专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20080116067A1 PHYSICAL VAPOR DEPOSITION CHAMBER HAVING AN ADJUSTABLE TARGET 审中-公开
标题翻译：具有可调节目标的物理蒸气沉积室
公开(公告)号：US20080116067A1
公开(公告)日：2008-05-22
申请号：US11950881
申请日：2007-12-05
申请人： Ilya Lavitsky , Michael Rosenstein , Goichi Yoshidome , Hougong Wang , Zhendong Liu , Mengqi Ye
发明人： Ilya Lavitsky , Michael Rosenstein , Goichi Yoshidome , Hougong Wang , Zhendong Liu , Mengqi Ye
IPC分类号： C23C14/34
CPC分类号： H01J37/3408 , C23C14/35 , C23C14/352 , C23C14/564 , H01J37/32568 , H01J37/32733 , H01J37/3455
摘要： The invention relates to physical vapor deposition (PVD) chambers having a rotatable substrate pedestal and at least one moveable tilted target. Embodiments of the invention facilitate deposition of highly uniform thin films.
摘要翻译：本发明涉及具有可旋转衬底基座和至少一个可移动倾斜目标的物理气相沉积（PVD）室。本发明的实施方案有利于沉积高度均匀的薄膜。

2. 发明申请

US20060096857A1 Physical vapor deposition chamber having a rotatable substrate pedestal 审中-公开
标题翻译：物理气相沉积室具有可旋转的基板基座
公开(公告)号：US20060096857A1
公开(公告)日：2006-05-11
申请号：US10984265
申请日：2004-11-08
申请人： Ilya Lavitsky , Michael Rosenstein , Goichi Yoshidome , Hougong Wang , Zhendong Liu , Mengqi Ye
发明人： Ilya Lavitsky , Michael Rosenstein , Goichi Yoshidome , Hougong Wang , Zhendong Liu , Mengqi Ye
IPC分类号： C23C14/00
CPC分类号： H01J37/3408 , C23C14/35 , C23C14/352 , C23C14/564 , H01J37/32568 , H01J37/32733 , H01J37/3455
摘要： The invention relates to physical vapor deposition (PVD) chambers having a rotatable substrate pedestal. Embodiments of the invention facilitate deposition of highly uniform thin films. In further embodiments, one or more sputtering targets are movably disposed above the pedestal. The orientation of the targets relative to the pedestal may be adjusted laterally, vertically or angularly. In one embodiment, the target may be adjusted between angles of about 0 to 45 degreees relative to an axis of pedestal rotation.
摘要翻译：本发明涉及具有可转动的基板底座的物理气相沉积（PVD）室。本发明的实施方案有利于沉积高度均匀的薄膜。在另外的实施例中，一个或多个溅射靶可移动地设置在基座上方。目标相对于基座的取向可以横向，垂直或有角度地调整。在一个实施例中，可以相对于基座旋转轴线在约0至45度的角度之间调整目标。

3. 发明申请

US20060096851A1 Physical vapor deposition chamber having an adjustable target 审中-公开
标题翻译：具有可调目标的物理气相沉积室
公开(公告)号：US20060096851A1
公开(公告)日：2006-05-11
申请号：US10984291
申请日：2004-11-08
申请人： Ilya Lavitsky , Michael Rosenstein , Goichi Yoshidome , Hougong Wang , Zhendong Liu , Mengqi Ye
发明人： Ilya Lavitsky , Michael Rosenstein , Goichi Yoshidome , Hougong Wang , Zhendong Liu , Mengqi Ye
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： H01J37/3408 , C23C14/35 , C23C14/352 , C23C14/564 , H01J37/32568 , H01J37/32733 , H01J37/3455
摘要： The invention relates to physical vapor deposition (PVD) chambers having a rotatable substrate pedestal and at least one moveable tilted target. Embodiments of the invention facilitate deposition of highly uniform thin films.
摘要翻译：本发明涉及具有可旋转衬底基座和至少一个可移动倾斜目标的物理气相沉积（PVD）室。本发明的实施方案有利于沉积高度均匀的薄膜。

4. 发明授权

US07884032B2 Thin film deposition 有权
标题翻译：薄膜沉积
公开(公告)号：US07884032B2
公开(公告)日：2011-02-08
申请号：US11260899
申请日：2005-10-28
申请人： Mengqi Ye , Peijun Ding , Hougong Wang , Zhendong Liu
发明人： Mengqi Ye , Peijun Ding , Hougong Wang , Zhendong Liu
IPC分类号： H01L21/469
CPC分类号： H01L21/02046 , C23C14/345 , C23C14/35 , H01L21/28017 , H01L21/2855
摘要： A system, method and apparatus is capable of producing layers of various materials stacked on one another on a substrate without exposing the substrate to the pressure and contaminants of ambient air until the stack is complete. In one aspect, the stack of layers can include both an insulative layer of one or more insulative films, and a conductive metal layer of one or more conductive metal layer films. In another aspect, a bias signal of positive and negative voltage pulses may be applied to a target of a deposition chamber to facilitate deposition of the target material in a suitable fashion. In yet another aspect, one or more of the deposition chambers may have associated therewith a pump which combines a turbomolecular pump and a cryogenic pump to generate an ultra high vacuum in that chamber. Other features are described and claimed.
摘要翻译：一种系统，方法和装置能够在衬底上彼此层叠各种材料层，而不会使衬底暴露于周围空气的压力和污染物直到堆叠完成。在一个方面，层叠层可以包括一个或多个绝缘膜的绝缘层和一个或多个导电金属层膜的导电金属层。在另一方面，可以将正电压脉冲和负电压脉冲的偏置信号施加到沉积室的靶，以便以合适的方式沉积目标材料。在另一方面，一个或多个沉积室可以具有与其结合的泵，其将涡轮分子泵和低温泵组合以在该室中产生超高真空。描述和要求保护其他特征。

5. 发明申请

US20070099438A1 Thin film deposition 有权
标题翻译：薄膜沉积
公开(公告)号：US20070099438A1
公开(公告)日：2007-05-03
申请号：US11260899
申请日：2005-10-28
申请人： Mengqi Ye , Peijun Ding , Hougong Wang , Zhendong Liu
发明人： Mengqi Ye , Peijun Ding , Hougong Wang , Zhendong Liu
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/02046 , C23C14/345 , C23C14/35 , H01L21/28017 , H01L21/2855
摘要： A system, method and apparatus is capable of producing layers of various materials stacked on one another on a substrate without exposing the substrate to the pressure and contaminants of ambient air until the stack is complete. In one aspect, the stack of layers can include both an insulative layer of one or more insulative films, and a conductive metal layer of one or more conductive metal layer films. In another aspect, a bias signal of positive and negative voltage pulses may be applied to a target of a deposition chamber to facilitate deposition of the target material in a suitable fashion. In yet another aspect, one or more of the deposition chambers may have associated therewith a pump which combines a turbomolecular pump and a cryogenic pump to generate an ultra high vacuum in that chamber. Other features are described and claimed.
摘要翻译：一种系统，方法和装置能够在衬底上彼此层叠各种材料层，而不会使衬底暴露于环境空气的压力和污染物直到堆叠完成。在一个方面，层叠层可以包括一个或多个绝缘膜的绝缘层和一个或多个导电金属层膜的导电金属层。在另一方面，可以将正电压脉冲和负电压脉冲的偏置信号施加到沉积室的靶，以便以合适的方式沉积目标材料。在另一方面，一个或多个沉积室可以具有与其结合的泵，其将涡轮分子泵和低温泵组合以在该室中产生超高真空。描述和要求保护其他特征。

6. 发明授权

US08454804B2 Protective offset sputtering 失效
公开(公告)号：US08454804B2
公开(公告)日：2013-06-04
申请号：US11262193
申请日：2005-10-28
申请人： Mengqi Ye , Zhendong Liu , Peijun Ding
发明人： Mengqi Ye , Zhendong Liu , Peijun Ding
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , C23C14/225 , C23C14/505 , H01J37/3408 , H01J37/3423 , H01J37/3455
摘要： Sputtering in a physical vapor deposition (PVD) chamber may, in one embodiment, utilize a target laterally offset from and tilted with respect to the substrate. In another aspect, target power may be reduced to enhance film protection. In yet another aspect, magnetron magnets may be relatively strong and well balanced to enhance film protection. In another aspect, a shutter may be provided to protect the substrate in start up conditions. Other embodiments are described and claimed.

7. 发明申请

US20070095650A1 Protective offset sputtering 失效
标题翻译：保护性偏移溅射
公开(公告)号：US20070095650A1
公开(公告)日：2007-05-03
申请号：US11262193
申请日：2005-10-28
申请人： Mengqi Ye , Zhendong Liu , Peijun Ding
发明人： Mengqi Ye , Zhendong Liu , Peijun Ding
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/35 , C23C14/225 , C23C14/505 , H01J37/3408 , H01J37/3423 , H01J37/3455
摘要： Sputtering in a physical vapor deposition (PVD) chamber may, in one embodiment, utilize a target laterally offset from and tilted with respect to the substrate. In another aspect, target power may be reduced to enhance film protection. In yet another aspect, magnetron magnets may be relatively strong and well balanced to enhance film protection. In another aspect, a shutter may be provided to protect the substrate in start up conditions. Other embodiments are described and claimed.
摘要翻译：在一个实施例中，在物理气相沉积（PVD）室中的溅射可以利用相对于衬底的横向偏移和倾斜的目标。另一方面，可以减小目标功率以增强膜保护。在另一方面，磁控管磁体可以相对较强并且平衡良好以增强膜保护。在另一方面，可以提供快门以在启动条件下保护基板。描述和要求保护其他实施例。

8. 发明授权

US08460519B2 Protective offset sputtering 失效
标题翻译：保护性偏移溅射
公开(公告)号：US08460519B2
公开(公告)日：2013-06-11
申请号：US11389610
申请日：2006-03-23
申请人： Mengqi Ye , Zhendong Liu , Peijun Ding
发明人： Mengqi Ye , Zhendong Liu , Peijun Ding
IPC分类号： C23C14/35
CPC分类号： H01L21/67011 , C23C14/225 , C23C14/35 , C23C14/505 , H01J37/3408 , H01J37/3423 , H01J37/3455
摘要： Sputtering in a physical vapor deposition (PVD) chamber may, in one embodiment, utilize a target laterally offset from and tilted with respect to the substrate. In another aspect, target power may be reduced to enhance film protection. In yet another aspect, magnetron magnets may be relatively strong and well balanced to enhance film protection. In another aspect, a shutter may be provided to protect the substrate in start up conditions. Other embodiments are described and claimed.
摘要翻译：在一个实施例中，在物理气相沉积（PVD）室中的溅射可以利用相对于衬底的横向偏移和倾斜的目标。另一方面，可以减小目标功率以增强膜保护。在另一方面，磁控管磁体可以相对较强并且平衡良好以增强膜保护。在另一方面，可以提供快门以在启动条件下保护基板。描述和要求保护其他实施例。

9. 发明申请

US20070095651A1 Protective offset sputtering 失效
公开(公告)号：US20070095651A1
公开(公告)日：2007-05-03
申请号：US11389610
申请日：2006-03-23
申请人： Mengqi Ye , Zhendong Liu , Peijun Ding
发明人： Mengqi Ye , Zhendong Liu , Peijun Ding
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： H01L21/67011 , C23C14/225 , C23C14/35 , C23C14/505 , H01J37/3408 , H01J37/3423 , H01J37/3455
摘要： Sputtering in a physical vapor deposition (PVD) chamber may, in one embodiment, utilize a target laterally offset from and tilted with respect to the substrate. In another aspect, target power may be reduced to enhance film protection. In yet another aspect, magnetron magnets may be relatively strong and well balanced to enhance film protection. In another aspect, a shutter may be provided to protect the substrate in start up conditions. Other embodiments are described and claimed.

10. 发明申请

US20120036637A1 Rotating Bed to Reduce the Risk of Developing Pressure Ulcers 审中-公开
标题翻译：旋转床减少发展压力性溃疡的风险
公开(公告)号：US20120036637A1
公开(公告)日：2012-02-16
申请号：US12855949
申请日：2010-08-13
申请人： Hougong Wang , Zhendong Liu
发明人： Hougong Wang , Zhendong Liu
IPC分类号： A61G7/005 , A61G7/008
CPC分类号： A61G7/0573
摘要： Bed-bound patients are at risk for developing pressure ulcers after lying in the same position on a standard home/hospital bed for an extended period of time. In order to prevent pressure ulcers, patients' bodies need to be repositioned at certain time intervals by other personnel. This involves labor-intensive care, and the friction and shear forces during assisted turning often causes skin damage. The rotating bed enables bed-bound patients to reposition their body easily and frequently, thereby reducing external forces such as shearing forces and friction caused by assisted turning, and most importantly reducing the risk of developing pressure ulcers.
摘要翻译：卧床患者在标准家庭/医院病床上躺在相同位置上有长时间的压力性溃疡风险。为了防止压力性溃疡，患者的身体需要由其他人员以一定的时间间隔进行重新定位。这涉及劳动密集型护理，辅助转弯期间的摩擦力和剪切力通常会导致皮肤损伤。旋转床使得床位患者能够容易地和频繁地重新定位身体，从而减少由辅助转动引起的剪切力和摩擦力等外力，最重要的是降低发生压力性溃疡的风险。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式