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1. 发明授权

US08570489B2 Lithographic projection apparatus and method of compensating perturbation factors 有权
标题翻译：光刻投影仪和补偿扰动因子的方法
公开(公告)号：US08570489B2
公开(公告)日：2013-10-29
申请号：US12741960
申请日：2008-11-07
申请人： Jan Bernard Plechelmus Van Schoot , Antonius Johannes Josephus Van Dijsseldonk , Hans Van Der Laan , Diederik Jan Maas
发明人： Jan Bernard Plechelmus Van Schoot , Antonius Johannes Josephus Van Dijsseldonk , Hans Van Der Laan , Diederik Jan Maas
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70291 , G03F7/70208 , G03F7/70941
摘要： A lithographic projection apparatus including a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors by providing an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of different lithographic apparatus.
摘要翻译：一种光刻投影设备，包括被配置为支撑图案形成装置的支撑结构，所述图案形成装置被配置为在其横截面中赋予图案的辐射束; 衬底保持器，其构造成保持衬底; 投影系统，被配置为将所述图案化的辐射束暴露在所述基板的目标部分上; 以及被配置为通过提供待暴露在所述基板的目标部分上的另外的辐射束来补偿一个或多个扰动因子的系统，所述附加辐射束在其横截面中被赋予附加图案，所述另外的图案基于图案形成装置的图案和光刻投影装置的属性数据，光刻投影装置的属性数据表征不同光刻装置的一个或多个系统扰动因子的水平和性质。

2. 发明授权

US09594306B2 Lithographic apparatus, spectral purity filter and device manufacturing method 有权
标题翻译：平版印刷设备，光谱纯度滤光片和器件制造方法
公开(公告)号：US09594306B2
公开(公告)日：2017-03-14
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20 , B82Y10/00 , G21K1/06 , H05G2/00
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译：一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度过滤器具有彼此不同的辐射过滤结构。

3. 发明申请

US20110223543A1 RADIATION SYSTEM, RADIATION COLLECTOR, RADIATION BEAM CONDITIONING SYSTEM, SPECTRAL PURITY FILTER FOR RADIATION SYSTEM AND METHOD FOR FORMING A SPECTRAL PURITY FILTER 有权
标题翻译：辐射系统，辐射收集器，辐射束调节系统，辐射系统的光谱滤光器和形成光谱滤光片的方法
公开(公告)号：US20110223543A1
公开(公告)日：2011-09-15
申请号：US12994930
申请日：2009-05-05
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/70575
摘要： A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.
摘要翻译：辐射系统被配置为产生辐射束。所述辐射系统包括腔室，所述室包括被配置为产生辐射的辐射源，辐射束发射孔和被配置为收集由所述源产生的辐射的辐射收集器，并且将所收集的辐射传输到所述辐射束发射孔。辐射收集器包括光谱纯度滤光器，其配置成增强经由孔径发射的辐射的光谱纯度。

4. 发明授权

US06737662B2 Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product 有权
标题翻译：光刻设备，设备制造方法，由此制造的设备，控制系统，计算机程序和计算机程序产品
公开(公告)号：US06737662B2
公开(公告)日：2004-05-18
申请号：US10157033
申请日：2002-05-30
申请人： Heine Melle Mulder , Jan Bernard Plechelmus Van Schoot , Markus Franciscus Antonius Eurlings , Antonius Johannes Josephus Van Dijsseldonk , Marcel Dierichs
发明人： Heine Melle Mulder , Jan Bernard Plechelmus Van Schoot , Markus Franciscus Antonius Eurlings , Antonius Johannes Josephus Van Dijsseldonk , Marcel Dierichs
IPC分类号： G01N2186
CPC分类号： G03F7/70116 , G03F7/70075 , G03F7/70141 , G03F7/702
摘要： A lithographic projection system has an illumination system. A plurality of directing elements reflect different sub-beams of an incident projection beam into adjustable, individually controllable directions. By using of re-directing optics any desired spatial intensity distribution of the projection beam can be produced in its cross-sectional plane.
摘要翻译：光刻投影系统具有照明系统。多个引导元件将入射投影光束的不同子光束反射到可调节的，可独立控制的方向。通过使用重新引导光学元件，可以在其横截面中产生投影光束的所需空间强度分布。

5. 发明授权

US08830444B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US08830444B2
公开(公告)日：2014-09-09
申请号：US13279770
申请日：2011-10-24
申请人： Jan Bernard Plechelmus Van Schoot , Igor Petrus Maria Bouchoms , Antonius Johannes Josephus Van Dijsseldonk , Markus Franciscus Antonius Eurlings
发明人： Jan Bernard Plechelmus Van Schoot , Igor Petrus Maria Bouchoms , Antonius Johannes Josephus Van Dijsseldonk , Markus Franciscus Antonius Eurlings
IPC分类号： G03F7/20 , G03B27/54 , G03B27/58
CPC分类号： G03F7/70558 , G03B27/54 , G03B27/58 , G03F7/709
摘要： A lithographic apparatus comprising a source that generates a beam of radiation, a support structure supporting a patterning device, a substrate table for holding a substrate, and a projection system projecting the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a vibration measurement apparatus configured to measure relative vibration between the patterning device and the substrate during exposure of the target portion. A control apparatus adjusts power of the radiation beam to compensate for the effect of the measured relative vibration on the pattern projected onto the substrate.
摘要翻译：一种光刻设备，包括产生辐射束的源，支撑图案形成装置的支撑结构，用于保持衬底的衬底台，以及将图案化的辐射束投影到衬底的目标部分上的投影系统。所述光刻设备还包括：振动测量装置，被配置为在所述目标部分的曝光期间测量所述图案形成装置和所述基板之间的相对振动。控制装置调节辐射束的功率，以补偿所测量的相对振动对投射到衬底上的图案的影响。

6. 发明授权

US09097982B2 Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for radiation system and method for forming a spectral purity filter 有权
标题翻译：辐射系统，辐射收集器，辐射束调节系统，辐射系统光谱纯度滤波器和形成光谱纯度滤光片的方法
公开(公告)号：US09097982B2
公开(公告)日：2015-08-04
申请号：US12994930
申请日：2009-05-05
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/70575
摘要： A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.
摘要翻译：辐射系统被配置为产生辐射束。所述辐射系统包括腔室，所述室包括被配置为产生辐射的辐射源，辐射束发射孔和被配置为收集由所述源产生的辐射的辐射收集器，并且将所收集的辐射传输到所述辐射束发射孔。辐射收集器包括光谱纯度滤光器，其配置成增强经由孔径发射的辐射的光谱纯度。

7. 发明申请

US20140085619A1 Lithographic Apparatus, Spectral Purity Filter and Device Manufacturing Method 有权
标题翻译：光刻设备，光谱纯化过滤器和器件制造方法
公开(公告)号：US20140085619A1
公开(公告)日：2014-03-27
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译：一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度过滤器具有彼此不同的辐射过滤结构。

8. 发明授权

US07177010B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07177010B2
公开(公告)日：2007-02-13
申请号：US10979798
申请日：2004-11-03
申请人： Hans Van Der Laan , Uwe Mickan , Markus Franciscus Antonius Eurlings , Jan Bernard Plechelmus Van Schoot
发明人： Hans Van Der Laan , Uwe Mickan , Markus Franciscus Antonius Eurlings , Jan Bernard Plechelmus Van Schoot
IPC分类号： G03B27/42
CPC分类号： G03F7/70941 , G03F7/70558 , G03F7/70666
摘要： A lithographic apparatus comprises an illumination system for providing a projection beam of radiation, a support structure for supporting patterning device, the patterning device serving to transmit or reflect radiation in the projection beam and impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. A sensor is provided for measuring the spatial intensity distribution of the projection beam at the substrate. The spatial distribution of transmission or reflectance of the patterning device, together with the distribution of the projection beam incident on the patterning device, may be determined from the measured intensity distribution. By comparing the transmission or reflectance from regions having identical patterns the overall (macroscopic) distribution of the transmission or reflectance of the patterning device can be determined.
摘要翻译：光刻设备包括用于提供投影辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于透射或反射投影光束中的辐射并且在其横截面中赋予投影光束图案，用于保持基板的基板台，以及用于将图案化的光束投影到基板的目标部分上的投影系统。提供了一种传感器，用于测量投影光束在基板处的空间强度分布。可以根据测量的强度分布来确定图案形成装置的透射或反射率的空间分布以及入射在图案形成装置上的投影光束的分布。通过比较具有相同图案的区域的透射率或反射率，可以确定透射率的总体（宏观）分布或图案形成装置的反射率。

9. 发明申请

US20090047604A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20090047604A1
公开(公告)日：2009-02-19
申请号：US11889722
申请日：2007-08-15
申请人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Diederik Jan Maas
发明人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Diederik Jan Maas
IPC分类号： G03C5/00 , G03B27/42
CPC分类号： G03F7/7045 , G03F7/70425 , G03F7/70466 , G03F7/70733 , G03F7/70991
摘要： A lithographic apparatus and method is disclosed to reduce the exposure time that a substrate spends within a main lithographic apparatus by pre- (or post-) exposing one or more edge devices on the substrate. Because an edge device does not ultimately yield a useful device, it can be exposed with a lithographic apparatus that has a lower resolution than that used to expose one or more of the other, complete devices produced from the substrate. Therefore, the pre- (or post-) exposure of an edge device can be performed using a less complex, and less expensive, lithographic device.
摘要翻译：公开了一种光刻设备和方法，以通过预先（或后）暴露基板上的一个或多个边缘设备来减少基板在主平版印刷设备内花费的曝光时间。因为边缘装置最终不会产生有用的装置，所以可以用光刻设备曝光，该光刻设备的分辨率比用于暴露从基板产生的一个或多个其它完整装置的分辨率低。因此，可以使用较不复杂和较便宜的光刻设备来执行边缘设备的预曝光（或后曝光）。

10. 发明授权

US08896809B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08896809B2
公开(公告)日：2014-11-25
申请号：US11889722
申请日：2007-08-15
申请人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Diederik Jan Maas
发明人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Diederik Jan Maas
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/7045 , G03F7/70425 , G03F7/70466 , G03F7/70733 , G03F7/70991
摘要： A lithographic apparatus and method is disclosed to reduce the exposure time that a substrate spends within a main lithographic apparatus by pre- (or post-) exposing one or more edge devices on the substrate. Because an edge device does not ultimately yield a useful device, it can be exposed with a lithographic apparatus that has a lower resolution than that used to expose one or more of the other, complete devices produced from the substrate. Therefore, the pre- (or post-) exposure of an edge device can be performed using a less complex, and less expensive, lithographic device.
摘要翻译：公开了一种光刻设备和方法，以通过预先（或后）暴露基板上的一个或多个边缘设备来减少基板在主平版印刷设备内花费的曝光时间。因为边缘装置最终不会产生有用的装置，所以可以用光刻设备曝光，该光刻设备的分辨率比用于暴露从基板产生的一个或多个其它完整装置的分辨率低。因此，可以使用较不复杂和较便宜的光刻设备来执行边缘设备的预曝光（或后曝光）。

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