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1. 发明申请

US20070102664A1 Chemical mechanical polishing slurry compositions, methods of preparing the same and methods of using the same 有权
标题翻译：化学机械抛光浆料组合物，其制备方法及其使用方法
公开(公告)号：US20070102664A1
公开(公告)日：2007-05-10
申请号：US11591274
申请日：2006-11-01
申请人： Jae Choung , In Lee , Won Choi , Tae Lee , Ji Yang
发明人： Jae Choung , In Lee , Won Choi , Tae Lee , Ji Yang
IPC分类号： C09K13/00 , C03C15/00 , B44C1/22 , H01L21/461
CPC分类号： H01L21/3212 , C09K3/1463 , H01L21/31053
摘要： Provided herein are chemical mechanical polishing (CMP) slurries and methods for producing the same. Embodiments of the invention include CMP slurries that include (a) a metal oxide; (b) a quaternary ammonium base; and (c) a fluorinated surfactant. In some embodiments, the fluorinated surfactant is a non-ionic perfluoroalkyl sulfonyl compound. Also provided herein are methods of polishing a polycrystalline silicon surface, including providing a slurry composition according to an embodiment of the invention to a polycrystalline silicon surface and performing a CMP process to polish the polycrystalline silicon surface.
摘要翻译：本文提供了化学机械抛光（CMP）浆料及其制备方法。本发明的实施方案包括CMP浆料，其包括（a）金属氧化物; （b）季铵碱; 和（c）氟化表面活性剂。在一些实施方案中，氟化表面活性剂是非离子全氟烷基磺酰基化合物。本文还提供了抛光多晶硅表面的方法，包括将根据本发明的实施方案的浆料组合物提供给多晶硅表面，并执行CMP工艺以抛光多晶硅表面。

2. 发明申请

US20070101659A1 Chemical mechanical polishing slurry compositions, methods of preparing the same and methods of using the same 有权
标题翻译：化学机械抛光浆料组合物，其制备方法及其使用方法
公开(公告)号：US20070101659A1
公开(公告)日：2007-05-10
申请号：US11603808
申请日：2006-11-22
申请人： Jae Choung , In Lee
发明人： Jae Choung , In Lee
IPC分类号： B24D3/02
CPC分类号： C09G1/02 , B01J13/0034 , B01J13/0047
摘要： Provided herein are chemical mechanical polishing (CMP) slurries and methods for producing the same. Embodiments of the invention include CMP slurries that include (a) a metal oxide; (b) a pH-adjusting agent; (c) a fluorinated surfactant; and (d) a quaternary ammonium surfactant. In some embodiments, the fluorinated surfactant is a non-ionic perfluoroalkyl sulfonyl compound. Also provided herein are methods of polishing a polycrystalline silicon surface, including providing a slurry composition according to an embodiment of the invention to a polycrystalline silicon surface and performing a CMP process to polish the polycrystalline silicon surface.
摘要翻译：本文提供了化学机械抛光（CMP）浆料及其制备方法。本发明的实施方案包括CMP浆料，其包括（a）金属氧化物; （b）pH调节剂; （c）氟化表面活性剂; 和（d）季铵表面活性剂。在一些实施方案中，氟化表面活性剂是非离子全氟烷基磺酰基化合物。本文还提供了抛光多晶硅表面的方法，包括将根据本发明的实施方案的浆料组合物提供给多晶硅表面，并执行CMP工艺以抛光多晶硅表面。

3. 发明申请

US20060225230A1 Electric tooth brush with a latitudely oscillating brush head 失效
标题翻译：电动牙刷具有纬向振荡刷头
公开(公告)号：US20060225230A1
公开(公告)日：2006-10-12
申请号：US11100007
申请日：2005-04-07
申请人： Soo Choung , Jae Choung
发明人： Soo Choung , Jae Choung
IPC分类号： A61C17/22
CPC分类号： A61C17/3427
摘要： An electric motor driven toothbrush is provided. The brush head of the toothbrush of the current application oscillates latitude to the body of the toothbrush. One end of a specially designed shaft, with an annular portion developed at that end, is connected to an electric motor via gears. A replaceable brush is attached to the other end. The circular portion at one end of the shaft is an annular plate that has at least two protrusions developed perpendicular to the circular plane. The two protrusions may be in a rectangular form or arc form developed along the perimeter of the circular portion developed on the shaft. A circular plate attached, with a predetermined angle, to a gear that vertically penetrates the annular portion enables a latitude oscillation movement of the brush head. With the toothbrush of the current application, a user can automatically scrub his/her teeth longitudinally along the length.
摘要翻译：提供电动马达牙刷。当前应用的牙刷的刷头将纬度振荡到牙刷的身体。特殊设计的轴的一端，在该端形成有环形部，通过齿轮连接到电动马达。可更换的刷子连接到另一端。轴的一端的圆形部分是具有至少两个垂直于圆形平面展开的突起的环形板。两个突起可以是沿着在轴上展开的圆形部分的周边展开的矩形或弧形。以垂直方式穿过环形部分的齿轮以预定的角度安装的圆板能够使刷头的纬度振荡运动。使用当前应用的牙刷，用户可以沿着长度自动地纵向磨擦他/她的牙齿。

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