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    • 1. 发明授权
    • Coil and coil system for integration into a micro-electronic circuit and microelectronic circuit
    • 线圈和线圈系统集成到微电子电路和微电子电路中
    • US06717503B2
    • 2004-04-06
    • US10200422
    • 2002-07-22
    • Jörg BertholdDieter SewaldMarc Tiebout
    • Jörg BertholdDieter SewaldMarc Tiebout
    • H01F500
    • H01L23/522H01F17/0033H01F27/362H01L23/5227H01L2924/0002H01L2924/3011H01L2924/00
    • The coil and coil system is provided for integration in a microelecronic circuit. The coil is placed inside an oxide layer of a chip, and the oxide layer is placed on the substrate surface of a substrate. The coil comprises one or more windings, whereby the winding(s) is/are formed by at least segments of two conductor tracks, which are each provided in spatially spaced-apart metalization levels, and by via-contacts which connect these conductor track(s) and/or conductor track segments. In order to be able to produce high-quality coils, a coil is produced with the largest possible coil cross-section, whereby a standard metalization, especially a standard metalization using copper, can, however, be used for producing the oil. To this end, the via contacts are formed from a stack of two ore more via elements arranged one above the other. Parts of the metalization levels can be located between the via elements.
    • 线圈和线圈系统被提供用于集成在微电子电路中。 将线圈放置在芯片的氧化物层的内部,氧化物层被放置在基板的基板表面上。 线圈包括一个或多个绕组,由此绕组由两个导体轨道的至少一部分形成,每个导体轨道分别设置在空间上间隔开的金属化水平,以及通过连接这些导体轨迹的通孔接触 s)和/或导体轨道段。 为了能够生产高质量的线圈,制造线圈截面最大的线圈,由此可以使用标准金属化,特别是使用铜的标准金属化来生产油。 为此,通孔触点由一个彼此排列的两个以上的通孔元件的叠层形成。 金属化水平的一部分可以位于通孔元件之间。
    • 7. 发明授权
    • Integrated, tunable capacitance device
    • 集成可调电容器件
    • US07019384B2
    • 2006-03-28
    • US10678385
    • 2003-10-03
    • Judith MagetMarc Tiebout
    • Judith MagetMarc Tiebout
    • H01L29/93
    • H01L29/94H01L27/0808
    • An integrated, tunable capacitance device includes a semiconductor region, which is, preferably, N-doped, formed in a semiconductor body, having an insulating thick oxide region, which areally adjoins the main side of the semiconductor body, and having a thin oxide region, which, likewise, adjoins the main side and is disposed above the semiconductor region and also has a smaller layer thickness than the thick oxide region. A gate electrode is provided on the thin oxide region and terminal regions are provided in the semiconductor region. The capacitance described has a larger tuning range compared with transistor varactors. The integrated, tunable capacitance can be used, for example, in LC oscillators of integrated VCOs.
    • 集成的可调谐电容器件包括:半导体区域,优选地,N掺杂形成在半导体本体中,具有绝缘的厚氧化物区域,该半导体区域与半导体本体的主侧邻接并具有薄的氧化物区域 ,其同样邻接主侧并且设置在半导体区域的上方,并且还具有比厚氧化物区域更小的层厚度。 在薄氧化物区域上设置栅电极,在半导体区域设置端子区域。 与晶体管可变电抗器相比,所描述的电容具有较大的调谐范围。 集成的可调谐电容可用于例如集成VCO的LC振荡器。