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    • 1. 发明专利
    • Semiconductor device having drift region and drift control region
    • 具有DRIFT区域和DRIFT控制区域的半导体器件
    • JP2012182463A
    • 2012-09-20
    • JP2012085846
    • 2012-04-04
    • Infineon Technologies Austria Agインフィネオン テクノロジーズ オーストリア アクチエンゲゼルシャフト
    • FRANK FIRSCHANTON MAUDERHANS-JOACHIM SCHULZESTEFAN SEDLMAIERARMIN WILLMEROTHZUNDEL MARKUSHIRLER FRANZMITTAL ALLUNYAI
    • H01L29/78H01L21/336H01L27/04H01L29/06H01L29/47H01L29/739H01L29/872
    • H01L29/872
    • PROBLEM TO BE SOLVED: To provide a power semiconductor device having a drift path or a drift region with low on-resistance.SOLUTION: A semiconductor device comprises: a drift region 2 of a first conductivity type in a semiconductor base material; a drift control region 3 that is disposed adjacent to the drift region 2 in the semiconductor base material and is composed of a semiconductor material; an accumulation dielectric 4 disposed between the drift region 2 and the drift control region 3; a base-material region 8; a drain region 5 that is isolated from the base-material region 8 and is adjacent to the accumulation dielectric 4; a source region 9 isolated from the drift region 2 by the base-material region 8; a gate electrode 15 insulated from the semiconductor base material by a gate dielectric 16, and extending from the source region 9 to the drift region 2 adjacently to the base-material region 8; a drain electrode 11 contacting the drain region 5; and a semiconductor region 27 complementarily doped to the drain region 5. The semiconductor region 27 is disposed between the drain electrode 11 and the drift region 2 and is adjacent to the drain electrode 11.
    • 要解决的问题:提供具有低导通电阻的漂移路径或漂移区域的功率半导体器件。 解决方案:半导体器件包括:半导体基底材料中的第一导电类型的漂移区域2; 漂移控制区域3,其设置在半导体基材中与漂移区域2相邻并且由半导体材料构成; 布置在漂移区域2和漂移控制区域3之间的积聚电介质4; 基材区域8; 与基材区域8隔离并与蓄电介质4相邻的漏极区域5; 通过基材区域8与漂移区域2隔离的源极区域9; 栅电极15,通过栅极电介质16与半导体基底材料绝缘,并且从源极区域9延伸到与基底材料区域8相邻的漂移区域2; 与漏区5接触的漏电极11; 半导体区域27配置在漏极电极11和漂移区域2之间,并与漏电极11相邻。版权所有:(C)2012,JPO&INPIT