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    • 6. 发明授权
    • Exposure apparatus, method of manufacturing semiconductor devices and plant therefor
    • 曝光装置,半导体装置的制造方法及其制造方法
    • US06795161B2
    • 2004-09-21
    • US09811419
    • 2001-03-20
    • Masaya OguraEiichi MurakamiNobuaki Ogushi
    • Masaya OguraEiichi MurakamiNobuaki Ogushi
    • G03B2752
    • G03F7/70883
    • An exposure apparatus having an illuminating optics unit for irradiating a reticle, on which a predetermined pattern has been formed, with exposing light emitted from an exposure light source, a reticle stage on which the reticle is placed, a projection optics unit for projecting the predetermined pattern of the reticle onto a substrate, and a substrate stage on which the substrate is placed. The apparatus includes at least one chamber for internally accommodating the illuminating optics unit, the reticle stage, the projection optics unit and the substrate stage, a first pressure control device for making a value of pressure inside the at least one chamber higher than a value of pressure outside the at least one chamber, and a first correction device for correcting optical characteristics of the projection optics unit, by performing at least one of (i) moving an adjustment unit for adjusting the optical characteristics of the projection optics unit and (ii) shifting a wavelength of the exposing light, in accordance with the value of the pressure inside the at least one chamber.
    • 一种曝光装置,具有照射光学单元,用于对已经形成预定图案的掩模版进行曝光,曝光从曝光光源发射的光,其上放置有掩模版的标线片台,投影光学单元, 掩模版到基板上的图案,以及放置基板的基板台。 该装置包括用于内部容纳照明光学单元,标线片台,投影光学单元和基板台的至少一个室,用于使至少一个室内的压力值高于第一压力控制装置的值的第一压力控制装置 以及第一校正装置,用于通过执行(i)移动用于调整投影光学单元的光学特性的调节单元和(ii)至少一个腔室的光学特性的调整单元中的至少一个来校正投影光学单元的光学特性; 根据至少一个室内的压力值移动曝光光的波长。