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    • 5. 发明授权
    • Semiconductor light emitting device
    • 半导体发光器件
    • US08610162B2
    • 2013-12-17
    • US13286807
    • 2011-11-01
    • Seok Min HwangJae Yoon KimJin Bock Lee
    • Seok Min HwangJae Yoon KimJin Bock Lee
    • H01L33/00
    • H01L33/38H01L33/42H01L2933/0016
    • A semiconductor light emitting device includes: first and second conductive type semiconductor layers; an active layer disposed between the first and second conductive type semiconductor layers; and first and second electrodes disposed on one surface of each of the first and second conductive type semiconductor layers, respectively, wherein at least one of the first and second electrodes includes a pad part and a finger part formed to extend from the pad part, and the end of the finger part has an annular shape. Because a phenomenon in which current is concentrated in a partial area of the finger part is minimized, tolerance to electrostatic discharge (ESD) can be strengthened and light extraction efficiency can be improved.
    • 半导体发光器件包括:第一和第二导电类型半导体层; 设置在所述第一和第二导电类型半导体层之间的有源层; 以及分别设置在每个第一和第二导电类型半导体层的一个表面上的第一和第二电极,其中第一和第二电极中的至少一个包括衬垫部分和形成为从衬垫部分延伸的指状部分,以及 手指部分的端部具有环形形状。 由于电流集中在手指部分的部分区域的现象最小化,因此可以增强对静电放电(ESD)的耐受性,并且可以提高光提取效率。
    • 6. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING DEVICE
    • 半导体发光器件
    • US20120104444A1
    • 2012-05-03
    • US13286807
    • 2011-11-01
    • Seok Min HWANGJae Yoon KimJin Bock Lee
    • Seok Min HWANGJae Yoon KimJin Bock Lee
    • H01L33/60
    • H01L33/38H01L33/42H01L2933/0016
    • A semiconductor light emitting device includes: first and second conductive type semiconductor layers; an active layer disposed between the first and second conductive type semiconductor layers; and first and second electrodes disposed on one surface of each of the first and second conductive type semiconductor layers, respectively, wherein at least one of the first and second electrodes includes a pad part and a finger part formed to extend from the pad part, and the end of the finger part has an annular shape. Because a phenomenon in which current is concentrated in a partial area of the finger part is minimized, tolerance to electrostatic discharge (ESD) can be strengthened and light extraction efficiency can be improved.
    • 半导体发光器件包括:第一和第二导电类型半导体层; 设置在所述第一和第二导电类型半导体层之间的有源层; 以及分别设置在每个第一和第二导电类型半导体层的一个表面上的第一和第二电极,其中第一和第二电极中的至少一个包括衬垫部分和形成为从衬垫部分延伸的指状部分,以及 手指部分的端部具有环形形状。 由于电流集中在手指部分的部分区域的现象最小化,因此可以增强对静电放电(ESD)的耐受性,并且可以提高光提取效率。
    • 8. 发明申请
    • METHOD FOR MANUFACTURING A NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE AND NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE MANUFACTURED THEREBY
    • 用于制造氮化物半导体发光器件和制造的氮化物半导体发光器件的方法
    • US20140197374A1
    • 2014-07-17
    • US14239231
    • 2011-08-17
    • Seok Min HwangJin Bock LeeTae Sung JangJong Gun Woo
    • Seok Min HwangJin Bock LeeTae Sung JangJong Gun Woo
    • H01L33/40
    • H01L33/405H01L33/44H01L2933/0016
    • There is provided a method of manufacturing a nitride semiconductor light emitting device, the method including: forming a light emitting structure on a substrate, the light emitting structure including first and second conductivity-type nitride semiconductor layers with an active layer interposed therebetween; forming a first conductivity-type nitride semiconductor layer, an active layer and a second conductivity-type nitride semiconductor layer sequentially stacked on a substrate; forming a first electrode to be connected to the first conductivity-type nitride semiconductor layer; forming a photoresist film on the second conductivity-type nitride semiconductor layer to expose a portion of the second conductivity-type nitride semiconductor layer; and forming a reflective metal layer and a barrier metal layer as a second electrode consecutively on the portion of the second conductivity-type nitride semiconductor layer exposed by the photoresist film and removing the photoresist film.
    • 提供了一种制造氮化物半导体发光器件的方法,所述方法包括:在衬底上形成发光结构,所述发光结构包括介于其间的有源层的第一和第二导电型氮化物半导体层; 形成依次堆叠在基板上的第一导电型氮化物半导体层,有源层和第二导电型氮化物半导体层; 形成与第一导电型氮化物半导体层连接的第一电极; 在所述第二导电型氮化物半导体层上形成光致抗蚀剂膜以暴露所述第二导电型氮化物半导体层的一部分; 并且在由光致抗蚀剂膜暴露的第二导电型氮化物半导体层的部分上连续形成反射金属层和阻挡金属层作为第二电极,并除去光致抗蚀剂膜。