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1. 发明申请

WO2008049844A1 HIGH RESOLUTION IMAGING PROCESS USING AN IN-SITU IMAGE MODIFYING LAYER 审中-公开
标题翻译：使用原位图像修改层的高分辨率成像处理
公开(公告)号：WO2008049844A1
公开(公告)日：2008-05-02
申请号：PCT/EP2007/061360
申请日：2007-10-23
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM UNITED KINGDOM LIMITED , AZPIROZ, Jaione, Tirapu , HUANG, Wu-Song , LAWSON, Margaret , PATEL, Kaushal
发明人： AZPIROZ, Jaione, Tirapu , HUANG, Wu-Song , LAWSON, Margaret , PATEL, Kaushal
IPC分类号： G03F7/095 , G03F1/10
CPC分类号： G03F7/095 , G03F1/56 , G03F7/70466
摘要： A method of forming a patterned material layer on a substrate. A photoresist layer is formed on the substrate followed by an image modifying material formed on the photoresist. The image modifying material is patterned to form an image modifying pattern. The image modifying pattern and underlying photoresist are then exposed to suitable radiation. The image modifying pattern modifies the image intensity within the photoresist layer beneath the image modifying pattern. The resulting pattern is then transferred into the substrate.
摘要翻译：一种在衬底上形成图案化材料层的方法。在基底上形成光致抗蚀剂层，随后在光致抗蚀剂上形成图像改性材料。图像修改材料被图案化以形成图像修改图案。然后将图像改变图案和下面的光致抗蚀剂暴露于合适的辐射。图像修改图案修改图像修改图案下面的光致抗蚀剂层内的图像强度。然后将得到的图案转移到基底中。

2. 发明申请

WO2010080796A1 EFFICIENT ISOTROPIC MODELING APPROACH TO INCORPORATE ELECTROMAGNETIC EFFECTS INTO LITHOGRAPHIC PROCESS SIMULATIONS 审中-公开
标题翻译：将电磁效应纳入光刻过程模拟的有效的等效建模方法
公开(公告)号：WO2010080796A1
公开(公告)日：2010-07-15
申请号：PCT/US2010/020209
申请日：2010-01-06
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , AZPIROZ, Jaione, Tirapu , ROSENBLUTH, Alan, E. , GRAUR, Ioana, C.
发明人： AZPIROZ, Jaione, Tirapu , ROSENBLUTH, Alan, E. , GRAUR, Ioana, C.
IPC分类号： G06F17/50 , G03F1/00
CPC分类号： G03F7/70441 , G03F1/36 , G03F7/705
摘要： The present invention relates to the modeling of lithographic processes for use in the design of photomasks for the manufacture of semiconductor integrated circuits, and particularly to the modeling of the complex effects due to interaction of the illuminating light with the mask topography. According to the invention, an isofield perturbation to a thin mask representation of the mask is provided by determining, for the components of the illumination, differences between the electric field on a feature edge having finite thickness and on the corresponding feature edge of a thin mask representation. An isofield perturbation is obtained from a weighted coherent combination of the differences for each illumination polarization. The electric field of a mask having topographic edges is represented by combining a thin mask representation with the isofield perturbation applied to each edge of the mask.
摘要翻译：本发明涉及用于制造半导体集成电路的光掩模的设计中使用的光刻工艺的建模，特别涉及由于照明光与掩模形貌的相互作用引起的复杂效应的建模。根据本发明，通过确定对于照明的组件，具有有限厚度的特征边缘上的电场与薄掩模的相应特征边缘之间的差异来确定对掩模的薄掩模表示的异场扰动表示。从每个照明偏振的差异的加权相干组合获得异场扰动。通过将薄掩模表示与施加到掩模的每个边缘的异场扰动组合来表示具有形貌边缘的掩模的电场。

3. 发明申请

WO2017175083A1 PARTICLE MANIPULATION AND TRAPPING IN MICROFLUIDIC DEVICES USING TWO-DIMENSIONAL MATERIAL 审中-公开
标题翻译：用二维材料微流控装置中的粒子操纵和捕捉
公开(公告)号：WO2017175083A1
公开(公告)日：2017-10-12
申请号：PCT/IB2017/051555
申请日：2017-03-17
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM UNITED KINGDOM LIMITED , IBM (CHINA) INVESTMENT COMPANY LIMITED
发明人： AZPIROZ, Jaione, Tirapu , STEINER, Mathias, Bernhard , ENGEL, Michael
IPC分类号： B01D57/02
摘要： Method, apparatus, and computer program product for a microfluidic channel having a cover opposite its bottom and having electrodes with patterned two-dimensional conducting materials, such as graphene sheets integrated into the top of its bottom. Using the two- dimensional conducting materials, once a fluid sample is applied into the channel, highly localized modulated electric field distributions are generated inside the channel and the fluid sample. This generated field causes the inducing of dielectrophoretic (DEP) forces. These DEP forces are the same or greater than DEP forces that would result using metallic electrodes because of the sharp edges enabled by the two-dimension geometry of the two- dimensional conducting materials. Because of the induced forces,micro/nano-particles in the fluid sample are separated into particles that respond to a negative DEP force and particles that respond to a positive DEP. Microfluidic chips with microfluidic channels can be made using standard semiconductor manufacturing technology.
摘要翻译：用于微流体通道的方法，装置和计算机程序产品具有与其底部相反的盖，并且具有带有图案化的二维导电材料的电极，例如集成在其底部顶部的石墨烯片。使用二维导电材料，一旦将流体样品施加到通道中，就会在通道和流体样品内部产生高度局部化的调制电场分布。这个产生的场导致介电泳（DEP）力的诱导。这些DEP力与使用金属电极产生的DEP力相同或更大，这是因为二维导电材料的二维几何形状使得锐利的边缘成为可能。由于诱导力，流体样品中的微/纳米颗粒被分离成响应负DEP力的颗粒和响应正DEP的颗粒。具有微流体通道的微流控芯片可以使用标准的半导体制造技术制造。

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