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    • 1. 发明公开
    • PLASMA GENERATING APPARATUS USING MICROWAVE
    • PLASMAERZEUGUNGSVORRICHTUNG MIT MIKROWELLE
    • EP1347673A4
    • 2006-10-04
    • EP01997978
    • 2001-11-21
    • JAPAN SCIENCE & TECH CORP
    • NISHIDA YASUSHIITO HIROAKIYUGAMI NOBORU
    • H05H1/00H01J37/32H05H1/46
    • H01J37/32192H01J37/32266H01J37/32311H05H1/46
    • The present invention uses as a detector for adjustment measurement, monodyne interference between a microwave for plasma generation and the reflected wave. Analysis of the interference wave that is obtained using monodyne interference allows finding of the phase difference between the incident and the reflected wave and the amplitude of that reflected wave; and controlling of an excited microwave generation/ control system based on them allows impedance matching between the excited microwave and the plasma. This method allows very high precision phase detection, and calculation of the characteristics of the plasma based on the detected phase shift. Therefore, it is possible to distinguish noises even in the vicinity of the matched region.
    • 本发明用作调节测量的检测器,用于等离子体产生的微波与反射波之间的单相干涉。 使用单极干涉获得的干扰波的分析允许发现入射和反射波之间的相位差和该反射波的振幅; 并且基于它们控制激发的微波产生/控制系统允许激发的微波和等离子体之间的阻抗匹配。 该方法允许非常高精度的相位检测,并且基于检测到的相移来计算等离子体的特性。 因此,即使在匹配区域附近也可以区分噪声。