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    • 7. 发明授权
    • Predistortion linearizer for power amplifier
    • 功率放大器的预失真线性化
    • US06337599B2
    • 2002-01-08
    • US09750908
    • 2001-01-02
    • Jae Hyuk Lee
    • Jae Hyuk Lee
    • H03F126
    • H03F1/3288
    • The present invention relates to a predistortion linearizer for a power amplifier which is capable of improving nonlinear character of a high power amplifier. The predistortion linearizer for the power amplifier includes first and second envelope detectors, which separately detect an envelope of input signals and output signals, respectively, a DSP, which adjusts a tally of a work function by comparing the output signals of the first and the second envelope detector, and a work function generator, which generates a work function from an envelope of input signals to output gain and phase control voltage in accordance with work function tally inputted from the DSP. It also includes a vector modulator, which pre-distorts the input signal in accordance with the control voltages inputted from the work function generator to output a distortion compensation signal to the power amplifier.
    • 本发明涉及能够提高高功率放大器的非线性特性的功率放大器的预失真线性化装置。 用于功率放大器的预失真线性化器包括分别检测输入信号和输出信号的包络的第一和第二包络检测器,DSP,DSP通过比较第一和第二信号的输出信号来调整功函数 包络检测器和功函数发生器,其根据从DSP输入的功函数产生从输入信号的包络输出增益和相位控制电压的功函数。 它还包括矢量调制器,其根据从功函数发生器输入的控制电压对输入信号进行预失真以向失真补偿信号输出到功率放大器。
    • 10. 发明授权
    • Mask
    • 面具
    • US08551795B2
    • 2013-10-08
    • US13153482
    • 2011-06-06
    • Jae Hyuk LeeYoung Hoon Shin
    • Jae Hyuk LeeYoung Hoon Shin
    • H01L21/00
    • C23C16/042C23C16/50Y10T428/24479
    • Disclosed is a mask which can be used for forming a pattern on a substrate in a deposition apparatus, and a method for manufacturing a display device using the same. The mask includes a mask pattern and a frame. The mask has a tapered shape where the inner surface of the frame tapers in a direction from an upper end to a lower end. A thin film pattern is formed on a substrate using the mask pattern of the mask. The frame supports an outer of the mask pattern, and includes an inclined plane which tapers in an inner direction where the mask pattern is disposed.
    • 公开了可以用于在沉积设备中在基板上形成图案的掩模,以及使用该掩模的显示装置的制造方法。 掩模包括掩模图案和框架。 荫罩具有锥形,其中框架的内表面在从上端到下端的方向上逐渐变细。 使用掩模的掩模图案在基板上形成薄膜图案。 所述框架支撑所述掩模图案的外侧,并且包括在设置所述掩模图案的内部方向上逐渐变细的倾斜平面。