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1. 发明授权

US4545957A Analysis system for determining copper content in waste water 失效
标题翻译：测定废水中铜含量的分析系统
公开(公告)号：US4545957A
公开(公告)日：1985-10-08
申请号：US345924
申请日：1982-02-04
申请人： Jacky Vanhumbeeck , Laurent Danneels , Hubert De Steur , Guido Heyneman
发明人： Jacky Vanhumbeeck , Laurent Danneels , Hubert De Steur , Guido Heyneman
IPC分类号： G01N21/77 , G01N33/18 , G01N21/25
CPC分类号： G01N33/1813
摘要： An analysis system for determining total copper content in waste-water, as from a galvanizing system, comprises periodically taking samples from such waste-water, acidifying such samples with a metalliferous acid containing a metal which forms a strong cyanogen complex and which exhibits a larger electro-negative potential than copper, such as Pd, reducing cupric ions to cuprous ions, adjusting the pH of the resulting sample solution, adding a copper color-forming reagent, such as bathocuprione disulfonic acid salt, and determining the color content by colorimetry. In order to determine a reagent value, a prepared waste-water sample can be subjected to colorimetry before and after addition of the color-forming reagent.
摘要翻译：用于测定废水中的总铜含量的分析系统，如来自镀锌系统，包括周期性地从这种废水中取出样品，用含有形成强氰化合物的金属的含金酸酸化这样的样品，并显示较大的比铜的电 - 负电位，如Pd，将铜离子还原成亚铜离子，调节所得样品溶液的pH值，加入铜成色试剂如巴戟酸二磺酸盐，并通过比色法测定颜色含量。为了确定试剂值，可以在添加成色剂之前和之后对制备的废水样品进行比色法测定。

2. 发明授权

US4286965A Control apparatus for automatically maintaining bath component concentration in an electroless copper plating bath 失效
标题翻译：用于在无电镀铜浴中自动保持浴组分浓度的控制装置
公开(公告)号：US4286965A
公开(公告)日：1981-09-01
申请号：US125374
申请日：1980-02-28
申请人： Jacky Vanhumbeeck , Hubert De Steur , Guido Heyneman , Chris Vandenbossche
发明人： Jacky Vanhumbeeck , Hubert De Steur , Guido Heyneman , Chris Vandenbossche
IPC分类号： C23C18/40 , G01N27/26 , G01N27/416 , G01N31/16 , B05D3/12
CPC分类号： C23C18/405 , Y10T436/12
摘要： A control apparatus for automatically controlling at least the concentration of copper-ions, hydroxyl-ions and formaldehyde-ions in an electroless copper plating bath and independently analyzing, displaying and replenishing the concentration of each such ions whereby a sample for each of the ions is discontinuously removed from the plating bath and diluted with a specific amount of water and, independently of one another, the copper-ion concentration is colorimetrically analyzed, displayed and replenished as needed, the hydroxyl-ion concentration is potentiometrically analyzed, displayed and replenished as needed and the formaldehyde-ion concentration is amperometrically analyzed, displayed and replenished as needed.
摘要翻译：一种控制装置，用于至少自动控制化学镀铜浴中的铜离子，羟基离子和甲醛离子的浓度，并且独立地分析，显示和补充每个这样的离子的浓度，由此每个离子的样品是从电镀槽中不连续地除去并用特定量的水稀释，并且彼此独立地根据需要比色分析，显示和补充铜离子浓度，根据需要对羟基离子浓度进行电位分析，显示和补充并根据需要对甲醛离子浓度进行电渗分析，显示和补充。

3. 发明授权

US4055751A Process control system for the automatic analysis and regeneration of galvanic baths 失效
标题翻译：用于电镀浴自动分析和再生的过程控制系统
公开(公告)号：US4055751A
公开(公告)日：1977-10-25
申请号：US685804
申请日：1976-05-12
申请人： Egon Bussmann , Bruno Flamme , Jacky Vanhumbeeck , Johannes Helder , Hubert De Steur
发明人： Egon Bussmann , Bruno Flamme , Jacky Vanhumbeeck , Johannes Helder , Hubert De Steur
IPC分类号： C25B15/02 , C25D21/12 , C25D21/14 , G05D21/02 , G01N27/00 , G06F15/46
CPC分类号： G05D21/02 , C25D21/12 , C25D21/14
摘要： A process control system for metal depositing baths for monitoring the chemical composition of a bath liquid provides that, in the event of a deviation of a component of the bath liquid from a reference value, the bath liquid is regenerated by supplying correcting liquid to the bath. The system includes an automatically operating analyzer which is connected to a measured value adjusting device which, in dependence upon the difference established between a reference value and an actual value of the bath liquid component subject to analysis, controls the supply of the correcting liquid to the bath. A common process control system for a plurality of galvanic baths includes a main programmer, a bath selection programmer and analysis programmers which can be selectively connected by the selection programmer, and which in accordance with the individual components of the bath liquid which is to be analyzed, actuate specific analyzer sections of the analyzer where each measured value adjusting device which is connected to an analyzer section will, in the case of a difference in measured value, control the supply of the correct quantity of the specific correcting liquid to the particular bath which is subject to analysis.
摘要翻译：用于监测浴液的化学成分的用于金属沉积浴的过程控制系统提供了在浴液的组分偏离参考值的情况下，通过向浴中供应校正液来再生浴液。该系统包括连接到测量值调节装置的自动操作分析器，该测量值调节装置根据在参考值和待分析的浴液体的实际值之间建立的差异来控制向浴。用于多个电化浴的通用过程控制系统包括可由选择编程器选择性连接的主程序器，浴选择程序员和分析程序员，并且根据待分析的浴液的各个组分，启动分析仪的特定分析器部分，其中连接到分析器部分的每个测量值调节装置在测量值的差异的情况下，将特定校正液的正确量的供应控制到特定的浴，需要分析。

4. 发明授权

US4283142A Two beam alternating light colorimeter 失效
标题翻译：双光束交替光色度计
公开(公告)号：US4283142A
公开(公告)日：1981-08-11
申请号：US108461
申请日：1979-12-31
申请人： Hubert De Steur , Chris Vandenbossche , Guido Heyneman
发明人： Hubert De Steur , Chris Vandenbossche , Guido Heyneman
IPC分类号： G01N21/27 , G01J1/36 , G01J3/08 , G01J3/42
CPC分类号： G01J1/36
摘要： A two beam alternating light colorimeter is disclosed wherein a light beam passing through a lens system having a shutter is periodically deflected by a pivoting mirror. In a first non-deflecting position of the pivotable mirror a first measuring beam is created which passes through a first measuring cell and is guided to a common photo cell. In a second deflecting position of the mirror a second measuring beam is created which is guided through a second measuring cell to the same photo cell. Signals from the photo cell are connected through a controlled switching element to an analog memory. A computing circuit is provided which connects to an output of the analog memory and also to the photo cell. The switching element connects the first measuring signal to the analog memory when the mirror is in a non-deflecting position and opens when the mirror is in a deflecting position. The computing circuit compares the signals corresponding to the first and second measuring beams.
摘要翻译：公开了一种双光束交替光色度计，其中通过具有快门的透镜系统的光束由枢转反射镜周期性地偏转。在可枢转镜的第一非偏转位置中，产生通过第一测量池并被引导到公共光电池的第一测量光束。在反射镜的第二偏转位置中，产生第二测量光束，其被引导通过第二测量单元到相同的光电池。来自光电池的信号通过受控的开关元件连接到模拟存储器。提供了一种连接到模拟存储器的输出端以及光电池的计算电路。当反射镜处于非偏转位置时，开关元件将第一测量信号连接到模拟存储器，并且当反射镜处于偏转位置时打开。计算电路比较对应于第一和第二测量光束的信号。

5. 发明授权

US06639180B1 Method for describing a predetermined desired course with a beam consisting of particles or waves and use of this method 失效
标题翻译：用由粒子或波浪组成的光束描述预定的期望路线的方法和使用该方法
公开(公告)号：US06639180B1
公开(公告)日：2003-10-28
申请号：US10018381
申请日：2002-04-29
申请人： Hubert De Steur , Marcel Heerman
发明人： Hubert De Steur , Marcel Heerman
IPC分类号： B23K2600
CPC分类号： B23K26/08 , B23K26/082
摘要： The invention relates to a method for describing a predetermined desired course (1) with a beam of particles or waves, wherein a movable beam-directing device influences the direction of the beam, so that the latter describes an actual course (3, 4). The deviation of the actual course (3, 4) from the desired course due to inertia is minimized by specifying a corrected desired course (2), which describes diversions at the point of direction changes. The invention also relates to the use of this method for laser structuring or for writing guard plates or dial plates.
摘要翻译：本发明涉及一种用粒子或波束描述预定的期望路线（1）的方法，其中可移动的光束引导装置影响光束的方向，使得后者描述实际的光线（3,4）。通过指定校正的所需路线（2），实际路线（3,4）与惯性所期望的路线的偏差最小化，其中描述了方向改变点处的转向。本发明还涉及这种方法用于激光结构或书写防护板或表盘的用途。

6. 发明授权

US06485999B1 Wiring arrangements having electrically conductive cross connections and method for producing same 失效
标题翻译：具有导电交叉连接的接线装置及其制造方法
公开(公告)号：US06485999B1
公开(公告)日：2002-11-26
申请号：US09743568
申请日：2001-01-10
申请人： Luc Boone , Hubert De Steur , Marcel Heermann , Jozef Van Puymbroeck
发明人： Luc Boone , Hubert De Steur , Marcel Heermann , Jozef Van Puymbroeck
IPC分类号： H01L2150
CPC分类号： H01L21/4846 , B29L2031/3493 , H01L23/13 , H01L23/49811 , H01L24/48 , H01L2224/05599 , H01L2224/29007 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/85399 , H01L2924/00014 , H01L2924/01057 , H01L2924/01068 , H01L2924/01078 , H01L2924/01079 , H01L2924/12042 , H01L2924/14 , H01L2924/15159 , H01L2924/15311 , H01L2924/181 , H01L2924/3025 , H05K1/0284 , H05K3/027 , H05K3/3442 , H05K3/403 , H05K2201/09045 , H05K2201/09118 , H05K2201/09154 , H01L2924/00 , H01L2224/45015 , H01L2924/207 , H01L2224/45099
摘要： The invention relates to a method for producing interconnections with electrically conductive cross connections between the top and the bottom part of a substrate and interconnections having such cross connections. The substrate (S1) is given a slanted, roof-shaped or convex contour (K1) in the area of at least one front face and/or in the area of at least one inner wall of a recess. After metallizing the substrate (S1), printed-board conductor-shaped cross connections (Q) are produced in the area of the above-mentioned contours (K1) simultaneously with laser structuring of printed board conductors (L) on the top part (0) and the bottom part (U) of the substrate (S1).
摘要翻译：本发明涉及用于制造具有在基板的顶部和底部之间的导电交叉连接以及具有这种交叉连接的互连的互连的方法。衬底（S1）在凹部的至少一个前表面和/或至少一个内壁的区域中被赋予倾斜的屋顶形或凸形轮廓（K1）。在金属化基板（S1）之后，在顶部（0）上的印刷电路板导体（L）的激光结构同时，在上述轮廓（K1）的区域中产生印刷电路板导体形状的交叉连接（Q））和基板（S1）的底部（U）。

7. 发明授权

US06822191B2 Method for producing a trench structure in a polymer substrate 失效
标题翻译：在聚合物基材中制造沟槽结构的方法
公开(公告)号：US06822191B2
公开(公告)日：2004-11-23
申请号：US10378600
申请日：2003-03-05
申请人： Hubert De Steur , Stefan Lesjak , Wei Pan
发明人： Hubert De Steur , Stefan Lesjak , Wei Pan
IPC分类号： B23K2636
CPC分类号： B23K26/0661 , B23K26/066 , B23K26/18 , B23K26/389 , B23K2101/36 , B23K2103/42 , B23K2103/50 , H05K1/0219 , H05K1/0366 , H05K3/0032 , H05K3/0035 , H05K2201/0394 , H05K2201/09036 , H05K2201/09981 , H05K2203/0554 , H05K2203/108
摘要： In order to produce a trench structure having steep sidewalls free of residues in an, in particular, glass-fiber-reinforced substrate, the substrate is provided with a conformal mask having cutouts corresponding to the trench structure to be produced. In this case, the laser beam is guided over the cutouts of the mask in such a way that the low-energy edge regions of the laser beam are shielded and that proportion of the laser beam which impinges on the polymer surface, at each point, has an energy density above a threshold at which the substrate material including a glass fiber reinforcement that is possibly present is completely removed.
摘要翻译：为了在特别是玻璃纤维增强的基板中产生具有不含残留物的陡峭的侧壁的沟槽结构，衬底设置有具有对应于待生产的沟槽结构的切口的保形掩模。在这种情况下，激光束被引导到掩模的切口上，使得激光束的低能边缘区域被屏蔽，并且在每个点处撞击在聚合物表面上的激光束的比例，具有高于阈值的能量密度，其中包括可能存在的玻璃纤维增强材料的基底材料被完全去除。

8. 发明授权

US06713719B1 Method and device for laser drilling laminates 失效
标题翻译：激光钻孔层压板的方法和装置
公开(公告)号：US06713719B1
公开(公告)日：2004-03-30
申请号：US10089301
申请日：2002-03-29
申请人： Hubert De Steur , Marcel Heerman , Jozef Van Puymbroeck
发明人： Hubert De Steur , Marcel Heerman , Jozef Van Puymbroeck
IPC分类号： B23K2600
CPC分类号： H05K3/0038 , B23K26/40 , B23K2103/16 , B23K2103/30 , B23K2103/50 , H05K3/0055 , H05K2201/0112 , H05K2203/0195
摘要： A method and device for the laser drilling of laminates includes the use of a frequency-doubled Nd vanadate laser. The laser includes the following parameters: pulse width
摘要翻译：用于层压板的激光钻孔的方法和装置包括使用倍频Nd钒酸盐激光器。激光器包括以下参数：金属层的脉冲宽度<40ns，脉冲频率> = 30kHz，介电层的脉冲宽度> 20kHz，波长= 532nmn。这种激光器用于具有至少一个金属层和至少一个包括有机材料的介电层的层压板的激光钻孔。

9. 发明授权

US4301413A Circuit arrangement for amperometric titration 失效
标题翻译：电流滴定电路装置
公开(公告)号：US4301413A
公开(公告)日：1981-11-17
申请号：US121378
申请日：1980-02-14
申请人： Hubert De Steur
发明人： Hubert De Steur
IPC分类号： G01N27/26 , G01N27/416 , G01N27/49 , G01N31/16 , G01N27/42
CPC分类号： G01N27/49 , G01N31/164
摘要： A circuit arrangement is disclosed for determining the end point in an amperometric titration, in which the current between a working electrode and a counter electrode is measured as a function of the total volume of the titration agent added in volume units. The working electrode is operated with a constant polarization voltage with respect to a reference electrode and a closed-loop control is provided for holding the polarization voltage prescribed between the working electrode and the reference electrode at a constant. The prescribed rated value voltage is compared to the actual value voltage identified between the working electrode and the reference electrodes. The reference value voltage is prescribed with the assistance of a reference value generator, the actual value voltage is identified in a high resistance manner with the assistance of an impedance transformer and the reference value/actual value deviation is compensated by way of a summing integrator.
摘要翻译：公开了用于确定电流滴定中的终点的电路装置，其中测量作用电极和对电极之间的电流作为以体积单位加入的滴定剂的总体积的函数。工作电极相对于参考电极具有恒定的极化电压，并且提供闭环控制以将工作电极和参考电极之间规定的极化电压保持为常数。将规定的额定值电压与工作电极和参考电极之间确定的实际值电压进行比较。在参考值发生器的帮助下规定基准值电压，借助于阻抗变换器，以高电阻方式识别实际值电压，并且通过求和积分器补偿基准值/实际值偏差。

10. 发明授权

US4068677A Process control circuit for metal-depositing baths 失效
标题翻译：金属沉积池的过程控制电路
公开(公告)号：US4068677A
公开(公告)日：1978-01-17
申请号：US688784
申请日：1976-05-21
申请人： Hubert De Steur , Wolfgang Pernegger , Egon Bussmann
发明人： Hubert De Steur , Wolfgang Pernegger , Egon Bussmann
IPC分类号： G05B19/02 , C25D21/12 , G01N33/20 , G05B23/02 , G05D21/00 , G05D21/02 , G05D11/13 , C25B15/02 , C25D21/14
CPC分类号： G05D21/02 , C25D21/12 , Y10T137/2509
摘要： A process control circuit which is adapted for the control and monitoring of a plurality of parameters in one or more metal-depositing baths, has parameter control circuit blocks for each of the parameters to be measured. Each of the parameter control circuit blocks has a measuring stage for producing a measured value corresponding to one of the parameters, a calibration stage for calibrating the measuring stage, a comparison stage for comparing the measured value to a stored nominal value, and a dosing circuit which is connected to the comparator and which doses the metal-depositing bath in response to a comparison signal from the comparator.
摘要翻译：适用于控制和监测一个或多个金属沉积槽中的多个参数的过程控制电路具有用于要测量的每个参数的参数控制电路块。每个参数控制电路块具有用于产生对应于参数之一的测量值的测量级，用于校准测量级的校准级，用于将测量值与存储的标称值进行比较的比较级以及计量电路其连接到比较器，并且响应于来自比较器的比较信号而对金属沉积槽进行剂量。

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