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1. 发明授权

US07355813B2 Method of fabricating a narrow projection such as a write pole extending from a substrate 失效
标题翻译：制造诸如从基板延伸的写极的窄突起的方法
公开(公告)号：US07355813B2
公开(公告)日：2008-04-08
申请号：US11053632
申请日：2005-02-08
申请人： James Kruger , Benjamin L. Wang , Patrick R. Webb , Howard G. Zolla
发明人： James Kruger , Benjamin L. Wang , Patrick R. Webb , Howard G. Zolla
IPC分类号： G11B5/31 , G11B5/127 , H04R31/00
CPC分类号： G11B5/1871 , G11B5/3116 , G11B5/3163 , Y10S29/016 , Y10T29/49032 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/49052 , Y10T428/1186 , Y10T428/24174 , Y10T428/24479 , Y10T428/2462
摘要： An article is formed as a substrate having a projection extending outwardly therefrom. The article may be a magnetic recording head and the projection a write pole. The projection has a width in a thinnest dimension measured parallel to a substrate surface of no more than about 0.3 micrometers and a height measured perpendicular to the substrate of not less than about 5 times the width. The article is fabricated by forming an overlying structure on the substrate with an edge thereon, depositing a replication layer lying on the edge, depositing a filler onto the edge and the substrate, so that the filler, the replication layer, and the overlying structure in combination comprise a continuous layer on the substrate, selectively removing at least a portion of the replication layer from a free surface of the continuous layer inwardly toward the substrate, to form a defined cavity, and depositing a projection material into the defined cavity to form the projection.
摘要翻译：形成具有从其向外延伸的突起的基底的制品。物品可以是磁记录头，并且投影是写柱。突起具有平行于衬底表面测量的最薄尺寸的宽度不大于约0.3微米，并且垂直于衬底测量的高度不小于宽度的约5倍。通过在其上具有边缘的衬底上形成覆盖结构来制造制品，沉积位于边缘上的复制层，在边缘和衬底上沉积填料，使得填料，复制层和上覆结构在组合包括在衬底上的连续层，选择性地将复制层的至少一部分从连续层的自由表面向内移动到衬底，以形成限定的空腔，并将突出材料沉积到限定的空腔中以形成投影。

2. 发明授权

US06859998B2 Method of fabricating a narrow projection such as a write pole extending from a substrate 失效
标题翻译：制造诸如从基板延伸的写极的窄突起的方法
公开(公告)号：US06859998B2
公开(公告)日：2005-03-01
申请号：US10121989
申请日：2002-04-12
申请人： James Kruger , Benjamin L. Wang , Patrick R. Webb , Howard G. Zolla
发明人： James Kruger , Benjamin L. Wang , Patrick R. Webb , Howard G. Zolla
IPC分类号： G11B5/187 , G11B5/31 , B44C1/22 , C23C14/04
CPC分类号： G11B5/1871 , G11B5/3116 , G11B5/3163 , Y10S29/016 , Y10T29/49032 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/49052 , Y10T428/1186 , Y10T428/24174 , Y10T428/24479 , Y10T428/2462
摘要： An article is formed as a substrate having a projection extending outwardly therefrom. The article may be a magnetic recording head and the projection a write pole. The projection has a width in a thinnest dimension measured parallel to a substrate surface of no more than about 0.3 micrometers and a height measured perpendicular to the substrate of not less than about 5 times the width. The article is fabricated by forming an overlying structure on the substrate with an edge thereon, depositing a replication layer lying on the edge, depositing a filler onto the edge and the substrate, so that the filler, the replication layer, and the overlying structure in combination comprise a continuous layer on the substrate, selectively removing at least a portion of the replication layer from a free surface of the continuous layer inwardly toward the substrate, to form a defined cavity, and depositing a projection material into the defined cavity to form the projection.
摘要翻译：形成具有从其向外延伸的突起的基底的制品。物品可以是磁记录头，并且投影是写柱。突起具有平行于衬底表面测量的最薄尺寸的宽度不大于约0.3微米，垂直于衬底的高度不小于宽度的约5倍。通过在其上具有边缘的衬底上形成覆盖结构来制造制品，沉积位于边缘上的复制层，在边缘和衬底上沉积填料，使得填料，复制层和上覆结构在组合包括在衬底上的连续层，选择性地将复制层的至少一部分从连续层的自由表面向内移动到衬底，以形成限定的空腔，并将突出材料沉积到限定的空腔中以形成投影。

3. 发明申请

US20050147793A1 Method of fabricating a narrow projection such as a write pole extending from a substrate 失效
公开(公告)号：US20050147793A1
公开(公告)日：2005-07-07
申请号：US11053632
申请日：2005-02-08
申请人： James Kruger , Benjamin Wang , Patrick Webb , Howard Zolla
发明人： James Kruger , Benjamin Wang , Patrick Webb , Howard Zolla
IPC分类号： G11B5/187 , G11B5/31 , G11B5/147 , B32B3/00 , B32B7/00
CPC分类号： G11B5/1871 , G11B5/3116 , G11B5/3163 , Y10S29/016 , Y10T29/49032 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/49052 , Y10T428/1186 , Y10T428/24174 , Y10T428/24479 , Y10T428/2462
摘要： An article is formed as a substrate having a projection extending outwardly therefrom. The article may be a magnetic recording head and the projection a write pole. The projection has a width in a thinnest dimension measured parallel to a substrate surface of no more than about 0.3 micrometers and a height measured perpendicular to the substrate of not less than about 5 times the width. The article is fabricated by forming an overlying structure on the substrate with an edge thereon, depositing a replication layer lying on the edge, depositing a filler onto the edge and the substrate, so that the filler, the replication layer, and the overlying structure in combination comprise a continuous layer on the substrate, selectively removing at least a portion of the replication layer from a free surface of the continuous layer inwardly toward the substrate, to form a defined cavity, and depositing a projection material into the defined cavity to form the projection.

4. 发明申请

US20050000935A1 Isotropic deposition for trench narrowing of features to be created by reactive ion etch processing 失效
标题翻译：通过反应离子蚀刻处理产生的特征的沟槽变窄的各向同性沉积
公开(公告)号：US20050000935A1
公开(公告)日：2005-01-06
申请号：US10898799
申请日：2004-07-26
申请人： Clinton Snyder , Howard Zolla , Hong Xu , James Kruger
发明人： Clinton Snyder , Howard Zolla , Hong Xu , James Kruger
IPC分类号： G11B5/31 , B44C1/22
CPC分类号： G11B5/3116 , G11B5/3163 , Y10T29/49032
摘要： An isotropic deposition method for trench narrowing of thin film magnetic write head features to be created by reactive ion etching. According to the method, a photolithographically defined photoresist trench is formed over a hardmask and underlying polymer layer as part of tri-layer resist process. Instead of performing the usual hardmask and polymer etching steps using the photoresist mask pattern, a spacer layer is deposited isotropically or directionally at an angle to cover the vertical side walls of the trench. The spacer layer is etchable by the hardmask etch process but resistant to the polymer etch process. When the hardmask etch process is performed, the spacer layer material applied to the trench side walls remains intact, thereby defining a narrowed trench that is extended by the subsequent base layer etch process.
摘要翻译：用于通过反应离子蚀刻产生的薄膜磁性写入头特征的沟槽变窄的各向同性沉积方法。根据该方法，作为三层抗蚀剂工艺的一部分，在硬掩模和下面的聚合物层上形成光刻定义的光致抗蚀剂沟槽。代替使用光致抗蚀剂掩模图案进行通常的硬掩模和聚合物蚀刻步骤，间隔层以一定角度各向同性地或定向地沉积以覆盖沟槽的垂直侧壁。间隔层可通过硬掩模蚀刻工艺蚀刻，但耐聚合物蚀刻工艺。当执行硬掩模蚀刻工艺时，施加到沟槽侧壁的间隔层材料保持完整，从而限定通过随后的基底层蚀刻工艺延伸的变窄的沟槽。

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