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    • 2. 发明授权
    • Thin film slider with protruding R/W element formed by
chemical-mechanical polishing
    • 通过化学机械抛光形成的具有突出R / W元件的薄膜滑块
    • US5617273A
    • 1997-04-01
    • US481574
    • 1995-06-07
    • Jeffrey W. CarrJeffrey P. Gunder
    • Jeffrey W. CarrJeffrey P. Gunder
    • G11B5/10G11B5/255G11B5/31G11B5/39G11B5/60G11B21/21G11B5/127G11B5/33G11B17/32
    • G11B5/6005G11B5/102G11B5/255G11B5/3103G11B5/3106G11B5/3903G11B5/3163Y10T29/49041Y10T29/49046Y10T29/49048
    • A composite thin film slider with a protruding R/W device formed by chemical-mechanical polishing to protrude above its substrate and thereby reduce the distance between the R/W device and the recording media. The slider includes a ceramic or non-ceramic substrate with a substantially planar bearing surface, and a R/W device. The R/W device includes an insulator and certain conductive R/W components, deposited onto the substrate's deposit end. The R/W components may include, for example, a magnetic shield layer, a MR stripe layer, and a magnetic pole tip layer, all layered over the deposit end of the substrate. The R/W components protrude from the insulator sufficiently to extend past the substrate's bearing surface. To manufacture this slider, a substrate with the R/W device deposited thereon is polished with a lapping slurry to disproportionately erode the substrate and insulator with respect to the R/W components. The R/W components therefore protrude from the insulator and the ceramic substrate's bearing surface.
    • 一种复合薄膜滑块,其具有通过化学机械抛光形成的突出的R / W装置,以在其基板上突出,从而减小R / W装置与记录介质之间的距离。 滑块包括具有基本上平面的支承表面的陶瓷或非陶瓷基板以及R / W装置。 R / W器件包括沉积在衬底沉积端上的绝缘体和某些导电R / W元件。 R / W组件可以包括例如磁性屏蔽层,MR条纹层和磁极尖端层,全部层叠在衬底的沉积端上。 R / W组件从绝缘体充分突出以延伸穿过基板的支承表面。 为了制造该滑块,用研磨浆料抛光其上沉积有R / W器件的衬底,以相对于R / W部件不正常地侵蚀衬底和绝缘体。 因此,R / W部件从绝缘体和陶瓷基板的支承表面突出。