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1. 发明申请

US20070151072A1 Vacuum cleaner 有权
标题翻译：吸尘器
公开(公告)号：US20070151072A1
公开(公告)日：2007-07-05
申请号：US11475965
申请日：2006-06-28
申请人： Jea Lee , Jae Joo , Jun Lee , Tae Yoon , Seung Hong
发明人： Jea Lee , Jae Joo , Jun Lee , Tae Yoon , Seung Hong
IPC分类号： A47L9/16
CPC分类号： F04D29/665 , A47L9/0081 , A47L9/22
摘要： A vacuum cleaner having a discharge flow path, which reduces noise generated due to resistance of the flow path, and by a motor. The vacuum cleaner includes a body, a blower fan unit including a blower fan and a motor to generate suction force in the body, an inner case surrounding the blower fan unit and having an inner flow path formed therein, an outer case surrounding the inner case, and a discharge flow path formed between the inner case and the outer case to communicate with the inner flow path. The discharge flow path including a circulation flow path branched from the inner flow path to guide air discharged from the blower fan unit, and a bent flow path branched from the inner flow path to guide the air discharged from the blower fan unit, the air is thereby bent a number of times in the bent flow path.
摘要翻译：具有排气流路的真空吸尘器，其减小由于流动路径的阻力而产生的噪音，以及电动机。真空吸尘器包括主体，鼓风扇单元，其包括鼓风机风扇和电动机，以在主体中产生吸力;围绕鼓风机单元并具有形成在其中的内部流路的内壳;围绕内壳的外壳以及形成在内壳体和外壳体之间以与内部流路连通的排出流路。所述排出流路包括从所述内部流路向从所述鼓风机单元排出的引导空气分支的循环流路，以及从所述内部流路分支以引导从所述鼓风机单元排出的空气的弯曲流路，从而在弯曲流动路径中弯曲多次。

2. 发明申请

US20060084280A1 Method of forming a carbon polymer film using plasma CVD 有权
标题翻译：使用等离子体CVD形成碳聚合物膜的方法
公开(公告)号：US20060084280A1
公开(公告)日：2006-04-20
申请号：US11172031
申请日：2005-06-30
申请人： Nobuo Matsuki , Yoshinori Morisada , Seijiro Umemoto , Jea Lee
发明人： Nobuo Matsuki , Yoshinori Morisada , Seijiro Umemoto , Jea Lee
IPC分类号： H01L21/31
CPC分类号： H01L21/0332 , B05D1/62 , G03F7/167 , H01L21/02118 , H01L21/02274 , H01L21/3127 , H01L21/3146
摘要： A method of forming a hydrocarbon-containing polymer film on a semiconductor substrate by a capacitively-coupled plasma CVD apparatus. The method includes the steps of: vaporizing a hydrocarbon-containing liquid monomer (CαHβXγ, wherein α and β are natural numbers of 5 or more; γ is an integer including zero; X is O, N or F) having a boiling point of about 20° C. to about 350° C. which is not substituted by a vinyl group or an acetylene group; introducing the vaporized gas into a CVD reaction chamber inside which a substrate is placed; and forming a hydrocarbon-containing polymer film on the substrate by plasma polymerization of the gas.
摘要翻译：通过电容耦合等离子体CVD装置在半导体衬底上形成含烃聚合物膜的方法。该方法包括以下步骤：蒸发含烃液体单体（其中α和β为自然数） 5或更大;γ是包括零的整数; X是O，N或F），其沸点为约20℃至约350℃，其未被乙烯基或乙炔基取代; 将蒸发的气体引入其中放置基板的CVD反应室中; 并通过气体的等离子体聚合在基板上形成含烃聚合物膜。

3. 发明申请

US20070218705A1 Method of forming a carbon polymer film using plasma CVD 有权
标题翻译：使用等离子体CVD形成碳聚合物膜的方法
公开(公告)号：US20070218705A1
公开(公告)日：2007-09-20
申请号：US11524037
申请日：2006-09-20
申请人： Nobuo Matsuki , Yoshinori Morisada , Seijiro Umemoto , Jea Lee
发明人： Nobuo Matsuki , Yoshinori Morisada , Seijiro Umemoto , Jea Lee
IPC分类号： H01L21/31
CPC分类号： H01L21/02118 , B05D1/62 , G03F7/167 , H01L21/02274 , H01L21/0332 , H01L21/3127 , H01L21/3146
摘要： A method forms a hydrocarbon-containing polymer film on a semiconductor substrate by a capacitively-coupled plasma CVD apparatus. The method includes the steps of: vaporizing a hydrocarbon-containing liquid monomer (CαHβXγ, wherein α and β are natural numbers of 5 or more; γ is an integer including zero; X is O, N or F) having a boiling point of about 20° C. to about 350° C.; introducing the vaporized gas into a CVD reaction chamber inside which a substrate is placed; and forming a hydrocarbon-containing polymer film on the substrate by plasma polymerization of the gas.
摘要翻译：一种方法通过电容耦合等离子体CVD装置在半导体衬底上形成含烃聚合物膜。该方法包括以下步骤：蒸发含烃液体单体（其中α和β为自然数） 5或更大;γ是包括零的整数; X是O，N或F），其沸点为约20℃至约350℃; 将蒸发的气体引入其中放置基板的CVD反应室中; 并通过气体的等离子体聚合在基板上形成含烃聚合物膜。

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