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    • 10. 发明授权
    • Positive-type photoresist composition
    • 正型光致抗蚀剂组合物
    • US08623585B2
    • 2014-01-07
    • US13884788
    • 2011-10-25
    • Tomoyuki ImadaTakakazu KageNorifumi Imaizumi
    • Tomoyuki ImadaTakakazu KageNorifumi Imaizumi
    • G03F7/004G03F7/032C08L61/06C08G8/28
    • G03F7/004C08G8/04C08G8/20C08L61/12G03F7/0236
    • Provided is a positive photoresist composition containing, as an essential component, a novolac phenolic resin (C) prepared by condensing an aromatic compound (A) represented by general formula (1) or (2) with an aliphatic aldehyde (B). This positive photoresist composition has high sensitivity and high heat resistance at the same time, and is suitable for use as a positive photoresist in, for example, the manufacture of semiconductor devices such as ICs and LSIs, the manufacture of displays such as LCDs, and the manufacture of printing plates. (In the formulas, R1, R2, and R3 are each independently an alkyl group having 1 to 8 carbon atoms; m, n, and p are each independently an integer of 0 to 4; q is an integer of 1 to (5−p); and s is an integer of 1 to (9−p).)
    • 提供一种正型光致抗蚀剂组合物,其含有通过将通式(1)或(2)表示的芳族化合物(A)与脂肪族醛(B)缩合制备的酚醛清漆型酚醛树脂(C)作为必要成分。 该正性光致抗蚀剂组合物同时具有高灵敏度和高耐热性,并且适合用作例如IC和LSI等半导体器件的制造中的正性光致抗蚀剂,LCD等显示器的制造和 印版的制造。 (式中,R 1,R 2,R 3各自独立地表示碳原子数1〜8的烷基,m,n,p分别为0〜4的整数,q为1〜 p); s为1〜(9-p)的整数。)