel electrode connected to the thin film transistor and provided in such a manner to form a horizontal electric field along with the common electrode in the pixel area on the same plane as the common electrode, a storage capacitor electrode overlapping the common electrode to provide a storage capacitor, and a contact electrode contacting the pixel electrode, the thin film transistor and the storage electrode at their side surfaces.
    • 水平电场切换液晶显示装置包括栅极线,与栅极线平行并且设置在与栅极线相邻的区域的公共线,与栅极线交叉的数据线,其间具有栅极绝缘膜,以限定像素 设置在栅极线和数据线的交叉点附近的薄膜晶体管,设置在像素区域中并连接到公共线的公共电极,连接到薄膜晶体管的像素电极,以这样的方式 在与公共电极相同的平面上的像素区域中与公共电极一起形成水平电场,存储电容器电极与公共电极重叠以提供存储电容器,以及与像素电极接触的接触电极,薄膜 晶体管和存储电极在它们的侧表面。
    • 4. 发明申请
    • Method for forming pattern and method for fabricating LCD device using the same
    • 用于形成图案的方法和使用其制造LCD装置的方法
    • US20070148603A1
    • 2007-06-28
    • US11640985
    • 2006-12-19
    • Hye LeeJae Oh
    • Hye LeeJae Oh
    • G03F7/26
    • G03F7/0007G02F1/133512G02F1/133516G03F7/11G03F7/42
    • A method for forming a pattern and a method for fabricating an LCD device using the same is disclosed, wherein a photoresist layer is removed from a substrate without using a photoresist stripper, so that the pattern is formed with a low fabrication costs. The method comprising sequentially forming a pattern material layer, a transformed material layer and a photoresist layer on a substrate; patterning the photoresist layer by exposure and development using a mask; selectively etching the transformed material layer and the pattern material layer by using the patterned photoresist layer as a mask; and removing the transformed material layer and the patterned photoresist layer in a lift-off method by applying light.
    • 公开了一种用于形成图案的方法和使用该图案的LCD器件的制造方法,其中在不使用光致抗蚀剂剥离器的情况下从衬底去除光致抗蚀剂层,从而以低制造成本形成图案。 该方法包括在衬底上依次形成图案材料层,变形材料层和光致抗蚀剂层; 通过使用掩模的曝光和显影来图案化光致抗蚀剂层; 通过使用图案化的光致抗蚀剂层作为掩模来选择性地蚀刻变形材料层和图案材料层; 以及通过施加光而以剥离方法去除转化的材料层和图案化的光致抗蚀剂层。