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    • 6. 发明授权
    • Semiconductor device and method of fabricating the same
    • 半导体装置及其制造方法
    • US08148193B2
    • 2012-04-03
    • US13236941
    • 2011-09-20
    • Jae-Hyun ParkJae-Hee Oh
    • Jae-Hyun ParkJae-Hee Oh
    • H01L21/00
    • H01L27/2409H01L45/06H01L45/1233H01L45/126H01L45/144H01L45/16
    • A semiconductor device such as a phase change memory device includes a semiconductor substrate including an active region, a conductive pattern disposed to expose the active region, an interlayer dielectric pattern provided on the conductive pattern and including an opening formed on the exposed active region and a contact hole spaced apart from the opening to expose the conductive pattern, a semiconductor pattern and a heater electrode pattern electrically connected to the exposed active region and provided in the opening, a contact plug connected to the exposed conductive pattern and provided to fill the contact hole, and a phase change material layer provided on the heater electrode pattern.
    • 诸如相变存储器件的半导体器件包括:半导体衬底,包括有源区,布置成暴露有源区的导电图案;设置在导电图案上的层间电介质图案,并且包括形成在暴露的有源区上的开口;以及 接触孔与开口间隔开以暴露导电图案,半导体图案和电连接到暴露的有源区并且设置在开口中的加热器电极图案,连接到暴露的导电图案并被提供以填充接触孔的接触插塞 以及设置在加热器电极图案上的相变材料层。
    • 10. 发明授权
    • Method of fabricating nonvolatile memory device
    • 制造非易失性存储器件的方法
    • US08030129B2
    • 2011-10-04
    • US12655047
    • 2009-12-21
    • Ji-Hyun JeongJae-Hee OhJae-Hyun Park
    • Ji-Hyun JeongJae-Hee OhJae-Hyun Park
    • H01L21/06
    • H01L27/24
    • A method of manufacturing a nonvolatile memory device including forming on a lower insulating layer a first sacrificial pattern having first openings extending in a first direction, forming a second sacrificial pattern having second openings extending in a second direction on the lower insulating layer and the first sacrificial pattern wherein the second openings intersect the first openings, etching the lower insulating layer using the first and second sacrificial patterns to form a lower insulating pattern having contact holes defined by a region where the first and second openings intersect each other, forming a bottom electrode in the contact holes, and forming a variable resistance pattern on the lower insulating pattern so that a portion of the variable resistance pattern connects to a top surface of the bottom electrode.
    • 一种制造非易失性存储器件的方法,包括在下绝缘层上形成第一牺牲图案,所述第一牺牲图案具有沿第一方向延伸的第一开口,形成第二牺牲图案,所述第二牺牲图案具有在所述下绝缘层上沿第二方向延伸的第二开口, 图案,其中所述第二开口与所述第一开口相交;使用所述第一和第二牺牲图案蚀刻所述下绝缘层,以形成具有由所述第一开口和所述第二开口相交的区域限定的接触孔的下绝缘图案,形成底部电极 接触孔,并且在下绝缘图案上形成可变电阻图案,使得可变电阻图案的一部分连接到底电极的顶表面。