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1. 发明授权

US07935604B2 Method of making small geometry features 有权
标题翻译：制作小几何特征的方法
公开(公告)号：US07935604B2
公开(公告)日：2011-05-03
申请号：US12028847
申请日：2008-02-11
申请人： James William Adkisson , Jeffrey Peter Gambino , Robert Kenneth Leidy , Walter Victor Lepuschenko , David Alan Meatyard , Stephen A. Mongeon , Richard John Rassel
发明人： James William Adkisson , Jeffrey Peter Gambino , Robert Kenneth Leidy , Walter Victor Lepuschenko , David Alan Meatyard , Stephen A. Mongeon , Richard John Rassel
IPC分类号： H01L21/336
CPC分类号： H01L21/76843 , H01L21/0337 , H01L21/0338 , H01L21/31144 , H01L21/76802 , H01L21/76838 , H01L21/76885 , H01L29/51 , H01L29/6659 , H01L29/7833
摘要： A method of forming a small geometry feature. The method includes forming a source layer on a top surface of a substrate; forming a mandrel on a top surface of the source layer, the mandrel having a sidewall; sputtering material from the source layer onto the sidewall of the mandrel to form a sidewall layer on the sidewall of the mandrel; and removing the mandrel. Also methods to forming wires and field effect transistors of integrated circuits.
摘要翻译：形成小几何特征的方法。该方法包括在基板的顶表面上形成源层; 在所述源层的顶表面上形成心轴，所述心轴具有侧壁; 将来自源层的材料溅射到心轴的侧壁上以在心轴的侧壁上形成侧壁层; 并移除心轴。还有形成集成电路的导线和场效应晶体管的方法。

2. 发明申请

US20100279480A1 METHOD OF MAKING SMALL GEOMETRY FEATURES 有权
标题翻译：制作小数特征的方法
公开(公告)号：US20100279480A1
公开(公告)日：2010-11-04
申请号：US12028847
申请日：2008-02-11
申请人： James William Adkisson , James Peter Gambino , Robert Kenneth Leidy , Walter Victor Lepuschenko , David Alan Meatyard , Stephen A. Mongeon , Richard John Rassel
发明人： James William Adkisson , James Peter Gambino , Robert Kenneth Leidy , Walter Victor Lepuschenko , David Alan Meatyard , Stephen A. Mongeon , Richard John Rassel
IPC分类号： H01L21/336 , H01L21/311 , H01L21/283
CPC分类号： H01L21/76843 , H01L21/0337 , H01L21/0338 , H01L21/31144 , H01L21/76802 , H01L21/76838 , H01L21/76885 , H01L29/51 , H01L29/6659 , H01L29/7833
摘要： A method of forming a small geometry feature. The method includes forming a source layer on a top surface of a substrate; forming a mandrel on a top surface of the source layer, the mandrel having a sidewall; sputtering material from the source layer onto the sidewall of the mandrel to form a sidewall layer on the sidewall of the mandrel; and removing the mandrel. Also methods to forming wires and field effect transistors of integrated circuits.
摘要翻译：形成小几何特征的方法。该方法包括在基板的顶表面上形成源层; 在所述源层的顶表面上形成心轴，所述心轴具有侧壁; 将来自源层的材料溅射到心轴的侧壁上以在心轴的侧壁上形成侧壁层; 并移除心轴。还有形成集成电路的导线和场效应晶体管的方法。

3. 发明授权

US07524694B2 Funneled light pipe for pixel sensors 有权
标题翻译：用于像素传感器的漏斗式光管
公开(公告)号：US07524694B2
公开(公告)日：2009-04-28
申请号：US11275171
申请日：2005-12-16
申请人： James William Adkisson , Jeffrey Peter Gambino , Robert Kenneth Leidy , Richard John Rassel
发明人： James William Adkisson , Jeffrey Peter Gambino , Robert Kenneth Leidy , Richard John Rassel
IPC分类号： G02B27/10
CPC分类号： G01J1/04 , G01J1/0407 , G01J1/0422 , G01J1/0488
摘要： A photo sensing structure and methods for forming the same. The structure includes (a) a semiconductor substrate and (b) a photo collection region on the semiconductor substrate. The structure also includes a funneled light pipe on top of the photo collection region. The funneled light pipe includes (i) a bottom cylindrical portion on top of the photo collection region of the photo collection region, and (ii) a funneled portion which has a tapered shape and is on top and in direct physical contact with the bottom cylindrical portion. The structure further includes a color filter region on top of the funneled light pipe.
摘要翻译：感光结构及其形成方法。该结构包括（a）半导体衬底和（b）半导体衬底上的光收集区域。该结构还包括在照片收集区域顶部的漏斗光管。漏斗式光管包括（i）照片收集区域的照片收集区域顶部的底部圆柱形部分，和（ii）具有锥形形状并且在顶部并与底部圆柱体直接物理接触的漏斗部分一部分。该结构还包括在漏斗的光管的顶部上的滤色器区域。

4. 发明授权

US08647913B2 Image sensor, method and design structure including non-planar reflector 失效
标题翻译：图像传感器，方法和设计结构包括非平面反射器
公开(公告)号：US08647913B2
公开(公告)日：2014-02-11
申请号：US13614210
申请日：2012-09-13
申请人： James William Adkisson , Jeffrey Peter Gambino , Robert Kenneth Leidy , John J. Ellis-Monaghan
发明人： James William Adkisson , Jeffrey Peter Gambino , Robert Kenneth Leidy , John J. Ellis-Monaghan
IPC分类号： H01L27/00
CPC分类号： H01L27/14643 , H01L27/14621 , H01L27/14625 , H01L27/1464 , H01L27/14683 , H01L27/14685
摘要： A solid state image sensor, a method for fabricating the solid state image sensor and a design structure for fabricating the solid state image sensor structure include a substrate that in turn includes a photosensitive region. Also included within solid state image sensor is a non-planar reflector layer located over a side of the photosensitive region and the substrate opposite an incoming radiation side of the photosensitive region and the substrate. The non-planar reflector layer is shaped and positioned to reflect uncaptured incident radiation back into the photosensitive region while avoiding optical cross-talk with an additional photosensitive region laterally separated within the substrate.
摘要翻译：固态图像传感器，制造固态图像传感器的方法和用于制造固态图像传感器结构的设计结构包括依次包括感光区域的基板。还包括在固态图像传感器内的非平面反射器层位于感光区域和基板的与感光区域和基板的入射辐射侧相对的一侧上。非平面反射器层被成形和定位成将未捕获的入射辐射反射回光敏区域，同时避免与衬底内横向分离的附加光敏区域的光学串扰。

5. 发明申请

US20130001727A1 IMAGE SENSOR, METHOD AND DESIGN STRUCTURE INCLUDING NON-PLANAR REFLECTOR 失效
标题翻译：图像传感器，包括非平面反射器的方法和设计结构
公开(公告)号：US20130001727A1
公开(公告)日：2013-01-03
申请号：US13614210
申请日：2012-09-13
申请人： James William Adkisson , Jeffrey Peter Gambino , Robert Kenneth Leidy , John J. Ellis-Monaghan
发明人： James William Adkisson , Jeffrey Peter Gambino , Robert Kenneth Leidy , John J. Ellis-Monaghan
IPC分类号： H01L31/0232 , H01L31/18
CPC分类号： H01L27/14643 , H01L27/14621 , H01L27/14625 , H01L27/1464 , H01L27/14683 , H01L27/14685
摘要： A solid state image sensor, a method for fabricating the solid state image sensor and a design structure for fabricating the solid state image sensor structure include a substrate that in turn includes a photosensitive region. Also included within solid state image sensor is a non-planar reflector layer located over a side of the photosensitive region and the substrate opposite an incoming radiation side of the photosensitive region and the substrate. The non-planar reflector layer is shaped and positioned to reflect uncaptured incident radiation back into the photosensitive region while avoiding optical cross-talk with an additional photosensitive region laterally separated within the substrate.
摘要翻译：固态图像传感器，制造固态图像传感器的方法和用于制造固态图像传感器结构的设计结构包括依次包括感光区域的基板。还包括在固态图像传感器内的非平面反射器层位于感光区域和基板的与感光区域和基板的入射辐射侧相对的一侧上。非平面反射器层被成形和定位成将未捕获的入射辐射反射回光敏区域，同时避免与衬底内横向分离的附加光敏区域的光学串扰。

6. 发明申请

US20110049330A1 IMAGE SENSOR, METHOD AND DESIGN STRUCTURE INCLUDING NON-PLANAR REFLECTOR 有权
标题翻译：图像传感器，包括非平面反射器的方法和设计结构
公开(公告)号：US20110049330A1
公开(公告)日：2011-03-03
申请号：US12550640
申请日：2009-08-31
申请人： James William Adkisson , Jeffrey Peter Gambino , Robert Kenneth Leidy , John J. Ellis-Monaghan
发明人： James William Adkisson , Jeffrey Peter Gambino , Robert Kenneth Leidy , John J. Ellis-Monaghan
IPC分类号： H01L27/00
CPC分类号： H01L27/14643 , H01L27/14621 , H01L27/14625 , H01L27/1464 , H01L27/14683 , H01L27/14685
摘要： A solid state image sensor, a method for fabricating the solid state image sensor and a design structure for fabricating the solid state image sensor structure include a substrate that in turn includes a photosensitive region. Also included within solid state image sensor is a non-planar reflector layer located over a side of the photosensitive region and the substrate opposite an incoming radiation side of the photosensitive region and the substrate. The non-planar reflector layer is shaped and positioned to reflect uncaptured incident radiation back into the photosensitive region while avoiding optical cross-talk with an additional photosensitive region laterally separated within the substrate.
摘要翻译：固态图像传感器，制造固态图像传感器的方法和用于制造固态图像传感器结构的设计结构包括依次包括感光区域的基板。还包括在固态图像传感器内的非平面反射器层位于感光区域和基板的与感光区域和基板的入射辐射侧相对的一侧上。非平面反射器层被成形和定位成将未捕获的入射辐射反射回光敏区域，同时避免与衬底内横向分离的附加光敏区域的光学串扰。

7. 发明授权

US08299554B2 Image sensor, method and design structure including non-planar reflector 有权
标题翻译：图像传感器，方法和设计结构包括非平面反射器
公开(公告)号：US08299554B2
公开(公告)日：2012-10-30
申请号：US12550640
申请日：2009-08-31
申请人： James William Adkisson , Jeffrey Peter Gambino , Robert Kenneth Leidy , John J. Ellis-Monaghan
发明人： James William Adkisson , Jeffrey Peter Gambino , Robert Kenneth Leidy , John J. Ellis-Monaghan
IPC分类号： H01L27/00
CPC分类号： H01L27/14643 , H01L27/14621 , H01L27/14625 , H01L27/1464 , H01L27/14683 , H01L27/14685
摘要： A solid state image sensor, a method for fabricating the solid state image sensor and a design structure for fabricating the solid state image sensor structure include a substrate that in turn includes a photosensitive region. Also included within solid state image sensor is a non-planar reflector layer located over a side of the photosensitive region and the substrate opposite an incoming radiation side of the photosensitive region and the substrate. The non-planar reflector layer is shaped and positioned to reflect uncaptured incident radiation back into the photosensitive region while avoiding optical cross-talk with an additional photosensitive region laterally separated within the substrate.
摘要翻译：固态图像传感器，制造固态图像传感器的方法和用于制造固态图像传感器结构的设计结构包括依次包括感光区域的基板。还包括在固态图像传感器内的非平面反射器层位于感光区域和基板的与感光区域和基板的入射辐射侧相对的一侧上。非平面反射器层被成形和定位成将未捕获的入射辐射反射回光敏区域，同时避免与衬底内横向分离的附加感光区域的光学串扰。

8. 发明申请

US20080261121A1 PHOTOLITHOGRAPHY MASK WITH PROTECTIVE SILICIDE CAPPING LAYER 审中-公开
标题翻译：具有保护性硅胶覆盖层的光刻胶面板
公开(公告)号：US20080261121A1
公开(公告)日：2008-10-23
申请号：US11738004
申请日：2007-04-20
申请人： Jeffrey Peter Gambino , Robert Kenneth Leidy , Kirk David Peterson , Jed Hickory Rankin , Edmund Juris Sprogis
发明人： Jeffrey Peter Gambino , Robert Kenneth Leidy , Kirk David Peterson , Jed Hickory Rankin , Edmund Juris Sprogis
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F1/30 , G03F1/48 , G03F1/54
摘要： A photomask and a method of fabricating the photomask. The photomask including: a substrate transparent to a selected wavelength or wavelengths of radiation, the substrate having a top surface and an opposite bottom surface, the substrate having a printable region and a non-printable region; the printable region having first opaque regions raised above the top surface of the substrate adjacent to clear regions, each opaque region of the first opaque regions having sidewalls and opposite top and bottom surfaces, the first opaque regions including a metal; the non-printable region including metal second opaque region raised above the top surface of the substrate, the second opaque region having sidewalls and opposite top and bottom surface, the second opaque regions including the metal; and a conformal protective metal oxide capping layer on top surfaces and sidewalls of the first and second opaque regions. The conformal layer is formed by oxidation.
摘要翻译：光掩模和制造光掩模的方法。所述光掩模包括：对所选择的波长或辐射波长透明的衬底，所述衬底具有顶表面和相对的底表面，所述衬底具有可打印区域和不可打印区域; 所述可印刷区域具有在所述基板的与所述透明区域相邻的顶表面上方的第一不透明区域，所述第一不透明区域的每个不透明区域具有侧壁和相对的顶表面和底表面，所述第一不透明区域包括金属; 所述不可打印区域包括在所述基板的顶表面上方升高的金属第二不透明区域，所述第二不透明区域具有侧壁和相对的顶部和底部表面，所述第二不透明区域包括所述金属; 以及在第一和第二不透明区域的顶表面和侧壁上的共形保护性金属氧化物覆盖层。保形层通过氧化形成。

9. 发明申请

US20080261120A1 PHOTOLITHOGRAPHY MASK WITH INTEGRALLY FORMED PROTECTIVE CAPPING LAYER 审中-公开
标题翻译：具有整体形成的保护层的光刻胶面板
公开(公告)号：US20080261120A1
公开(公告)日：2008-10-23
申请号：US11737956
申请日：2007-04-20
申请人： Jeffrey Peter Gambino , Robert Kenneth Leidy , Kirk David Peterson , Jed Hickory Rankin , Edmund Juris Sprogis
发明人： Jeffrey Peter Gambino , Robert Kenneth Leidy , Kirk David Peterson , Jed Hickory Rankin , Edmund Juris Sprogis
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F1/30 , G03F1/48 , G03F1/54
摘要： A photomask and a method of fabricating the photomask. The photomask including: a substrate transparent to a selected wavelength or wavelengths of radiation, the substrate having a top surface and an opposite bottom surface, the substrate having a printable region and a non-printable region; the printable region having first opaque regions raised above the top surface of the substrate adjacent to clear regions, each opaque region of the first opaque regions having sidewalls and opposite top and bottom surfaces, the first opaque regions including a metal; the non-printable region including metal second opaque region raised above the top surface of the substrate, the second opaque region having sidewalls and opposite top and bottom surface, the second opaque regions including the metal; and a conformal protective metal oxide capping layer on top surfaces and sidewalls of the first and second opaque regions. The conformal layer is formed by oxidation.
摘要翻译：光掩模和制造光掩模的方法。所述光掩模包括：对所选择的波长或辐射波长透明的衬底，所述衬底具有顶表面和相对的底表面，所述衬底具有可打印区域和不可打印区域; 所述可印刷区域具有在所述基板的与所述透明区域相邻的顶表面上方的第一不透明区域，所述第一不透明区域的每个不透明区域具有侧壁和相对的顶表面和底表面，所述第一不透明区域包括金属; 所述不可打印区域包括在所述基板的顶表面上方升高的金属第二不透明区域，所述第二不透明区域具有侧壁和相对的顶部和底部表面，所述第二不透明区域包括所述金属; 以及在第一和第二不透明区域的顶表面和侧壁上的共形保护性金属氧化物覆盖层。保形层通过氧化形成。

10. 发明申请

US20080261122A1 PHOTOLITHOGRAPHY MASK WITH PROTECTIVE CAPPING LAYER 审中-公开
标题翻译：具有保护层的光刻胶面
公开(公告)号：US20080261122A1
公开(公告)日：2008-10-23
申请号：US11738070
申请日：2007-04-20
申请人： Jeffrey Peter Gambino , Robert Kenneth Leidy , Kirk David Peterson , Jed Hickory Rankin , Edmund Juris Sprogis
发明人： Jeffrey Peter Gambino , Robert Kenneth Leidy , Kirk David Peterson , Jed Hickory Rankin , Edmund Juris Sprogis
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F1/30 , G03F1/48 , G03F1/54
摘要： A photomask and a method of fabricating the photomask. The photomask including: a substrate transparent to a selected wavelength or wavelengths of radiation, the substrate having a top surface and an opposite bottom surface, the substrate having a printable region and a non-printable region; the printable region having first opaque regions raised above the top surface of the substrate adjacent to clear regions, each opaque region of the first opaque regions having sidewalls and a top surface; the non-printable region comprising a second opaque region raised above the top surface of the substrate, the second opaque region having sidewalls and a top surface; and a capping layer on the sidewalls of the first opaque regions and the sidewalls of the second opaque region.
摘要翻译：光掩模和制造光掩模的方法。所述光掩模包括：对所选择的波长或辐射波长透明的衬底，所述衬底具有顶表面和相对的底表面，所述衬底具有可打印区域和不可打印区域; 所述可印刷区域具有在所述基板的与所述透明区域相邻的顶表面上方的第一不透明区域，所述第一不透明区域的每个不透明区域具有侧壁和顶表面; 所述不可打印区域包括在所述基板的顶表面上方升高的第二不透明区域，所述第二不透明区域具有侧壁和顶表面; 以及在第一不透明区域的侧壁和第二不透明区域的侧壁上的覆盖层。

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