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    • 2. 发明申请
    • SYSTEMS, METHODS, AND APPARATUSES FOR IMPLEMENTING A THERMAL SOLUTION FOR 3D PACKAGING
    • 用于实现3D包装的热解决方案的系统,方法和装置
    • WO2017171889A1
    • 2017-10-05
    • PCT/US2016/025779
    • 2016-04-02
    • INTEL CORPORATION
    • MUTHUR SRINATH, Purushotham KaushikMALATKAR, PramodAGRAHARAM, SairamJHA, Chandra M.CHOUDHURY, ArnabRARAVIKAR, Nachiket R.
    • H01L23/12H01L23/48
    • In accordance with disclosed embodiments, there are provided methods, systems, and apparatuses for implementing a thermal solution for 3D packaging. For instance, in accordance with one embodiment, there is an apparatus having therein: a substrate layer having electrical traces therein; a first layer functional silicon die electrically interfaced to the electrical traces of the substrate layer, the first layer functional silicon die having a first thermal pad integrated thereupon; a second layer functional silicon die positioned above the first layer functional silicon die, the second layer functional silicon die having a second thermal pad integrated thereupon; and a conductivity layer positioned between the first layer functional silicon die and the second layer functional silicon die, wherein the conductivity layer is to: (i) electrically join the second layer functional silicon die to the first layer functional silicon die and (ii) bond the first thermal pad of the first layer functional silicon die to the second thermal pad of the second layer functional silicon die via solder. Other related embodiments are disclosed.
    • 根据所公开的实施例,提供了用于实现3D封装的热解决方案的方法,系统和设备。 例如,根据一个实施例,存在一种设备,其中具有:其中具有电迹线的衬底层; 与所述衬底层的电迹线电接合的第一层功能硅芯片,所述第一层功能硅芯片具有集成在其上的第一热衬垫; 位于所述第一层功能硅晶粒上方的第二层功能硅晶粒,所述第二层功能硅晶粒具有集成于其上的第二导热垫; 以及位于所述第一层功能硅管芯和所述第二层功能硅管芯之间的导电层,其中所述导电层用于:(i)将所述第二层功能硅管芯电连接到所述第一层功能硅管芯和(ii) 第一层功能硅的第一导热焊盘通过焊料与第二层功能硅芯片的第二导热焊盘相接合。 披露了其他相关的实施例。
    • 4. 发明申请
    • THERMAL MANAGEMENT SOLUTIONS FOR MICROELECTRONIC DEVICES USING JUMPING DROPS VAPOR CHAMBERS
    • 微型电子设备的热管理解决方案使用跳槽式蒸汽灭菌器
    • WO2017052848A1
    • 2017-03-30
    • PCT/US2016/047314
    • 2016-08-17
    • INTEL CORPORATION
    • EID, FerasCHOUDHURY, Arnab
    • H01L23/46H01L23/427H01L23/367
    • H01L23/427H01L21/4878H01L21/4882H01L23/3675H01L23/373H01L23/433H01L25/0652H01L2224/16225H01L2224/73253
    • A thermal management solution may be provided for a microelectronic system, wherein a jumping drops vapor chamber is utilized between at least one microelectronic device and an integrated heat spreader. The microelectronic system may comprise a microelectronic device attached by an active surface thereof to a microelectronic substrate. The integrated heat spreader, having a first surface and an opposing second surface, is also attached to the microelectronic substrate with a jumping drops vapor chamber disposed between a back surface of the microelectronic device and the integrated heat spreader second surface. The jumping drops vapor chamber may comprise a vapor space defined by a hydrophilic evaporation surface on the microelectronic device back surface, a hydrophobic condensation surface on the integrated heat spreader second surface, and at least one sidewall extending between the hydrophilic evaporation surface and the hydrophobic condensation surface with a working fluid disposed within the vapor space.
    • 可以为微电子系统提供热管理解决方案,其中在至少一个微电子器件和集成散热器之间利用跳跃液滴蒸气室。 微电子系统可以包括通过其有源表面附着到微电子衬底的微电子器件。 具有第一表面和相对的第二表面的集成散热器也通过设置在微电子器件的后表面和集成散热器第二表面之间的跳跃液滴蒸气室附接到微电子衬底。 跳跃液滴蒸气室可以包括由微电子器件背表面上的亲水蒸发表面,集成散热器第二表面上的疏水性冷凝表面和在亲水蒸发表面和疏水性冷凝物之间延伸的至少一个侧壁限定的蒸汽空间 表面具有设置在蒸气空间内的工作流体。