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1. 发明申请

US20070247937A1 INFORMATION PROCESSING SYSTEM FOR CALCULATING THE NUMBER OF REDUNDANT LINES OPTIMAL FOR MEMORY DEVICE 审中-公开
标题翻译：用于计算存储器件最佳冗余线数量的信息处理系统
公开(公告)号：US20070247937A1
公开(公告)日：2007-10-25
申请号：US11736435
申请日：2007-04-17
申请人： Ichiro Moriyama , Seiji Ishikawa
发明人： Ichiro Moriyama , Seiji Ishikawa
IPC分类号： G11C29/00
CPC分类号： G11C29/56 , G11C29/56008 , G11C29/72
摘要： An information processing system of the invention has a database in which test results for a plurality of memory devices mounted on a wafer are stored and a computer for analyzing the test results. The computer includes a data retrieval section for retrieving a test result from the database; and a required redundant line quantity calculation section for determining the total number of redundant lines which is required for recovering failed bits of the memory device based on the test results, deciding how the required total number of redundant lines should be assigned in each of the row and column directions, and calculating the total number of redundant lines required for recovery and the number of redundant lines assigned in each of the row and columns directions on the memory device, and the computer displays a result of calculation by the required redundant line quantity calculation section.
摘要翻译：本发明的信息处理系统具有数据库，其中存储安装在晶片上的多个存储器件的测试结果和用于分析测试结果的计算机。计算机包括用于从数据库检索测试结果的数据检索部分; 以及所需的冗余线路量计算部分，用于基于测试结果来确定用于恢复存储器件的故障比特所需的冗余线路的总数，决定如何在每行中分配所需的冗余线路总数和列方向，以及计算恢复所需的冗余线路总数和在存储设备上的行和列方向中的每一个方向上分配的冗余线路数量，并且计算机根据所需的冗余线路数量计算显示计算结果部分。

2. 发明申请

US20050185172A1 Surface inspection apparatus and method thereof 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US20050185172A1
公开(公告)日：2005-08-25
申请号：US11104621
申请日：2005-04-13
申请人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01B11/30 , G01B11/24 , G01B11/245 , G01N21/95 , G01N21/956 , G06T1/00 , H01L21/66 , G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： A surface inspection apparatus and a method for inspecting the surface of a sample are capable of inspecting discriminatingly between scratches of various configuration and adhered foreign objects that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to a polishing process such as CMP or a grinding process, in semiconductor manufacturing process or magnetic head manufacturing process. In the invention, the scratch and foreign object that occur on the polished or ground surface of the sample is epi-illuminated and slant-illuminated by use of approximately same light flux, the difference between the scattered light intensity from the shallow scratch and from the foreign object is applied to thereby discriminate between the shallow scratch and the foreign object, and the directionality of the scattered light is detected to discriminate between the linear scratch and the foreign object.
摘要翻译：表面检查装置和检查样品表面的方法能够在工作目标（例如，工件的表面上的绝缘膜）上区别地检查在工作目标表面上发生的各种构造和附着异物的划痕半导体衬底）在半导体制造工艺或磁头制造工艺中进行诸如CMP或研磨工艺的抛光工艺。在本发明中，通过使用大致相同的光通量，在样品的抛光或地面上发生的划痕和异物被表面照射和倾斜照射，来自浅划痕的散射光强度与来自应用异物，从而区分浅刮痕和异物，并且检测散射光的方向性以区分线状划痕和异物。

3. 发明授权

US08729514B2 Surface inspection apparatus and method thereof 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US08729514B2
公开(公告)日：2014-05-20
申请号：US13114160
申请日：2011-05-24
申请人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.
摘要翻译：一种缺陷检查装置，包括：第一照明光学系统，被配置为从相对于所述样品表面的法线方向或近似的方向照射样品表面上的检查区域; 第二照明光学系统，被配置为相对于所述样品表面从倾斜方向照射所述检查区域; 检测光学系统，具有分别相对于所述第二照明光学系统的照明方向位于所述检查区域的所述检查区域的前方和后方的多个第一检测器，并且其中所述规则反射光从所述样品表面通过所述第二照明光学系统的照明光分量不会收敛; 以及信号处理系统，其被配置为基于从所述多个第一检测器获得的信号来检查缺陷。

4. 发明授权

US06894302B2 Surface inspection apparatus and method thereof 失效
标题翻译：表面检查装置及其方法
公开(公告)号：US06894302B2
公开(公告)日：2005-05-17
申请号：US09791742
申请日：2001-02-26
申请人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01B11/30 , G01B11/24 , G01B11/245 , G01N21/95 , G01N21/956 , G06T1/00 , H01L21/66 , G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： The invention provides a surface inspection apparatus and a method for inspecting the surface of a sample that are capable of inspecting discriminatingly between the scratch of various configuration and the adhered foreign object that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to polishing process such as CMP or grinding process in semiconductor manufacturing process or magnetic head manufacturing process. In the invention, the scratch and foreign object that occur on the polished or ground surface of the sample is epi-illuminated and slant-illuminated by use of approximately same light flux, the difference between the scattered light intensity emitted from the shallow scratch and that from the foreign object when epi-illumination is applied and slant illumination is applied to thereby discriminate between the shallow scratch and the foreign object, and the directionality of the scattered light when the epi-illumination is applied and the slant illumination is applied is detected to thereby discriminate between the linear scratch and the foreign object.
摘要翻译：本发明提供了一种表面检查装置和用于检查样品表面的方法，所述表面检查装置和检查方法能够区分各种构型的刮擦和在作业目标（例如，工件）上发生在工作目标表面上的被粘附的异物之间的差异，半导体衬底上的绝缘膜）在半导体制造工艺或磁头制造工艺中进行诸如CMP或研磨工艺的抛光工艺。在本发明中，通过使用大致相同的光通量，在样品的抛光面或地面上发生的划痕和异物被表面照射和倾斜照射，从浅划痕发射的散射光强度与当外加照明被施加并且倾斜照明被施加以从而区分浅刮伤和异物时，并且当施加外露照明并施加倾斜照明时散射光的方向性被检测到从而区分线状刮痕和异物。

5. 发明申请

US20090103078A1 SURFACE INSPECTION APPARATUS AND METHOD THEREOF 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US20090103078A1
公开(公告)日：2009-04-23
申请号：US12196647
申请日：2008-08-22
申请人： Ichiro ISHIMARU , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro ISHIMARU , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/00 , G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： An apparatus for detecting defects, including: a table unit which mounts a specimen to be inspected having a linearly moving stage and a rotationally moving stage; a first illumination optical unit which illuminates an inspection region of a surface of the specimen from a normal direction or in the vicinity of the normal direction while the specimen is rotating by the rotationally moving stage and moving in one direction by the linearly moving stage; a second illumination optical unit which illuminates the inspection region from a first elevation angle toward the inspection region while the specimen is rotating and moving; a first detection optical unit which detects light reflected from the inspection region by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors arranged in plural portions of a second elevation angle toward the inspection region; a second detection optical unit which detects light reflected from the inspection region by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors arranged in plural portions of a third elevation angle toward the inspection region; and a signal processor which processes signals outputted from the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit, wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals which are selected from the signals outputted from the plural detectors arranged in plural portions of the second elevation angle and the plural detectors arranged in plural portions of the third elevation angle.
摘要翻译：一种用于检测缺陷的装置，包括：安装具有线性移动台和旋转移动台的待检查样本的台单元; 第一照明光学单元，其在通过旋转移动台旋转并通过线性移动台在一个方向上移动时，从正常方向或法线附近照射样本的表面的检查区域; 第二照明光学单元，其在所述检体旋转移动的同时，将所述检查区域从所述检查区域向第一仰角照射; 第一检测光学单元，其通过第一照明光学单元或第二照明光学单元的照明来检测从检查区域反射的光，多个检测器以检查区域的第二仰角的多个部分布置; 第二检测光学单元，其通过第一照明光学单元或第二照明光学单元的照射来检测从检查区域反射的光，多个检测器布置成朝向检查区域的第三仰角的多个部分; 以及处理从第一检测光学单元的多个检测器和第二检测光学单元的多个检测器输出的信号的信号处理器，其中第一检测光学单元的多个检测器和第二检测光学单元的多个检测器是光电倍增管，并且信号处理器处理从布置在第二仰角的多个部分的多个检测器输出的信号中选择的信号和布置在第三仰角的多个部分中的多个检测器。

6. 发明授权

US07417244B2 Surface inspection apparatus and method thereof 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US07417244B2
公开(公告)日：2008-08-26
申请号：US11657455
申请日：2007-01-25
申请人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： An apparatus for detecting defects, including: a first illumination optical unit which illuminates from a normal direction or in the vicinity of the normal direction; a second illumination optical unit which illuminates from a first elevation angle; a first detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; a second detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals outputted from the photomultipliers and are adjusted to balance in sensitivities.
摘要翻译：一种用于检测缺陷的装置，包括：第一照明光学单元，其从法向方向或附近照射; 第二照明光学单元，其从第一仰角照亮; 第一检测光学单元，其利用多个检测器检测由第一照明光学单元或第二照明光学单元的照明反射的光; 第二检测光学单元，其利用多个检测器检测由第一照明光学单元或第二照明光学单元的照明反射的光; 其中第一检测光学单元的多个检测器和第二检测光学单元的多个检测器是光电倍增管，并且信号处理器处理从光电倍增管输出的信号，并调整其灵敏度的平衡。

7. 发明申请

US20070121108A1 Surface inspection apparatus and method thereof 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US20070121108A1
公开(公告)日：2007-05-31
申请号：US11657455
申请日：2007-01-25
申请人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/00 , G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： An apparatus for detecting defects, including: a first illumination optical unit which illuminates from a normal direction or in the vicinity of the normal direction; a second illumination optical unit which illuminates from a first elevation angle; a first detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; a second detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals outputted from the photomultipliers and are adjusted to balance in sensitivities.
摘要翻译：一种用于检测缺陷的装置，包括：第一照明光学单元，其从法向方向或附近照射; 第二照明光学单元，其从第一仰角照亮; 第一检测光学单元，其利用多个检测器检测由第一照明光学单元或第二照明光学单元的照明反射的光; 第二检测光学单元，其利用多个检测器检测由第一照明光学单元或第二照明光学单元的照明反射的光; 其中第一检测光学单元的多个检测器和第二检测光学单元的多个检测器是光电倍增管，并且信号处理器处理从光电倍增管输出的信号，并调整其灵敏度的平衡。

8. 发明申请

US20120069329A1 SURFACE INSPECTION APPARATUS AND METHOD THEREOF 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US20120069329A1
公开(公告)日：2012-03-22
申请号：US13114160
申请日：2011-05-24
申请人： Ichiro ISHIMARU , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro ISHIMARU , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.
摘要翻译：一种缺陷检查装置，包括：第一照明光学系统，被配置为从相对于所述样品表面的法线方向或近似的方向照射样品表面上的检查区域; 第二照明光学系统，被配置为相对于所述样品表面从倾斜方向照射所述检查区域; 检测光学系统，具有分别相对于所述第二照明光学系统的照明方向位于所述检查区域的所述检查区域的前方和后方的多个第一检测器，并且其中所述规则反射光从所述样品表面通过所述第二照明光学系统的照明光分量不会收敛; 以及信号处理系统，其被配置为基于从所述多个第一检测器获得的信号来检查缺陷。

9. 发明授权

US07952085B2 Surface inspection apparatus and method thereof 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US07952085B2
公开(公告)日：2011-05-31
申请号：US12196647
申请日：2008-08-22
申请人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： The invention provides a surface inspection apparatus and a method for inspecting the surface of a sample that are capable of inspecting discriminatingly between the scratch of various configuration and the adhered foreign object that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to polishing process such as CMP or grinding process in semiconductor manufacturing process or magnetic head manufacturing process.
摘要翻译：本发明提供了一种表面检查装置和用于检查样品表面的方法，所述表面检查装置和检查方法能够区分各种构型的刮擦和在作业目标（例如，工件）上发生在工作目标表面上的被粘附的异物之间的差异，半导体衬底上的绝缘膜）在半导体制造工艺或磁头制造工艺中进行诸如CMP或研磨工艺的抛光工艺。

10. 发明授权

US07242016B2 Surface inspection apparatus and method thereof 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US07242016B2
公开(公告)日：2007-07-10
申请号：US11104621
申请日：2005-04-13
申请人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： A surface inspection apparatus and a method for inspecting the surface of a sample are capable of inspecting discriminatingly between scratches of various configuration and adhered foreign objects that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to a polishing process such as CMP or a grinding process, in semiconductor manufacturing process or magnetic head manufacturing process. In the invention, the scratch and foreign object that occur on the polished or ground surface of the sample is epi-illuminated and slant-illuminated by use of approximately same light flux, the difference between the scattered light intensity from the shallow scratch and from the foreign object is applied to thereby discriminate between the shallow scratch and the foreign object, and the directionality of the scattered light is detected to discriminate between the linear scratch and the foreign object.
摘要翻译：表面检查装置和检查样品表面的方法能够在工作目标（例如，工件的表面上的绝缘膜）上区别地检查在工作目标表面上发生的各种构造和附着异物的划痕半导体衬底）在半导体制造工艺或磁头制造工艺中进行诸如CMP或研磨工艺的抛光工艺。在本发明中，通过使用大致相同的光通量，在样品的抛光或地面上发生的划痕和异物被表面照射和倾斜照射，来自浅划痕的散射光强度与来自应用异物，从而区分浅刮痕和异物，并且检测散射光的方向性以区分线状划痕和异物。

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