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1. 发明授权

US5389496A Processes and compositions for electroless metallization 失效
标题翻译：无电镀金属化的工艺和组成
公开(公告)号：US5389496A
公开(公告)日：1995-02-14
申请号：US62706
申请日：1993-05-17
申请人： Jeffrey M. Calvert , Walter J. Dressick , Gary S. Calabrese , Michael Gulla
发明人： Jeffrey M. Calvert , Walter J. Dressick , Gary S. Calabrese , Michael Gulla
IPC分类号： B05D1/18 , C09D4/00 , C12N5/00 , C23C18/16 , C23C18/20 , C23C18/28 , C40B60/14 , G03F7/004 , G06N3/00 , G06N99/00 , H01L21/288 , H05K3/18 , G03C5/00
CPC分类号： G06N99/007 , B05D1/185 , B82Y10/00 , B82Y30/00 , B82Y40/00 , B82Y5/00 , C09D4/00 , C12N5/0068 , C23C18/1603 , C23C18/1608 , C23C18/1612 , C23C18/1893 , C23C18/2086 , C23C18/28 , C23C18/30 , C23C18/31 , G03F7/004 , G06N3/002 , H01L21/288 , H01L21/2885 , H05K3/185 , B01J2219/00432 , B01J2219/00603 , B01J2219/00605 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00711 , C12N2535/10 , C40B60/14 , Y10T428/24917 , Y10T428/31536
摘要： Methods and compositions for electroless metallization. In one aspect, the invention is characterized by the use of chemical groups capable of ligating with an electroless metallization catalyst, including use of ligating groups that are chemically bound to the substrate. In a preferred aspect, the invention provides a means for selective metallization without the use of a conventional photoresist patterning sequence, enabling fabrication of high resolution metal patterns in a direct and convenient manner.
摘要翻译：无电镀金属化的方法和组成。在一个方面，本发明的特征在于使用能够与无电金属化催化剂连接的化学基团，包括使用化学结合到基底上的连接基团。在优选的方面，本发明提供了一种用于选择性金属化而不使用常规光致抗蚀剂图案化顺序的装置，使得能够以直接且方便的方式制造高分辨率金属图案。

2. 发明授权

US5500315A Processes and compositions for electroless metallization 失效
公开(公告)号：US5500315A
公开(公告)日：1996-03-19
申请号：US317347
申请日：1994-10-04
申请人： Jeffrey M. Calvert , Walter J. Dressick , Gary S. Calabrese , Michael Gulla
发明人： Jeffrey M. Calvert , Walter J. Dressick , Gary S. Calabrese , Michael Gulla
IPC分类号： B05D1/18 , C09D4/00 , C12N5/00 , C23C18/16 , C23C18/20 , C23C18/28 , C40B60/14 , G03F7/004 , G06N3/00 , G06N99/00 , H01L21/288 , H05K3/18 , G03C5/58 , G03F7/038
CPC分类号： G06N99/007 , B05D1/185 , B82Y10/00 , B82Y30/00 , B82Y40/00 , B82Y5/00 , C09D4/00 , C12N5/0068 , C23C18/1603 , C23C18/1608 , C23C18/1612 , C23C18/1893 , C23C18/2086 , C23C18/28 , C23C18/30 , C23C18/31 , G03F7/004 , G06N3/002 , H01L21/288 , H01L21/2885 , H05K3/185 , B01J2219/00432 , B01J2219/00603 , B01J2219/00605 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00711 , C12N2535/10 , C40B60/14 , Y10T428/24917 , Y10T428/31536
摘要： Methods and compositions for electroless metallization. In one aspect, the invention is characterized by the use of chemical groups capable of ligating with an electroless metallization catalyst, including use of ligating groups that are chemically bound to the substrate. In a preferred aspect, the invention provides a means for selective metallization without the use of a conventional photoresist patterning sequence, enabling fabrication of high resolution metal patterns in a direct and convenient manner.

3. 发明授权

US5203911A Controlled electroless plating 失效
标题翻译：控制电镀
公开(公告)号：US5203911A
公开(公告)日：1993-04-20
申请号：US719979
申请日：1991-06-24
申请人： Prasit Sricharoenchaikit , Gary S. Calabrese , Michael Gulla
发明人： Prasit Sricharoenchaikit , Gary S. Calabrese , Michael Gulla
IPC分类号： C23C18/20 , C23C18/31 , C23C18/34 , C23C18/52 , H05K3/18
CPC分类号： C23C18/52
摘要： A composition for electrolessly depositing thin metal coatings in selective patterns of fine dimension. The electroless plating solutions of the invention are characterized by a low metal content and preferably, freedom from alkali or alkaline earth metal ions.

4. 发明授权

US5053318A Plasma processing with metal mask integration 失效
标题翻译：具有金属掩模积分的等离子体处理
公开(公告)号：US5053318A
公开(公告)日：1991-10-01
申请号：US353770
申请日：1989-05-18
申请人： Michael Gulla , Prasit Sricharoenchaikit
发明人： Michael Gulla , Prasit Sricharoenchaikit
IPC分类号： G03F1/08 , C23C18/20 , C23C18/30 , C23F1/00 , C23F4/00 , G03F7/26 , G03F7/40 , H01L21/027 , H05K3/18
CPC分类号： H05K3/185 , G03F7/265 , G03F7/40
摘要： This invention describes methods for altering a substrate in a fine line image pattern using a microlithographic process including formation of a metal mask over a photoresist coating to protect the photoresist coating during dry development of the same. The invention also describes a method for formation of the metal mask. Briefly stated, the process of the invention comprises the steps of coating a substrate with a photoresist coating, exposing the photoresist coating so formed to a desired pattern of actinic radiation, catalyzing the entire surface of the photoresist coating with an electroless plating catalyst, developing the photoresist layer to a depth at least sufficient to remove the undesired catalyst layer in an image pattern, forming a metal pattern on the desired (remaining) catalyst layer and dry developing the remaining photoresist coating unprotected by the metal mask.

5. 发明授权

US4869970A Radiation attenuation shielding 失效
标题翻译：辐射衰减屏蔽
公开(公告)号：US4869970A
公开(公告)日：1989-09-26
申请号：US118439
申请日：1987-11-09
申请人： Michael Gulla , Terrell A. Benjamin , Mark Farsi
发明人： Michael Gulla , Terrell A. Benjamin , Mark Farsi
IPC分类号： C23C18/50 , H05K1/02 , H05K3/24
CPC分类号： H05K3/244 , C23C18/50 , H05K1/0218 , Y10T428/12535 , Y10T428/1291 , Y10T428/12931 , Y10T428/12944
摘要： An electromagnetic radiation attenuating coating comprising an electronic housing base material coating with a first electroless metal alloy of copper, a member from the group of nickel, cobalt and mixtures of nickel and cobalt, and phosphorus rich in copper and a second electroless metal alloy of copper, a member from the group of nickel, cobalt and mixtures of nickel land cobalt, and phosphorus rich in nickel. The coating provides superior radiation attenuation and comprises fewer processing steps in its formation.
摘要翻译：一种电磁辐射衰减涂层，其包括电子壳体基材涂层，其具有铜，来自镍，钴和镍和钴的混合物的第一无电金属合金和富含铜的磷以及铜的第二无电金属合金，来自镍，钴和镍土钴的混合物以及富含镍的磷的成员。涂层提供优异的辐射衰减，并且在其形成中包括更少的加工步骤。

6. 发明授权

US4565575A Apparatus and method for automatically maintaining an electroless plating bath 失效
标题翻译：用于自动维持化学镀浴的装置和方法
公开(公告)号：US4565575A
公开(公告)日：1986-01-21
申请号：US667738
申请日：1984-11-02
申请人： William J. Cardin , Michael Gulla , Charles L. Newton
发明人： William J. Cardin , Michael Gulla , Charles L. Newton
IPC分类号： C23C18/16 , C23C18/31 , C23C18/36 , C23C18/40
CPC分类号： C23C18/1683 , C23C18/1617 , C23C18/36 , C23C18/405
摘要： A controller for measuring the concentration of consumable ingredients in a plating solution characterized by the use of a plating poison introduced into the analysate stream to prevent autocatalytic decomposition and deposition of copper onto the walls and sensors of the controller.
摘要翻译：一种用于测量电镀溶液中易消耗成分的浓度的控制器，其特征在于使用引入分析物流中的电镀毒物以防止铜自动分解和沉积到控制器的壁和传感器上。

7. 发明授权

US4324589A Solute monitoring process 失效
标题翻译：溶质监测过程
公开(公告)号：US4324589A
公开(公告)日：1982-04-13
申请号：US116579
申请日：1980-01-29
申请人： Michael Gulla , Barry J. Hartnett
发明人： Michael Gulla , Barry J. Hartnett
IPC分类号： C23C18/16 , G01N21/78 , H05K1/02 , H05K3/18 , C23C3/02
CPC分类号： C23C18/1683 , C23C18/38 , G01N21/78 , H05K1/0266 , H05K3/187
摘要： This invention relates to monitoring the concentration of a component dissolved in solution where the component imparts a perceptible color to the solution and varies in concentration with use of the solution.
摘要翻译：本发明涉及监测溶解在溶液中的组分的浓度，其中组分向溶液赋予可察觉的颜色，并且使用溶液的浓度变化。

8. 发明授权

US4674440A Apparatus for automatically replenishing an electroless plating bath 失效
标题翻译：用于自动补充化学镀浴的装置
公开(公告)号：US4674440A
公开(公告)日：1987-06-23
申请号：US748968
申请日：1985-06-26
申请人： William J. Cardin , Michael Gulla , Charles L. Newton
发明人： William J. Cardin , Michael Gulla , Charles L. Newton
IPC分类号： C23C18/16 , B05C11/10
CPC分类号： C23C18/1617 , C23C18/1683
摘要： An apparatus for maintaining the consumable components of an electroless plating solution at predetermined concentration in a plating tank containing the plating solution while workpieces are being processed in the tank. The apparatus measures the concentrations of the consumable components in a sample stream of the electroless plating solution and based on these measurements, meters the required amounts of the components into the plating solution. A portion of the apparatus provides for the introduction of plating solution poison into the sample stream to prevent autocatalytic decomposition and deposition of the plating metal, e.g., copper, onto to the walls and sensors of the apparatus.
摘要翻译：一种用于在罐内处理工件时，将包含电镀溶液的镀槽中的预定浓度的化学镀溶液的消耗部件维持的装置。该装置测量化学镀溶液的样品流中的可消耗部件的浓度，并且基于这些测量，将所需量的组分计量到电镀溶液中。该装置的一部分提供了将电解液毒物引入样品流中以防止电镀金属（例如铜）自动催化分解和沉积到装置的壁和传感器上。

9. 发明授权

US4482596A Electroless alloy plating 失效
标题翻译：无电镀合金
公开(公告)号：US4482596A
公开(公告)日：1984-11-13
申请号：US411346
申请日：1982-08-25
申请人： Michael Gulla , Oleh B. Dutkewych
发明人： Michael Gulla , Oleh B. Dutkewych
IPC分类号： C22C9/00 , C23C18/36 , C23C18/40 , C23C18/48 , H05K3/18 , H05K3/24 , H05K3/46 , B32B3/10 , B32B15/04
CPC分类号： H05K3/181 , C23C18/48 , Y10S428/901 , Y10T428/24273 , Y10T428/31507 , Y10T428/31529 , Y10T428/31533 , Y10T428/31678 , Y10T428/31681 , Y10T428/31692 , Y10T428/31703 , Y10T428/31707
摘要： A structure having a catalytic surface plated with an autocatalytic electroless alloy of copper, a metal selected from nickel, cobalt, mixtures thereof and phosphorous.
摘要翻译：具有镀有铜的自催化无电解合金的催化表面的结构，选自镍，钴，其混合物和磷的金属。

10. 发明授权

US4229218A Self-monitoring electroless plating solution 失效
标题翻译：自我监测化学镀溶液
公开(公告)号：US4229218A
公开(公告)日：1980-10-21
申请号：US9542
申请日：1979-02-05
申请人： Michael Gulla , Barry J. Hartnett
发明人： Michael Gulla , Barry J. Hartnett
IPC分类号： C23C18/16 , C23C18/31 , C23C18/34 , C23C18/40 , G01N21/78 , H05K1/02 , H05K3/18 , C23C3/02
CPC分类号： G01N21/78 , H05K1/0266 , H05K3/187
摘要： This invention relates to monitoring the concentration of a component dissolved in solution where the component imparts a perceptible color to the solution and varies in concentration with use of the solution.The invention is based upon use of a colorant of a fixed optical density that absorbs light in a different region of the visible spectrum than the monitored component. As the monitored component varies in concentration with use of the solution, the optical density of that component in solution varies as a function of its concentration and consequently, the amount of light, i.e., the intensity of light, passing through the solution will also vary as a function of concentration. Since the optical density of the colorant remains fixed during use, the optical density of the monitored component changes relative to the optical density of the colorant during use of the solution. Because the monitored component and colorant absorb light in different regions of the visible spectrum and their optical densities change relative to each other, there results a perceptible color change as a function of concentration that may be seen visually or measured by instrumentation.
摘要翻译：本发明涉及监测溶解在溶液中的组分的浓度，其中组分向溶液赋予可察觉的颜色，并且使用溶液的浓度变化。本发明基于使用固定光密度的着色剂，该着色剂吸收可见光谱的不同区域中的光，而不是所监测的组分。当被监测的组分随着溶液的浓度变化时，溶液中该组分的光密度随着其浓度的变化而变化，因此，通过溶液的光的量，即光的强度也将变化作为浓度的函数。由于着色剂的光学密度在使用期间保持固定，所以在使用溶液时，所监测的组分的光密度相对于着色剂的光密度而变化。因为被监测的组分和着色剂吸收可见光谱的不同区域的光，并且它们的光学密度相对于彼此变化，所以会产生视觉上可视或通过仪器测量的可见的浓度变化的颜色变化。

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