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    • 6. 发明授权
    • Integrateable capacitors and microcoils and methods of making thereof
    • 可集成电容器和微型线圈及其制造方法
    • US07517769B2
    • 2009-04-14
    • US11319075
    • 2005-12-28
    • Koenraad Van SchuylenberghEugene M. ChowJengPing Lu
    • Koenraad Van SchuylenberghEugene M. ChowJengPing Lu
    • H01L21/20
    • H01G5/18H01F17/0006H01F17/02H01F21/04H01F27/40H01F41/041H01L28/10H01L28/40
    • Methods for integrally forming high Q tunable capacitors and high Q inductors on a substrate are described. A method for integrally forming a capacitor and a microcoil on a substrate may involve depositing and patterning a dielectric layer on the substrate, depositing and patterning a sacrificial layer on the substrate, depositing and patterning conductive material on the semiconductor substrate, depositing and patterning a polymer layer on the semiconductor substrate, removing an exposed portion of the conductive material exposed by the patterned polymer layer to release a portion of the conductive pattern from the semiconductor substrate to form out-of-plane windings of the microcoil, depositing second conductive material on exposed portions of the conductive material, and removing the sacrificial layer. The patterned conductive material may include a windings portion of the microcoil, an overlapping electrode portion of the capacitor and a support portion for the electrode of the capacitor.
    • 描述了在衬底上整体形成高Q可调谐电容器和高Q电感器的方法。 用于在基板上一体地形成电容器和微线圈的方法可以包括在基板上沉积和图案化电介质层,在衬底上沉积和图案化牺牲层,在半导体衬底上沉积和图案化导电材料,沉积和图案化聚合物 去除由所述图案化聚合物层暴露的所述导电材料的暴露部分,以从所述半导体衬底释放所述导电图案的一部分,以形成所述微线圈的面外绕组,将第二导电材料沉积在暴露的 部分导电材料,并去除牺牲层。 图案化导电材料可以包括微线圈的绕组部分,电容器的重叠电极部分和用于电容器电极的支撑部分。