专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20150230988A1 ELECTRONIC EYEWEAR THERAPY 审中-公开
标题翻译：电子眼镜治疗
公开(公告)号：US20150230988A1
公开(公告)日：2015-08-20
申请号：US14703875
申请日：2015-05-04
申请人： David Chao , Zhiyang Guo , Jason Sweis , Vivian Liane Rice , Grace C. Sheen , Eric S. Hussey
发明人： David Chao , Zhiyang Guo , Jason Sweis , Vivian Liane Rice , Grace C. Sheen , Eric S. Hussey
IPC分类号： A61F9/04 , G02F1/13 , G02F1/133 , G02C7/16
CPC分类号： A61F9/045 , A61H5/005 , A61H2201/165 , A61H2201/501 , A61H2201/5015 , A61H2201/5028 , A61H2201/5035 , A61H2201/5038 , A61H2201/5043 , A61H2201/5058 , A61H2201/5066 , A61H2201/5082 , A61H2201/5097 , G02C5/2227 , G02C7/101 , G02C7/104 , G02C7/16 , G02C11/10 , G02C2200/22 , G02C2200/26 , G02C2200/28 , G02F1/1313 , G02F1/13306 , G06F19/3481
摘要： Embodiments for systems, methods and apparatuses of eyewear are disclosed. One method includes treating a patient with shutter glasses therapy for a relatively short period of time, such as at least a 6 week period; wherein the shutter glasses therapy includes blanking a first lens of shutter glasses being worn by the patient for a first blocking time, blanking a second lens of the shutter glasses being worn by the patient for a second blocking time, and controllably setting at least one of the first blocking time and the second blocking time.
摘要翻译：公开了眼镜的系统，方法和装置的实施例。一种方法包括用相对较短的时间段（例如至少6周）治疗具有快门眼镜治疗的患者; 其中所述快门眼镜治疗包括对由患者佩戴的快门眼镜的第一透镜进行消隐以阻止第一阻挡时间，消除由患者佩戴的快门眼镜的第二透镜以达到第二阻塞时间，并且可控地设置以下步骤中的至少一个：第一个阻塞时间和第二个阻塞时间。

2. 发明申请

US20140132913A1 SHUTTER EYEWEAR 有权
标题翻译：快门眼镜
公开(公告)号：US20140132913A1
公开(公告)日：2014-05-15
申请号：US14072784
申请日：2013-11-05
申请人： Jason Sweis , Vivian Liane Rice , David Chao , Zhiyang Guo
发明人： Jason Sweis , Vivian Liane Rice , David Chao , Zhiyang Guo
IPC分类号： G02C7/16 , G02C11/00
CPC分类号： A61H5/00 , A61H2205/024 , G02C7/08 , G02C7/101 , G02C11/10
摘要： Apparatuses and methods of shuttering glasses are disclosed. One apparatus includes a first lens operable to blank for a first blocking time, a second lens operable to blank for a second blocking time, and a controller for controllably setting at least one of the first blocking time and the second blocking time.
摘要翻译：公开了一种用于制作眼镜的装置和方法。一种装置包括可操作以消除第一阻塞时间的第一透镜，可操作以空白第二阻断时间的第二透镜，以及用于可控地设置第一阻塞时间和第二阻塞时间中的至少一个的控制器。

3. 发明申请

US20130072828A1 SHUTTER GLASSES 审中-公开
标题翻译：快门玻璃
公开(公告)号：US20130072828A1
公开(公告)日：2013-03-21
申请号：US13615447
申请日：2012-09-13
申请人： Jason Sweis , Vivian Liane Rice , David Chao , Zhiyang Guo
发明人： Jason Sweis , Vivian Liane Rice , David Chao , Zhiyang Guo
IPC分类号： A61H5/00
CPC分类号： G02C7/101 , A61H5/005 , A61H2201/165 , A61H2201/5002 , A61H2201/5015 , A61H2201/5028 , A61H2201/5038 , A61H2201/5097 , G02C7/16 , G06F19/3481
摘要： Apparatuses and methods of shuttering glasses are disclosed. One apparatus includes a first lens operable to blank for a first blocking time, a second lens operable to blank for a second blocking time, and a controller for controllably setting at least one of the first blocking time and the second blocking time.
摘要翻译：公开了一种用于制作眼镜的装置和方法。一种装置包括可操作以消除第一阻塞时间的第一透镜，可操作以空白第二阻断时间的第二透镜，以及用于可控地设置第一阻塞时间和第二阻塞时间中的至少一个的控制器。

4. 发明授权

US08429572B2 Method and system for implementing controlled breaks between features using sub-resolution assist features 有权
公开(公告)号：US08429572B2
公开(公告)日：2013-04-23
申请号：US13335196
申请日：2011-12-22
申请人： Jason Sweis
发明人： Jason Sweis
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/70
摘要： Disclosed is a method, system, and computer program product for implementing controlled breaks using sub-resolution assist features. Sub-resolution bridging features are added to implement controlled breaks between features on the layout. The bridging features may also be used to facilitate or optimize multiple mask/exposure techniques that split a layout or features on a layout to address pitch problems.

5. 发明申请

US20120096414A1 METHOD AND SYSTEM FOR IMPLEMENTING CONTROLLED BREAKS BETWEEN FEATURES USING SUB-RESOLUTION ASSIST FEATURES 有权
标题翻译：使用分解辅助功能实现特征之间的控制断裂的方法和系统
公开(公告)号：US20120096414A1
公开(公告)日：2012-04-19
申请号：US13335785
申请日：2011-12-22
申请人： Jason Sweis
发明人： Jason Sweis
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/70
摘要： Disclosed is a method, system, and computer program product for implementing controlled breaks using sub-resolution assist features. Sub-resolution bridging features are added to implement controlled breaks between features on the layout. The bridging features may also be used to facilitate or optimize multiple mask/exposure techniques that split a layout or features on a layout to address pitch problems.
摘要翻译：公开了一种使用子分辨率辅助特征来实现受控断点的方法，系统和计算机程序产品。添加子分辨率桥接功能以实现布局上的功能之间的受控中断。桥接特征还可以用于促进或优化在布局上分割布局或特征以解决间距问题的多个掩模/曝光技术。

6. 发明授权

US08997026B1 System and method for self alignment of pad mask 有权
标题翻译：垫面罩自身对准的系统和方法
公开(公告)号：US08997026B1
公开(公告)日：2015-03-31
申请号：US13470080
申请日：2012-05-11
申请人： Jason Sweis
发明人： Jason Sweis
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G03F1/70
摘要： A system and method provide semiconductor fabrication mask creation techniques that align the device features patterned with a first core mask with one or more pad features patterned with a subsequent pad mask. Shapes representing the pad features may be included in the core mask by reducing on all sides, the shape of the pad feature in the core mask by the width of the spacer material. A pad mask then may be created to include a shape of the pad feature that may overlap a portion of the spacer material pattern created by the shape of the pad feature in the core mask. Data sets may be generated from a circuit design to create the masks that may be fabricated with the described techniques.
摘要翻译：系统和方法提供半导体制造掩模创建技术，其将图案化的设备特征与第一核心掩模对准，其中一个或多个衬垫特征与随后的衬垫掩模图案化。代表焊盘特征的形状可以通过减少所有侧面，将芯掩模中的焊盘特征的形状减小到间隔物材料的宽度来包括在芯掩模中。然后可以创建焊盘掩模以包括可以与由芯掩模中的焊盘特征的形状产生的间隔材料图案的一部分重叠的焊盘特征的形状。可以从电路设计产生数据集以创建可以用所述技术制造的掩模。

7. 发明授权

US5390844A Semiconductor inner lead bonding tool 失效
标题翻译：半导体内引线焊接工具
公开(公告)号：US5390844A
公开(公告)日：1995-02-21
申请号：US96700
申请日：1993-07-23
申请人： Thomas H. Distefano , Igor Y. Khandros , Gaetan Mathiew , Jason Sweis , John Grange , Gary W. Grube
发明人： Thomas H. Distefano , Igor Y. Khandros , Gaetan Mathiew , Jason Sweis , John Grange , Gary W. Grube
IPC分类号： H01L21/60 , B23K20/02 , B23K20/10 , H01L21/00 , H01L21/603 , H05K3/32
CPC分类号： H01L21/67138 , B23K20/025 , B23K20/106 , H01L24/80 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01023 , H01L2924/01033 , H01L2924/01045 , H01L2924/01074 , H01L2924/01076 , H01L2924/01082
摘要： A bonding tool for bonding inner leads to semiconductor chips is arranged to capture and align elongated lead sections extending in any one of plural directions, and preferably, in any one of two mutually orthogonal directions. Thus, the tool can be applied to align and bond all of the leads to a chip without turning the tool or the chip even where the leads extend in multiple directions.
摘要翻译：用于将内部引线键合到半导体芯片的接合工具被布置成捕获和对准沿多个方向中的任一个延伸的细长引线部分，优选地在两个相互正交的方向中的任一个方向上对准。因此，即使在多个方向上引线延伸的情况下，该工具也可以应用于将所有引线对齐并将其结合到芯片上而不转动工具或芯片。

8. 发明申请

US20120102440A1 METHOD AND SYSTEM FOR IMPLEMENTING CONTROLLED BREAKS BETWEEN FEATURES USING SUB-RESOLUTION ASSIST FEATURES 有权
公开(公告)号：US20120102440A1
公开(公告)日：2012-04-26
申请号：US13335196
申请日：2011-12-22
申请人： Jason Sweis
发明人： Jason Sweis
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/70
摘要： Disclosed is a method, system, and computer program product for implementing controlled breaks using sub-resolution assist features. Sub-resolution bridging features are added to implement controlled breaks between features on the layout. The bridging features may also be used to facilitate or optimize multiple mask/exposure techniques that split a layout or features on a layout to address pitch problems.

9. 发明授权

US5477611A Method of forming interface between die and chip carrier 失效
标题翻译：在芯片和芯片载体之间形成界面的方法
公开(公告)号：US5477611A
公开(公告)日：1995-12-26
申请号：US123882
申请日：1993-09-20
申请人： Jason Sweis , Kenneth B. Gilleo
发明人： Jason Sweis , Kenneth B. Gilleo
IPC分类号： H01L23/12 , G06K19/077 , H01L21/54 , H01L23/24 , H05K3/34
CPC分类号： G06K19/07745 , H01L21/54 , H01L23/24 , H01L2924/0002 , Y10T29/49144
摘要： A method for creating an interface between a chip and chip carrier includes spacing the chip a given distance above the chip carrier, and then introducing a liquid in the gap between the chip and carrier. Preferably, the liquid is an elastomer which is hardened into a resilient layer after its introduction into the gap. In another preferred embodiment, the terminals on a chip carrier are planarized or otherwise vertically positioned by deforming the terminals into set vertical locations with a plate, and then hardening a liquid between the chip carrier and chip.
摘要翻译：用于在芯片和芯片载体之间创建接口的方法包括将芯片与芯片载体之上的给定距离间隔开，然后在芯片和载体之间的间隙中引入液体。优选地，液体是在其引入间隙之后被硬化成弹性层的弹性体。在另一个优选实施例中，芯片载体上的端子被平坦化或以其它方式垂直定位，通过使端子变形成具有板的设定的垂直位置，然后在芯片载体和芯片之间固化液体。

10. 发明授权

US08782586B2 Method, system, and program product for routing an integrated circuit to be manufactured by doubled patterning 有权
标题翻译：用于布线要通过双重图案化制造的集成电路的方法，系统和程序产品
公开(公告)号：US08782586B2
公开(公告)日：2014-07-15
申请号：US12582366
申请日：2009-10-20
申请人： Abdurrahman Sezginer , David Cooke Noice , Jason Sweis , Vassilios Gerousis , Sozen Yao
发明人： Abdurrahman Sezginer , David Cooke Noice , Jason Sweis , Vassilios Gerousis , Sozen Yao
IPC分类号： G06F17/50
CPC分类号： G06F17/5077 , G06F2217/12 , Y02P90/265
摘要： Disclosed are a method, apparatus, and program product for routing an electronic design using double patterning that is correct by construction. The layout that has been routed will by construction be designed to allow successful manufacturing with double patterning, since the router will not allow a routing configuration in the layout that cannot be successfully manufactured with double patterning.
摘要翻译：公开了一种使用通过构造正确的双重图案化来布线电子设计的方法，装置和程序产品。已经布线的布局将通过结构设计，以允许双重图案化的成功制造，因为路由器将不允许布局中的路由配置不能用双重图案化成功制造。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式