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1. 发明授权

US5003219A Fixed construction for plate electrodes in a flat display unit 失效
标题翻译：平板显示单元中平板电极的固定结构
公开(公告)号：US5003219A
公开(公告)日：1991-03-26
申请号：US433494
申请日：1989-11-08
申请人： Isao Muragishi , Takashi Suzuki , Takashi Kanehisa , Makoto Inada
发明人： Isao Muragishi , Takashi Suzuki , Takashi Kanehisa , Makoto Inada
IPC分类号： H01J1/88 , H01J29/02 , H01J31/12
CPC分类号： H01J1/88 , H01J29/02 , H01J29/028 , H01J31/126 , H01J2329/863
摘要： A fixed construction for plate electrodes in a flat display unit, wherein holes provided along a common axis through a plurality of plate electrodes have a diameter smaller than that of a tapered insulating pin to be inserted therein, and the peripheral portions of the holes are formed in a thin or tapered construction, thereby supporting and fixing the plate electrodes in position without interposing a spacer and without causing deformation to the areas around the peripheries of the holes formed in the plate electrodes when insulating pins are fitted.
摘要翻译：平板显示单元中的平板电极的固定结构，其中通过多个平板电极沿公共轴设置的孔的直径小于插入其中的锥形绝缘销的直径，并且形成孔的周边部分以薄或锥形构造，从而将板电极支撑并固定在适当的位置，而不会插入间隔件，并且在安装绝缘销时不会对形成在板电极中的孔周围的区域造成变形。

2. 发明授权

US5129933A Method of joining flat-plate electrodes 失效
标题翻译：连接平板电极的方法
公开(公告)号：US5129933A
公开(公告)日：1992-07-14
申请号：US522045
申请日：1990-05-11
申请人： Isao Muragishi , Takashi Suzuki , Takashi Kanehisa , Tetuo Hori , Asao Iguchi
发明人： Isao Muragishi , Takashi Suzuki , Takashi Kanehisa , Tetuo Hori , Asao Iguchi
IPC分类号： B23K1/00 , C03C29/00 , H01J9/02 , H01J9/18
CPC分类号： C03C29/00 , Y10T29/49124
摘要： A method and apparatus for joining flat-plate electrodes wherein a spacer, to which a joining material such as a low-melting-point crystallized glass containing a crystallization promoting agent is applied, is interposed between the electrodes to be joined. The electrodes and spacer are placed and held between upper and lower attraction dies. The upper and lower attraction dies are placed between upper and lower heating blocks for heating and pressing the electrodes and spacer through the attraction dies to join the electrodes via molten joining material.
摘要翻译：一种用于接合平板电极的方法和装置，其中施加了诸如含有结晶促进剂的低熔点结晶玻璃之类的接合材料的间隔物插入在待接合的电极之间。电极和间隔件被放置并保持在上吸力模具和下吸力模具之间。上下吸引模具放置在上加热块和下加热块之间，用于加热和压迫电极和间隔件通过吸引模具，以通过熔融接合材料接合电极。

3. 发明授权

US5104343A Method for manufacturing flat display device 失效
标题翻译：制造平板显示装置的方法
公开(公告)号：US5104343A
公开(公告)日：1992-04-14
申请号：US603020
申请日：1990-10-26
申请人： Isao Muragishi , Takashi Suzuki , Takashi Kanehisa , Mitsunori Yokomakura , Tetsuo Hori
发明人： Isao Muragishi , Takashi Suzuki , Takashi Kanehisa , Mitsunori Yokomakura , Tetsuo Hori
IPC分类号： H01J9/02 , H01J9/18 , H01J29/02 , H01J31/12
CPC分类号： H01J31/126 , H01J29/028 , H01J9/185 , H01J2329/8625
摘要： A method is disclosed for manufacturing a flat display device including line cathodes arranged at regular intervals, a plurality of flat electrodes arranged so as to be spaced apart by a predetermined distance from one another to control line electron beams generated from the cathodes, and a fluorescent substance which emits a light as a result of a collision of the electron beam. The method includes the steps of: arranging a bar-shaped low-melting glass at a connecting position where the beam generated from the cathode does not pass through; positioning the electrodes and the glass against each other when the electrodes are fixed to connect to the glass; fixing initial connecting portions of the electrodes to the glass, each of which is located outside an outer frame of each electrode; heating and fusing the glass to connect it to the electrodes; and removing the initial connecting portions of the electrodes arranged outside the outer frames of the electrodes from the electrodes.
摘要翻译：公开了一种用于制造平面显示装置的方法，该平面显示装置包括以规则间隔布置的线阴极，多个扁平电极被布置成彼此间隔开预定距离以控制从阴极产生的线电子束，以及荧光作为电子束碰撞而发光的物质。该方法包括以下步骤：在由阴极产生的光束不通过的连接位置处布置条形低熔点玻璃; 当电极被固定以连接到玻璃时，将电极和玻璃彼此对准; 将电极的初始连接部分固定到玻璃上，每个玻璃位于每个电极的外框架外部; 加热和熔化玻璃以将其连接到电极; 并且从电极去除布置在电极的外框架外部的电极的初始连接部分。

4. 发明授权

US5167687A Method for laminating and bonding flat electrodes 失效
标题翻译：用于层压和接合平板电极的方法
公开(公告)号：US5167687A
公开(公告)日：1992-12-01
申请号：US643932
申请日：1991-01-22
申请人： Isao Muragishi , Takashi Kanehisa , Takashi Suzuki , Tetsuo Hori
发明人： Isao Muragishi , Takashi Kanehisa , Takashi Suzuki , Tetsuo Hori
IPC分类号： C03C27/10 , C03C29/00 , H01J9/02
CPC分类号： H01J9/02 , C03C27/10 , C03C29/00
摘要： According to the bonding method of flat electrodes of the present invention, a crystal glass material is arranged between electrodes, heated, and melted while the flat electrodes are pressured, and the melted crystal glass material is fused and re-crystallized to the surface of each flat electrode, so that the flat electrodes can be bonded with strong bonding force. Since a plate-like spacer or an application glass of a low melting point is not used in the method, disadvantages resulting from the spacer or the glass can be removed.

5. 发明申请

US20080257014A1 PARTIAL PRESSURE MEASURING METHOD AND PARTIAL PRESSURE MEASURING APPARATUS 有权
标题翻译：部分压力测量方法和部分压力测量装置
公开(公告)号：US20080257014A1
公开(公告)日：2008-10-23
申请号：US12103763
申请日：2008-04-16
申请人： Masahiro Yamamoto , Takeshi Koiwasaki , Hitoshi Yamanishi , Isao Muragishi , Mitsuhiro Yoshinaga
发明人： Masahiro Yamamoto , Takeshi Koiwasaki , Hitoshi Yamanishi , Isao Muragishi , Mitsuhiro Yoshinaga
IPC分类号： G01N7/00
CPC分类号： G01L11/02 , C23C14/0042 , H05H1/0037
摘要： Provided is a partial pressure measuring method and a partial pressure measuring apparatus by which a partial pressure distribution is easily measured in a vacuum chamber. The partial pressure measuring method and the partial pressure measuring apparatus includes: moving a local plasma source dedicated to partial pressure measuring provided in the vacuum chamber, to a location at which the measuring is to be performed; and measuring a partial pressure distribution in the vacuum chamber, by receiving emission of plasma generated by the local plasma source through a window which is formed in a wall part of the vacuum chamber and through which the emission passes, and thereby performing emission spectral analysis on intensity of the emission.
摘要翻译：提供了一种分压测量方法和分压测量装置，通过该分压测量方法在真空室中容易地测量分压。分压测量方法和分压测量装置包括：将专用于设置在真空室中的分压测量的局部等离子体源移动到要进行测量的位置; 并且通过接收由局部等离子体源产生的等离子体通过形成在真空室的壁部分中的窗口并发射通过的窗口来测量真空室中的分压分布，从而对发射强度。

6. 发明授权

US08349736B2 Semiconductor device manufacturing method and semiconductor device 有权
标题翻译：半导体器件制造方法和半导体器件
公开(公告)号：US08349736B2
公开(公告)日：2013-01-08
申请号：US13384015
申请日：2011-02-17
申请人： Isao Muragishi , Kai Takayuki , Saito Daishiro , Daisuke Yamamoto , Takeshi Koiwasaki
发明人： Isao Muragishi , Kai Takayuki , Saito Daishiro , Daisuke Yamamoto , Takeshi Koiwasaki
IPC分类号： H01L21/44
CPC分类号： H01L24/03 , H01L21/486 , H01L21/76852 , H01L21/76898 , H01L23/49827 , H01L24/05 , H01L24/13 , H01L2224/0401 , H01L2224/05001 , H01L2224/05022 , H01L2224/0554 , H01L2224/05555 , H01L2224/05567 , H01L2224/13021 , H01L2224/13022 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01014 , H01L2924/01019 , H01L2924/01022 , H01L2924/01029 , H01L2924/01033 , H01L2924/01078 , H01L2924/01079 , H01L2924/014 , H01L2924/351 , H01L2924/00014 , H01L2924/00
摘要： A base conductive member is formed on a surface and in a hole section of a substrate, and a resist is formed on a part of the base conductive member in which a conductive layer is not to be formed. The conductive layer is formed on a part except for the part in which the resist has been formed, and a mask metal is formed on the conductive layer. Then, the resist is removed, and the base conductive member is etched using the mask metal as a mask to form the conductive layer into a predetermined shape.
摘要翻译：在基板的表面和孔部形成有基底导电部件，并且在不形成导电层的基底导电部件的一部分上形成抗蚀剂。导电层形成在除了已经形成抗蚀剂的部分之外的部分上，并且在导电层上形成掩模金属。然后，除去抗蚀剂，并使用掩模金属作为掩模蚀刻基底导电部件，以形成预定形状的导电层。

7. 发明授权

US08016982B2 Sputtering apparatus and sputtering method 有权
标题翻译：溅射装置和溅射方法
公开(公告)号：US08016982B2
公开(公告)日：2011-09-13
申请号：US12272834
申请日：2008-11-18
申请人： Masahiro Yamamoto , Takeshi Koiwasaki , Isao Muragishi , Hitoshi Yamanishi
发明人： Masahiro Yamamoto , Takeshi Koiwasaki , Isao Muragishi , Hitoshi Yamanishi
IPC分类号： C23C14/00 , C23C14/32
CPC分类号： C23C14/35 , H01J37/3408 , H01J37/3452
摘要： The present invention is to provide a sputtering apparatus and a sputtering method, specifically, a magnetron sputtering apparatus having a magnetron electrode capable of generating plasma in a wide region near the surface of a target, and a sputtering method using the apparatus. Thereby, a magnetic field shape enabling to generate plasma in a wide region near the surface of a target is realized, the use efficiency of the target material is increased, and dusts and abnormal electric discharges may be prevented. Magnetic circuit 10 of a magnetron electrode is set as “magnetic circuit 10 in which center perpendicular magnet 101, inside parallel magnet 103, outside parallel magnet 104, and perimeter perpendicular magnet 102 are arranged” from the central part of target 2 toward the perimeter part, and inside parallel magnet 103 is brought close to target 2.
摘要翻译：本发明提供一种溅射装置和溅射方法，特别是具有能够在靶表面附近的宽范围内产生等离子体的磁控管电极的磁控管溅射装置和使用该装置的溅射方法。由此，能够实现能够在目标表面附近的宽范围内产生等离子体的磁场形状，能够提高目标材料的使用效率，并且可以防止灰尘和异常放电。将磁控管电极的磁路10设定为从目标2的中心部向周方向排列有“中心垂直磁铁101，内侧平行磁铁103，外侧平行磁铁104，外周垂直磁铁102”的磁路10 并且使内侧平行磁铁103靠近目标2。

8. 发明授权

US4635403A Edge rounding machine 失效
标题翻译：圆边机
公开(公告)号：US4635403A
公开(公告)日：1987-01-13
申请号：US743970
申请日：1985-06-12
申请人： Masashi Makino , Kunio Nakada , Isao Muragishi , Syozi Nishitani
发明人： Masashi Makino , Kunio Nakada , Isao Muragishi , Syozi Nishitani
IPC分类号： B24B9/00 , B24B21/00
CPC分类号： B24B9/00 , B24B21/002
摘要： An edge rounding machine for performing edge rounding of an outer edge portion of a machining face of a workpiece such as a floppy disk head, etc., including a cylindrical rotary member having, at its outer periphery, cutting edges, a holder for supporting the workpiece such that the machining face of the workpiece is brought into contact, at the outer edge portion, with a grinding face of the cylindrical rotary member at an angle, a rotary device for rotating the workpiece about its rotary centerline perpendicular to the machining face, a pivotal device for pivoting the workpiece, a support member for retractably guiding the holder along the rotary centerline of the workpiece, and an urging device for urging the workpiece towards the grinding face.
摘要翻译：一种用于对诸如软盘头等的工件的加工面的外边缘部分进行边缘圆化的边缘圆形机，其包括圆柱形旋转部件，该圆柱形旋转部件的外周具有切削刃，用于支撑工件，使得工件的加工面在外缘部处与圆筒形旋转构件的研磨面成一角度地旋转，用于使工件绕其旋转中心线垂直于加工面旋转，用于枢转工件的枢转装置，用于沿着工件的旋转中心线可伸缩地引导保持器的支撑构件，以及用于将工件推向研磨面的施力装置。

9. 发明申请

US20120115323A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE 有权
标题翻译：半导体器件制造方法和半导体器件
公开(公告)号：US20120115323A1
公开(公告)日：2012-05-10
申请号：US13384015
申请日：2011-02-17
申请人： Isao Muragishi , Takayuki Kai , Daishiro Saito , Daisuke Yamamoto , Takeshi Koiwasaki
发明人： Isao Muragishi , Takayuki Kai , Daishiro Saito , Daisuke Yamamoto , Takeshi Koiwasaki
IPC分类号： H01L21/768
CPC分类号： H01L24/03 , H01L21/486 , H01L21/76852 , H01L21/76898 , H01L23/49827 , H01L24/05 , H01L24/13 , H01L2224/0401 , H01L2224/05001 , H01L2224/05022 , H01L2224/0554 , H01L2224/05555 , H01L2224/05567 , H01L2224/13021 , H01L2224/13022 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01014 , H01L2924/01019 , H01L2924/01022 , H01L2924/01029 , H01L2924/01033 , H01L2924/01078 , H01L2924/01079 , H01L2924/014 , H01L2924/351 , H01L2924/00014 , H01L2924/00
摘要： A base conductive member is formed on a surface and in a hole section of a substrate, and a resist is formed on a part of the base conductive member in which a conductive layer is not to be formed. The conductive layer is formed on a part except for the part in which the resist has been formed, and a mask metal is formed on the conductive layer. Then, the resist is removed, and the base conductive member is etched using the mask metal as a mask to form the conductive layer into a predetermined shape.
摘要翻译：在基板的表面和孔部形成有基底导电部件，并且在不形成导电层的基底导电部件的一部分上形成抗蚀剂。导电层形成在除了已经形成抗蚀剂的部分之外的部分上，并且在导电层上形成掩模金属。然后，除去抗蚀剂，并使用掩模金属作为掩模蚀刻基底导电部件，以形成预定形状的导电层。

10. 发明授权

US07814796B2 Partial pressure measuring method and partial pressure measuring apparatus 有权
标题翻译：部分压力测量方法和分压测量仪器
公开(公告)号：US07814796B2
公开(公告)日：2010-10-19
申请号：US12103763
申请日：2008-04-16
申请人： Masahiro Yamamoto , Takeshi Koiwasaki , Hitoshi Yamanishi , Isao Muragishi , Mitsuhiro Yoshinaga
发明人： Masahiro Yamamoto , Takeshi Koiwasaki , Hitoshi Yamanishi , Isao Muragishi , Mitsuhiro Yoshinaga
IPC分类号： G01L9/00
CPC分类号： G01L11/02 , C23C14/0042 , H05H1/0037
摘要： Provided is a partial pressure measuring method and a partial pressure measuring apparatus by which a partial pressure distribution is easily measured in a vacuum chamber. The partial pressure measuring method and the partial pressure measuring apparatus includes: moving a local plasma source dedicated to partial pressure measuring provided in the vacuum chamber, to a location at which the measuring is to be performed; and measuring a partial pressure distribution in the vacuum chamber, by receiving emission of plasma generated by the local plasma source through a window which is formed in a wall part of the vacuum chamber and through which the emission passes, and thereby performing emission spectral analysis on intensity of the emission.
摘要翻译：提供了一种分压测量方法和分压测量装置，通过该分压测量方法在真空室中容易地测量分压。分压测量方法和分压测量装置包括：将专用于设置在真空室中的分压测量的局部等离子体源移动到要进行测量的位置; 并且通过接收由局部等离子体源产生的等离子体通过形成在真空室的壁部分中的窗口并发射通过的窗口来测量真空室中的分压分布，从而对发射强度。

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