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1. 发明授权

US08991463B2 Film peeling apparatus and film peeling method using the same 有权
标题翻译：薄膜剥离装置及使用其的薄膜剥离方法
公开(公告)号：US08991463B2
公开(公告)日：2015-03-31
申请号：US13760228
申请日：2013-02-06
申请人： Il-Young Jeong , Gyoo-Wan Han , Jeong-Hun Woo
发明人： Il-Young Jeong , Gyoo-Wan Han , Jeong-Hun Woo
IPC分类号： B32B38/10 , B32B43/00 , B29C63/00
CPC分类号： B32B43/006 , B29C63/0013 , B32B2457/20 , Y10T156/11 , Y10T156/1132 , Y10T156/1174 , Y10T156/1179 , Y10T156/1189 , Y10T156/1944 , Y10T156/195 , Y10T156/1972 , Y10T156/1983
摘要： A film peeling apparatus includes a peeling pin that push-lifts a first end portion of a cut portion of a film toward a second end portion of the cut portion, a peeling roller that push-lifts the second end portion of the cut portion toward the first end portion of the cut portion by closely contacting the second end portion of the cut portion and rotating, and an absorbing unit that absorbs and removes the cut portion of the film push-lifted by the peeling pin and peeling roller.
摘要翻译：薄膜剥离装置包括剥离销，其将薄膜的切割部分的第一端部向切割部分的第二端部提升;剥离辊，其将切割部分的第二端部朝着通过紧密接触切割部分的第二端部并旋转，切割部分的第一端部和吸收单元，其吸收并移除由剥离销和剥离辊推动的膜的切割部分。

2. 发明授权

US6037100A Dry film photoresist 有权
标题翻译：干膜光刻胶
公开(公告)号：US6037100A
公开(公告)日：2000-03-14
申请号：US161948
申请日：1998-09-29
申请人： Jae-Ok Yu , Hyoun-Souk Choi , Il-Young Jeong , Byeong-Il Lee , Kie-Jin Park
发明人： Jae-Ok Yu , Hyoun-Souk Choi , Il-Young Jeong , Byeong-Il Lee , Kie-Jin Park
IPC分类号： G03F7/004 , G03F7/027 , G03F7/09 , G03F7/11 , G03C1/76
CPC分类号： G03F7/09 , G03F7/092
摘要： The present invention relates to a dry film photoresist comprising the steps of:preparing a photosensitive polymer prepared containing an acrylylic copolymer as a binder polymer, to which is added are a photopolymerizing monomer, photoinitiator, a photosensitive agent, color former, plasticizer and thermal stabilizer; drying the photosensitive polymer coated on a polyethylene terephthalate support in a predetermined thickness; andlaminating a polyethylene terephthalate film with a certain surface property in a protective manner.Since the dry film photoresist of this invention is used for the manufacture of a printed circuit boards and lead frames and employs a polyethylene terephthalate film having excellent surface properties, any problems such as air admixture generated from the process may be avoided, unlike prior technologies using polyethylene film as a cover film, thus reducing significantly the defect rate of a final product.
摘要翻译：本发明涉及一种干膜光致抗蚀剂，包括以下步骤：制备含有丙烯共聚物作为粘合剂聚合物的光敏聚合物，其中加入光聚合单体，光引发剂，感光剂，成色剂，增塑剂和热稳定剂 ; 将涂覆在聚对苯二甲酸乙二醇酯载体上的感光聚合物干燥成预定厚度; 并以保护的方式层压具有一定表面性质的聚对苯二甲酸乙二醇酯膜。由于本发明的干膜光致抗蚀剂用于制造印刷电路板和引线框架，并且采用具有优异表面性能的聚对苯二甲酸乙二醇酯膜，可以避免任何问题，例如从该方法产生的空气混合物，与使用聚乙烯膜作为覆盖膜，从而显着降低最终产品的缺陷率。

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