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1. 发明申请

US20080086212A1 Spine distraction implant 审中-公开
标题翻译：脊柱牵引植入物
公开(公告)号：US20080086212A1
公开(公告)日：2008-04-10
申请号：US11788763
申请日：2007-04-19
申请人： James Zucherman , Ken Hsu , Charles Winslow , Henry Klyce , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
发明人： James Zucherman , Ken Hsu , Charles Winslow , Henry Klyce , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
IPC分类号： A61F2/44 , A61B17/58
CPC分类号： A61B17/7068 , A61B17/66 , A61B17/7065 , A61B17/7071 , A61B2017/00557 , A61K31/37
摘要： A spine distraction implant alleviates pain associated with spinal stenosis and facet arthropathy by expanding the volume in the spine canal and/or neural foramen. The implant provides a spinal extension stop while allowing freedom of spinal flexion. An interspinous process implant with a selectably expandable spacer can be placed between adjacent spinous processes. a device implanted between the spinous processes of adjacent vertebrae of the spine can be used for relieving pain associated with the vertebrae and surrounding tissues and structures by maintaining and/or adding distraction between adjacent vertebrae. A tissue expander can be adapted to move from a first insertion position, for ease of implantation between spinous processes, to a second retention position that prevents displacement of the implant. An embodiment of a system can include an implant having a spacer with a thickness and a wing, wherein a first configuration of the wing has a first height substantially similar to the thickness and wherein the wing is adapted to be selectably arranged in a second configuration such that the wing has a second height greater than the first height. A periphery of the implant has a shape generally conformal with a shape of an inner surface of a cannula and a cross-sectional diameter smaller than an inner diameter of the cannula. The cannula is inserted such that a proximal end of the cannula is arranged between the adjacent spinous processes. The implant is then urged into position between the adjacent spinous processes by way of the cannula, and subsequently arranged in a second configuration to fix the implant in position.
摘要翻译：脊柱分心植入物通过扩大脊柱管和/或神经孔的体积来减轻与脊柱狭窄和小关节病相关的疼痛。植入物提供脊椎伸展停止，同时允许脊柱屈曲的自由。具有可选择地可扩展间隔物的椎间植入植入物可以放置在相邻的棘突之间。植入脊椎相邻椎骨的棘突之间的装置可用于通过维持和/或增加相邻椎骨之间的牵引来减轻与椎骨和周围组织和结构相关的疼痛。组织扩张器可以适于从第一插入位置移动，以便于在棘突之间植入到防止植入物移位的第二保持位置。系统的实施例可以包括具有厚度和翼的间隔件的植入物，其中所述翼的第一构造具有与所述厚度基本相似的第一高度，并且其中所述翼适于可选地布置成第二构型机翼的第二高度大于第一高度。植入物的周边具有与插管的内表面的形状大致一致的形状，并且截面直径小于插管的内径。套管被插入使得插管的近端布置在相邻的棘突之间。然后通过插管将植入物推动到相邻棘突之间的位置，并且随后被布置成第二构造以将植入物固定就位。

2. 发明申请

US20070276500A1 INTERSPINOUS PROCESS IMPLANT INCLUDING A BINDER, BINDER ALIGNER AND METHOD OF IMPLANTATION 失效
标题翻译：包含BINDER，BINDER对齐器和植入方法的INTERSPINOUS PROCESS IMPLAN
公开(公告)号：US20070276500A1
公开(公告)日：2007-11-29
申请号：US11668217
申请日：2007-01-29
申请人： James Zucherman , Ken Hsu , Henry Klyce , Charles Winslow , John Flynn , Steven Mitchell , Scott Yerby , John Markwart
发明人： James Zucherman , Ken Hsu , Henry Klyce , Charles Winslow , John Flynn , Steven Mitchell , Scott Yerby , John Markwart
IPC分类号： A61F2/44
CPC分类号： A61B17/7068 , A61B17/7053 , A61B2017/00867
摘要： Systems in accordance with embodiments of the present invention can include an implant comprising a spacer for defining a minimum space between adjacent spinous processes, a distraction guide for piercing and distracting an interspinous ligament during implantation, and a binder for limiting or preventing flexion motion of the targeted motion segment. The binder can be secured to a brace associated with the implant during implantation by a capture device. A binder aligner aligns the binder with the implant stabilizing the implant, binder and the adjacent vertebrae.
摘要翻译：根据本发明的实施例的系统可以包括植入物，其包括用于限定相邻棘突之间的最小空间的间隔件，用于在植入期间刺穿和分散椎间韧带的牵引引导件，以及用于限制或防止植入物中的屈曲运动的粘合剂目标运动部分。在通过捕获装置植入期间，粘合剂可以固定到与植入物相关联的支架上。粘合剂对准器将粘合剂与固定植入物，粘合剂和相邻椎骨的植入物对准。

3. 发明申请

US20080065213A1 INTERSPINOUS PROCESS IMPLANTS AND METHODS OF USE 审中-公开
公开(公告)号：US20080065213A1
公开(公告)日：2008-03-13
申请号：US11768224
申请日：2007-06-26
申请人： James Zucherman , Ken Hsu , Henry Klyce , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
发明人： James Zucherman , Ken Hsu , Henry Klyce , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
IPC分类号： A61F2/44 , A61B17/58
CPC分类号： A61B17/7053 , A61B17/7047 , A61B17/7062 , A61B17/7065 , A61B17/7068 , A61B17/842
摘要： Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.

4. 发明申请

US20080051899A1 INTERSPINOUS PROCESS IMPLANTS AND METHODS OF USE 审中-公开
公开(公告)号：US20080051899A1
公开(公告)日：2008-02-28
申请号：US11771046
申请日：2007-06-29
申请人： James Zucherman , Ken Hsu , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
发明人： James Zucherman , Ken Hsu , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
IPC分类号： A61F2/44 , A61B17/58
CPC分类号： A61B17/7053 , A61B17/7047 , A61B17/7062 , A61B17/7065 , A61B17/7068 , A61B17/842
摘要： Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.

5. 发明申请

US20060271194A1 Interspinous process implant having deployable wing as an adjunct to spinal fusion and method of implantation 审中-公开
标题翻译：椎间植入物具有可展开的翼作为脊柱融合的辅助装置和植入方法
公开(公告)号：US20060271194A1
公开(公告)日：2006-11-30
申请号：US11378894
申请日：2006-03-17
申请人： James Zucherman , Ken Hsu , Charles Winslow , John Flynn , Steven Mitchell , Scott Yerby , John Markwart
发明人： James Zucherman , Ken Hsu , Charles Winslow , John Flynn , Steven Mitchell , Scott Yerby , John Markwart
IPC分类号： A61F2/44
CPC分类号： A61B17/7068 , A61B17/7065
摘要： Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the distraction guide can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.
摘要翻译：根据本发明的实施例的系统和方法可以包括植入物，其包括第一翼，从第一翼延伸的间隔件和牵引引导件。牵引引导件布置成第一构造以刺穿和/或分散与从目标运动段的椎骨延伸的相邻棘突相关联的组织。植入物可以定位在相邻的棘突之间并且一旦定位，牵引引导件可以被布置成第二构造。当以第二构造布置时，分心引导件可以用作第二翼。第一翼和第二翼可以限制或阻止植入物沿着植入物的纵向轴线的移动。

6. 发明申请

US20080065214A1 INTERSPINOUS PROCESS IMPLANTS AND METHODS OF USE 审中-公开
公开(公告)号：US20080065214A1
公开(公告)日：2008-03-13
申请号：US11770931
申请日：2007-06-29
申请人： James Zucherman , Ken Hsu , Henry Klyce , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
发明人： James Zucherman , Ken Hsu , Henry Klyce , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
IPC分类号： A61F2/44 , A61M29/00
CPC分类号： A61B17/7053 , A61B17/7047 , A61B17/7062 , A61B17/7065 , A61B17/7068 , A61B17/842
摘要： Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.

7. 发明申请

US20080065212A1 INTERSPINOUS PROCESS IMPLANTS AND METHODS OF USE 审中-公开
公开(公告)号：US20080065212A1
公开(公告)日：2008-03-13
申请号：US11768223
申请日：2007-06-26
申请人： James Zucherman , Ken Hsu , Henry Klyce , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
发明人： James Zucherman , Ken Hsu , Henry Klyce , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
IPC分类号： A61F2/44 , A61B17/58
CPC分类号： A61B17/7053 , A61B17/7047 , A61B17/7062 , A61B17/7065 , A61B17/7068 , A61B17/842
摘要： Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.

8. 发明申请

US20080045958A1 INTERSPINOUS PROCESS IMPLANT HAVING DEPLOYABLE WINGS AND METHOD OF IMPLANTATION 有权
标题翻译：具有可分配线的横向过程植入物和植入方法
公开(公告)号：US20080045958A1
公开(公告)日：2008-02-21
申请号：US11923733
申请日：2007-10-25
申请人： James Zucherman , Ken Hsu , Henry Klyce , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
发明人： James Zucherman , Ken Hsu , Henry Klyce , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
IPC分类号： A61F2/30
CPC分类号： A61B17/7068 , A61B17/7065
摘要： An embodiment of a system in accordance with the present invention can include an implant having a spacer with a thickness and a wing, wherein a first configuration of the wing has a first height substantially similar to the thickness and wherein the wing is adapted to be selectably arranged in a second configuration such that the wing has a second height greater than the first height. A periphery of the implant has a shape generally conformal with a shape of an inner surface of a cannula and a cross-sectional diameter smaller than an inner diameter of the cannula. The cannula is inserted such that a proximal end of the cannula is arranged between the adjacent spinous processes. The implant is then urged into position between the adjacent spinous processes by way of the cannula, and subsequently arranged in a second configuration to fix the implant in position.
摘要翻译：根据本发明的系统的实施例可以包括具有厚度和翼的间隔件的植入物，其中所述翼的第一构造具有与所述厚度基本相似的第一高度，并且所述翼适于可选地布置成第二构造，使得翼具有大于第一高度的第二高度。植入物的周边具有与插管的内表面的形状大致一致的形状，并且截面直径小于插管的内径。套管被插入使得插管的近端布置在相邻的棘突之间。然后通过插管将植入物推动到相邻棘突之间的位置，并且随后被布置成第二构造以将植入物固定就位。

9. 发明申请

US20080039947A1 INTERSPINOUS PROCESS IMPLANTS AND METHODS OF USE 有权
公开(公告)号：US20080039947A1
公开(公告)日：2008-02-14
申请号：US11771087
申请日：2007-06-29
申请人： James Zucherman , Ken Hsu , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
发明人： James Zucherman , Ken Hsu , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
IPC分类号： A61F2/44
CPC分类号： A61B17/7053 , A61B17/7047 , A61B17/7062 , A61B17/7065 , A61B17/7068 , A61B17/842
摘要： Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.

10. 发明申请

US20080033560A1 INTERSPINOUS PROCESS IMPLANTS AND METHODS OF USE 有权
公开(公告)号：US20080033560A1
公开(公告)日：2008-02-07
申请号：US11771099
申请日：2007-06-29
申请人： James Zucherman , Ken Hsu , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
发明人： James Zucherman , Ken Hsu , Charles Winslow , Scott Yerby , John Flynn , Steven Mitchell , John Markwart
IPC分类号： A61F2/44 , A61B17/58
CPC分类号： A61B17/7053 , A61B17/7047 , A61B17/7062 , A61B17/7065 , A61B17/7068 , A61B17/842
摘要： Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.

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